公开(公告)号：US20230242776A1

公开(公告)日：2023-08-03

申请号：US18162760

申请日：2023-02-01

Applicant: Kraton Corporation

Inventor： Bert Krutzer ,  Bharadwaja Peddinti ,  Jiaqi Yan ,  Kathryn J. Wright ,  James Smith

IPC: C09D9/00 ,  C09D5/14 ,  C09D153/00 ,  C11D7/50 ,  C11D7/24 ,  C11D7/26 ,  B08B3/08 ,  B08B1/00

CPC classification number: C09D9/005 ,  C09D5/14 ,  C09D153/005 ,  C11D7/5022 ,  C11D7/241 ,  C11D7/261 ,  C11D7/263 ,  C11D7/264 ,  B08B3/08 ,  B08B1/006 ,  B08B2220/04

Abstract: A method is provided for removing a residue from a surface. The method includes steps of applying a cleaning medium to the surface containing the residue. The cleaning medium comprises up to 100 wt. % of at least a solvent. Allowing the cleaning medium to be in contact with the residue for at least 5 seconds to swell/dissolve the residue for removing the residue from the surface. At least 50 wt. % of the residue and the cleaning medium are removed from the surface by wiping the surface with a shear force. The residue contains a sulfonated polymer having an ion exchange capacity (IEC) of greater than 0.5 meq/g. The sulfonated polymer can kill >90% of microbes coming in contact with the sulfonated polymer in less than 30 min.

公开(公告)号：US20230249490A1

公开(公告)日：2023-08-10

申请号：US18161173

申请日：2023-01-30

Applicant: Kraton Corporation

Inventor： Kathryn J. Wright ,  Bharadwaja Peddinti ,  Felipe Niada

IPC: B43L1/00 ,  C09D125/18 ,  C09D7/20

CPC classification number: B43L1/002 ,  C09D125/18 ,  C09D7/20

Abstract: An erasable laminate for marking is disclosed. The laminate comprises a substrate with a marking surface, allowing a user to provide markings on the marking surface using the marking material. The marking surface comprises an outer layer containing a sulfonated block copolymer having an ion exchange capacity (IEC) of >0.5 meq/g. At least 50% of the markings can be erased from the marking surface with a wipe moist with a cleaning fluid (e.g., water, isopropyl alcohol, etc.) after wiping for less than 5 min. The laminate with erasable and reusable marking surface can be used for obtaining writing instruments, e.g., notebooks, artist easels, sketches, etc.

公开(公告)号：US20230241003A1

公开(公告)日：2023-08-03

申请号：US18161965

申请日：2023-01-31

Applicant: Kraton Corporation

Inventor： Bert Krutzer ,  Kathryn J. Wright ,  James Smith ,  Ali Alwattari

IPC: A61K9/70 ,  B01D71/80 ,  B01D71/28 ,  B01D71/82 ,  C08F8/36

CPC classification number: A61K9/70 ,  B01D71/80 ,  B01D71/28 ,  B01D71/82 ,  C08F8/36

Abstract: An antimicrobial wipe is disclosed comprising a substrate and an antimicrobial composition. The antimicrobial composition contains a sulfonated block copolymer having an ion exchange capacity (IEC) of >0.5 meq/g, and (ii) a solvent system. The solvent system contains a mixture of two or more solvents selected from the group consisting of organic solvents, inorganic solvents, terpene-based compounds, and decarboxylated rosin acids. The antimicrobial wipe is in the form of a fabric, a sponge, a toilette, and the like. The sulfonated block copolymer is partially or fully dissolved in the solvent system, such that when the wipe is in contact with a target surface, the sulfonated block copolymer is imparted from the wipe onto the surface forming a coating layer. The coating layer causes a reduction in a microbe concentration by at least 1 log10 CFU (colony forming units) within 120 minutes upon contact.