公开(公告)号：US07929139B2

公开(公告)日：2011-04-19

申请号：US12196463

申请日：2008-08-22

申请人： Masahiro Horie ,  Kumiko Fukue

发明人： Masahiro Horie ,  Kumiko Fukue

IPC分类号： G01J4/00

CPC分类号： G01J3/447 ,  G01J3/4412

摘要： In a spectroscopic ellipsometer, light emitted from a light source enters a measurement surface of a substrate through an optical system in a lighting part so as to incline to the measurement surface to be directed to a light receiving device, and ellipsometry is performed based on spectral intensity of reflected light reflected on the measurement surface, the spectral intensity being acquired by the light receiving device. In focusing of the spectroscopic ellipsometer, a focus position of the measurement surface is obtained based on a total light amount in a predetermined wavelength band of the reflected light, the total light amount being obtained by the light receiving device. In the spectroscopic ellipsometer, since the optical system for ellipsometry and the optical system for focusing are common, it is possible to eliminate influences of change of the optical systems by temperature change or the like and to achieve high accurate focusing.

摘要翻译： 在光谱椭偏仪中，从光源发出的光通过照明部中的光学系统进入基板的测量面，从而向测量面倾斜而被引导到光接收装置，并且基于光谱进行椭偏仪 在测量表面反射的反射光的强度，由光接收装置获取的光谱强度。 在分光椭偏仪的聚焦中，基于反射光的预定波长带中的总光量，由光接收装置获得的总光量，获得测量表面的聚焦位置。 在分光椭偏仪中，由于用于椭偏仪的光学系统和用于聚焦的光学系统是常见的，因此可以通过温度变化等来消除光学系统的变化的影响，并且实现高精度的聚焦。

公开(公告)号：US07864318B2

公开(公告)日：2011-01-04

申请号：US12236178

申请日：2008-09-23

申请人： Kumiko Fukue

发明人： Kumiko Fukue

IPC分类号： G01J4/00

CPC分类号： G01B11/0641

摘要： A spectroscopic ellipsometer has a polarized light generating part for generating elliptically polarized lights of a plurality of wavelengths included in a predetermined measurement wavelength band from white light and directing the elliptically polarized lights to a measurement surface of a substrate, a rotating analyzer where reflected light reflected on the measurement surface enters, and a spectrometer for acquiring spectral intensity of light from the rotating analyzer. A polarization state acquiring part in a control part acquires a polarization state at each wavelength in the measurement wavelength band of the reflected light. The optical characteristic calculation part obtains a film thickness on the measurement surface with high accuracy on the basis of differences between measurement values and theoretical values, the measurement values representing change of a complex amplitude ratio between a p-polarized component and an s-polarized component and a phase difference between a p-polarized component and an s-polarized component.

摘要翻译： 分光椭偏仪具有偏振光产生部，用于从白光产生包含在预定测量波长带中的多个波长的椭圆偏振光，并将椭圆偏振光引导到基板的测量表面;反射光反射的旋转分析仪 在测量表面进入，以及用于从旋转分析仪获取光的光谱强度的光谱仪。 控制部中的偏振态获取部获取反射光的测定波长带的各波长的偏振状态。 光学特性计算部分基于测量值和理论值之间的差异，以高精度获得测量表面上的膜厚度，表示p极化分量和s偏振分量之间的复振幅比的变化的测量值 以及p偏振分量和s偏振分量之间的相位差。

公开(公告)号：US07557919B2

公开(公告)日：2009-07-07

申请号：US12197728

申请日：2008-08-25

申请人： Kumiko Fukue

发明人： Kumiko Fukue

IPC分类号： G01J4/00

CPC分类号： G01B11/0641 ,  G01B11/002

摘要： In an apparatus for detecting a position of a substrate in a film thickness measuring apparatus, an image pickup area on a substrate by an image pickup device of an imaging part is rotated by a rotation mechanism of a position detecting part. With this operation, an image of an edge of the substrate can be easily picked up at a plurality of image pickup positions around a central axis to detect a position of the substrate, without providing a mechanism for rotating a stage holding the substrate. As a result, it is possible to suppress upsizing of a structure for detecting a position of the substrate in the film thickness measuring apparatus and to achieve high-speed and high precision-position detection of the substrate, as compared with a conventional apparatus where a mechanism for rotating a substrate is provided above a mechanism for moving the substrate in a horizontal direction.

摘要翻译： 在用于检测膜厚测量装置中的基板的位置的装置中，由成像部件的图像拾取装置在基板上的图像拾取区域通过位置检测部分的旋转机构旋转。 通过这种操作，可以在围绕中心轴的多个摄像位置容易地拾取基板的边缘的图像，以检测基板的位置，而不设置用于旋转保持基板的台架的机构。 结果，与以往的装置相比，可以抑制用于检测膜厚测量装置中的基板的位置的结构的大尺寸并实现基板的高速和高精度位置检测。 在用于在水平方向上移动基板的机构的上方设置有旋转基板的机构。

公开(公告)号：US20090059228A1

公开(公告)日：2009-03-05

申请号：US12196463

申请日：2008-08-22

申请人： Masahiro Horie ,  Kumiko Fukue

发明人： Masahiro Horie ,  Kumiko Fukue

IPC分类号： G01J4/04

CPC分类号： G01J3/447 ,  G01J3/4412

摘要： In a spectroscopic ellipsometer, light emitted from a light source enters a measurement surface of a substrate through an optical system in a lighting part so as to incline to the measurement surface to be directed to a light receiving device, and ellipsometry is performed based on spectral intensity of reflected light reflected on the measurement surface, the spectral intensity being acquired by the light receiving device. In focusing of the spectroscopic ellipsometer, a focus position of the measurement surface is obtained based on a total light amount in a predetermined wavelength band of the reflected light, the total light amount being obtained by the light receiving device. In the spectroscopic ellipsometer, since the optical system for ellipsometry and the optical system for focusing are common, it is possible to eliminate influences of change of the optical systems by temperature change or the like and to achieve high accurate focusing.

摘要翻译： 在光谱椭偏仪中，从光源发出的光通过照明部中的光学系统进入基板的测量面，从而向测量面倾斜而被引导到光接收装置，并且基于光谱进行椭偏仪 在测量表面反射的反射光的强度，由光接收装置获取的光谱强度。 在分光椭偏仪的聚焦中，基于反射光的预定波长带中的总光量，由光接收装置获得的总光量，获得测量表面的聚焦位置。 在分光椭偏仪中，由于用于椭偏仪的光学系统和用于聚焦的光学系统是常见的，因此可以通过温度变化等来消除光学系统的变化的影响，并且实现高精度的聚焦。