摘要:
Disclosed is a photo-electrode for a dye-sensitized solar cell comprising a conductive substrate; a meso-porous metal oxide thin film formed on the surface of the conductive substrate; a porous film formed on the meso-porous metal oxide thin film and comprising metal oxide nanoparticles; and a photosensitive dye adsorbed on the surface of the porous film; and a process for preparation thereof.
摘要:
Disclosed is a photo-electrode for a dye-sensitized solar cell comprising a conductive substrate; a meso-porous metal oxide thin film formed on the surface of the conductive substrate; a porous film formed on the meso-porous metal oxide thin film and comprising metal oxide nanoparticles; and a photosensitive dye adsorbed on the surface of the porous film; and a process for preparation thereof.
摘要:
Disclosed is a photo-electrode for a dye-sensitized solar cell comprising a conductive substrate; a light absorbing porous film comprising nanoparticles of a first metal oxide, which is formed on the conductive substrate; a light scattering porous film comprising hollow spherical agglomerates of nanoparticles of a second metal oxide, which is formed on the light absorbing porous film; and a photosensitive dye adsorbed on the surface of the light absorbing metal oxide nanoparticles as well as on the surface of the hollow spherical agglomerates of the light scattering porous film.
摘要:
An organometallic precursor of a formula M(L)2 for use in formation of metal oxide thin films, in which M is a group IV metal ion having a charge of +4 and L is a tridentate ligand having a charge of −2, the ligand being represented by the following formula (I): wherein each of R1 and R2, independently, is a linear or branched C1-8 alkyl group; and R3 is a linear or branched C1-8 alkylene group. Also disclosed is a chemical vapor deposition method wherein a metal oxide thin film is formed on a substrate using the organometallic precursor. The precursor exhibits excellent volatility, thermal property and hydrolytic stability and is particularly suitable for the deposition of a multi-component metal oxide thin film containing a group IV metal such as titanium.