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公开(公告)号:US20040018655A1
公开(公告)日:2004-01-29
申请号:US10621327
申请日:2003-07-18
Applicant: LG. Philips LCD Co., Ltd.
Inventor: In Duk Song
IPC: H01L021/00 , H01L021/84
CPC classification number: G02F1/13458 , G02F1/136227 , G02F2001/136236 , H01L27/124 , H01L27/1248 , H01L27/1288
Abstract: A method for forming a display device, includes forming a thin film transistor (TFT), a gate pad and a data pad on a substrate; depositing sequentially an inorganic insulating material and an organic insulating material on the substrate having the TFT, the gate pad and the data pad; selectively removing the organic insulating material using a diffracting mask to form a patterned organic insulating layer; selectively removing the inorganic insulating material, using at least a portion of the patterned organic insulating layer as a mask to define contact holes for the TFT, the gate pad and the data pad; and forming electrodes in the contact holes.
Abstract translation: 一种用于形成显示装置的方法,包括在基板上形成薄膜晶体管(TFT),栅极焊盘和数据焊盘; 在具有TFT,栅极焊盘和数据焊盘的基板上依次沉积无机绝缘材料和有机绝缘材料; 使用衍射掩模选择性去除有机绝缘材料以形成图案化的有机绝缘层; 使用图案化的有机绝缘层的至少一部分作为掩模来选择性地去除无机绝缘材料,以限定TFT,栅极焊盘和数据焊盘的接触孔; 以及在接触孔中形成电极。
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公开(公告)号:US20040018669A1
公开(公告)日:2004-01-29
申请号:US10621328
申请日:2003-07-18
Applicant: LG. Philips LCD Co., Ltd.
Inventor: In Duk Song
IPC: H01L021/00
CPC classification number: G02F1/13458 , G02F1/136227 , G02F2001/136236 , H01L27/124 , H01L27/1248 , H01L27/1288
Abstract: A method of fabricating a liquid crystal display device, includes forming a gate electrode and a gate pad over a substrate; forming a gate insulating film over the substrate; forming a semiconductor layer over the gate insulating film; forming a source electrode, a drain electrode and a data pad over the gate insulating film; depositing an inorganic insulating material on the gate insulating film; depositing an organic insulating material over the inorganic insulating material; removing selectively the organic insulating material at a partial area over the drain electrode, the gate pad and the data pad, to leave a portion of the organic insulating material over the gate pad and the data pad; patterning the gate insulating film and the inorganic insulating material using at least a portion of the remaining organic insulating material as a mask, thereby providing an inorganic protective film, an organic protective film, a drain contact hole, a gate contact hole and a data contact hole; and forming a pixel electrode on the inorganic protective film by depositing a transparent conductive film onto the inorganic protective film and the organic protective film and patterning the transparent conductive film, and forming a gate protective electrode and a data protective electrode on the inorganic protective film.
Abstract translation: 一种制造液晶显示装置的方法,包括在基板上形成栅电极和栅极焊盘; 在基板上形成栅极绝缘膜; 在所述栅极绝缘膜上形成半导体层; 在栅极绝缘膜上形成源电极,漏电极和数据焊盘; 在栅极绝缘膜上沉积无机绝缘材料; 在无机绝缘材料上沉积有机绝缘材料; 在漏电极,栅极焊盘和数据焊盘上的部分区域选择性地去除有机绝缘材料,以将有机绝缘材料的一部分留在栅极焊盘和数据焊盘上; 使用剩余的有机绝缘材料的至少一部分作为掩模来图案化栅极绝缘膜和无机绝缘材料,从而提供无机保护膜,有机保护膜,漏极接触孔,栅极接触孔和数据接触 孔; 通过在无机保护膜和有机保护膜上沉积透明导电膜并对透明导电膜进行图案化,并在无机保护膜上形成栅极保护电极和数据保护电极,在无机保护膜上形成像素电极。
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公开(公告)号:US20040125248A1
公开(公告)日:2004-07-01
申请号:US10624329
申请日:2003-07-21
Applicant: LG. PHILIPS LCD CO., LTD.
Inventor: In Duk Song
IPC: G02F001/1343
CPC classification number: G02F1/136213 , G02F1/136227
Abstract: A liquid crystal display has a storage capacitor of storage on common type in a pixel region with a passivation film of an inorganic insulating layer and an organic layer stacked on the inorganic insulating layer. The liquid crystal display includes: a storage capacitor lower electrode formed in the pixel region; a gate insulating layer formed on the storage capacitor lower electrode; the passivation film formed on the gate insulating layer, and a pixel electrode formed on the inorganic insulating layer. In the storage capacitance region of the pixel region, the organic insulating layer is partially or wholly removed and the pixel electrode functions as a storage capacitor upper electrode.
Abstract translation: 液晶显示器具有在具有无机绝缘层的钝化膜和堆叠在无机绝缘层上的有机层的像素区域中的共同存储的存储电容器。 液晶显示器包括:形成在像素区域中的存储电容器下电极; 形成在所述保持电容器下电极上的栅极绝缘层; 形成在栅极绝缘层上的钝化膜和形成在无机绝缘层上的像素电极。 在像素区域的存储电容区域中,有机绝缘层被部分或全部去除,像素电极用作存储电容器上电极。
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