公开(公告)号：US20230240289A1

公开(公告)日：2023-08-03

申请号：US18162752

申请日：2023-02-01

Applicant: Kraton Corporation

Inventor： Felipe Niada ,  Stephanie Earley

IPC: A01N25/12 ,  C09D5/14 ,  C09D5/03 ,  A01P1/00 ,  A01N41/04 ,  D06N3/00 ,  D06N3/04 ,  B32B27/12 ,  B32B5/02 ,  B32B27/32 ,  B32B27/18

CPC classification number: A01N25/12 ,  A01N41/04 ,  A01P1/00 ,  B32B5/022 ,  B32B27/12 ,  B32B27/18 ,  B32B27/32 ,  C09D5/03 ,  C09D5/14 ,  D06N3/0011 ,  D06N3/045 ,  D06N3/0093 ,  B32B2260/021 ,  B32B2260/046 ,  B32B2262/124 ,  B32B2262/0253 ,  B32B2264/0235 ,  B32B2432/00 ,  B32B2437/00 ,  B32B2555/00 ,  B32B2571/00 ,  D06N2201/0254 ,  D06N2203/047 ,  D06N2205/10 ,  D06N2209/1671

Abstract: A method for forming an antimicrobial coating on a substrate is provided. The method comprises dissipating and entrapping (embedding) sulfonated copolymer particles in void spaces or interstices of fibers of a fabric forming an outer layer of a substrate. The sulfonated copolymer is selected from the group of perfluorosulfonic acid polymers such as sulfonated tetrafluoroethylene, polystyrene sulfonates, sulfonated block copolymers, polysulfones such as polyether sulfone, polyketones such as polyether ketone, sulfonated poly(arylene ether), and mixtures thereof. The fibers comprise a thermoplastic polymer having a melting point of less than 120° C., or 45-110° C., or 45-80° C. The sulfonated copolymer forms an antimicrobial coating layer for killing at least 90% microbes in the air within 30 minutes of contact with the coating.

公开(公告)号：US20230249490A1

公开(公告)日：2023-08-10

申请号：US18161173

申请日：2023-01-30

Applicant: Kraton Corporation

Inventor： Kathryn J. Wright ,  Bharadwaja Peddinti ,  Felipe Niada

IPC: B43L1/00 ,  C09D125/18 ,  C09D7/20

CPC classification number: B43L1/002 ,  C09D125/18 ,  C09D7/20

Abstract: An erasable laminate for marking is disclosed. The laminate comprises a substrate with a marking surface, allowing a user to provide markings on the marking surface using the marking material. The marking surface comprises an outer layer containing a sulfonated block copolymer having an ion exchange capacity (IEC) of >0.5 meq/g. At least 50% of the markings can be erased from the marking surface with a wipe moist with a cleaning fluid (e.g., water, isopropyl alcohol, etc.) after wiping for less than 5 min. The laminate with erasable and reusable marking surface can be used for obtaining writing instruments, e.g., notebooks, artist easels, sketches, etc.

公开(公告)号：US20230416557A1

公开(公告)日：2023-12-28

申请号：US18462695

申请日：2023-09-07

Applicant: Kraton Corporation

Inventor： Bharadwaja Peddinti ,  Felipe Niada ,  Roger Tocchetto

IPC: C09D153/02 ,  C09D5/16 ,  C09D7/20 ,  C08F297/04 ,  C08J7/04 ,  C08J7/056

CPC classification number: C09D153/025 ,  C09D5/1668 ,  C09D7/20 ,  C08F297/04 ,  C08J7/0427 ,  C08J7/056 ,  C08F2810/00 ,  C08J2367/02 ,  C08J2453/02

Abstract: The disclosure relates to an article comprising a substrate and an antifog coating layer provided on at least one surface of the substrate. The antifog coating layer comprises a sulfonated styrenic block copolymer (SSBC) having a block A, a block B, and a block D. Block A is a polymer block resistant to sulfonation and derived from a para-substituted styrene monomer, block B is a polymer block susceptible to sulfonation and derived from a vinyl aromatic monomer, and block D is a polymer block resistant to sulfonation and derived from a conjugated diene monomer. The antifog coating layer provides long-term antifog as well as anti-microbial protection properties. The selection of a specific solvent system can modify the SSBC film morphology leading to enhanced antifog property. The antifog coating layer adheres well to targeted substrates and has abrasion resistance property.