摘要:
A phase shifter comprises: a phase shift unit including a reactance unit having a first variable capacitance device, and a susceptance unit having a second variable capacitance device, serially connected to the reactance unit; and a control unit for outputting a control signal continuously changing the capacitance of the first variable capacitance device and the second variable capacitance device to the phase shift unit. The amount of phase shift can be continuously changed by changing these variable capacitance devices continuously. Moreover, these devices can be formed on a semiconductor, thereby realizing low-voltage driving and high-speed response. Furthermore, the variance of impedance can be prevented by adjusting these two variable capacitance devices, whereby transmission efficiency can be improved
摘要:
A phase shifter comprises: a phase shift unit including a reactance unit having a first variable capacitance device, and a susceptance unit having a second variable capacitance device, T-connected to the reactance unit; and a control unit for outputting a control signal continuously changing the capacitance of the first variable capacitance device and the second variable capacitance device to the phase shift unit. The amount of phase shift can be continuously changed by changing these variable capacitance devices continuously. Moreover, these devices can be formed on a semiconductor, thereby realizing low-voltage driving and high-speed response. Furthermore, the variance of impedance can be prevented by adjusting these two variable capacitance devices, whereby transmission efficiency can be improved.
摘要:
A lattice strain(s) due to lattice mismatch can be effectively utilized and it is further designed for the reduction of leakage current and the improvement of fatigue characteristic. Substantially one layer of {X3}O corresponding to one atomic layer of {X3}O is inserted at suitable intervals while epitaxially growing perovskite oxides or {X1}{X2}O3 layers 12 on a substrate which is similar in crystallographic structure to a desired thin film. {X1} and {X3} are each Ca or the like, {X2} is Ti or the like and ┌O┘ is oxygen. While the {X3}O layer(s) 14 is introduced so as to divide the perovskite structure of the {X1}{X2}O3 layers 12, it is present in a condition exhibiting an extremely high structural matching with the perovskite structure thereby forming a layered perovskite structure. The {X3}O layer(s) 14 functions as a blocking layer for the introduction of misfit(lattice mismatch) dislocations. As a result, a ferroelectric thin film maintaining high lattice strains is produced.