公开(公告)号：US20210143032A1

公开(公告)日：2021-05-13

申请号：US17053110

申请日：2019-05-02

Applicant: LAM RESEARCH CORPORATION

Inventor： Dong Woo PAENG ,  Yunsang S. KIM ,  He ZHANG ,  Keith WELLS ,  Alan M. SCHOEPP

IPC: H01L21/67 ,  H01J37/32 ,  G02B27/09 ,  G02B27/30 ,  G02F1/11 ,  C23C16/455

Abstract: A substrate processing system includes a processing chamber, a substrate support, a laser, and a collimating assembly. The substrate support is disposed in the processing chamber and is configured to support a substrate. The laser is configured to generate a laser beam. The collimating assembly includes lenses or minors arranged to direct the laser beam at the substrate to heat an exposed material of the substrate. The lenses or mirrors are configured to direct the laser beam in a direction within a predetermined range of being perpendicular to a surface of the substrate.