RESIN SHEET
    1.
    发明申请

    公开(公告)号:US20230064310A1

    公开(公告)日:2023-03-02

    申请号:US17792575

    申请日:2021-01-15

    Abstract: A resin sheet is made using a resin composition containing a thermosetting component (A). The thermosetting component (A) contains a maleimide resin. A thermal diffusion rate of the thermally cured resin sheet is 1.0 × 10-6 m2/s or more. The resin sheet has a thickness in a range from 5 µm to 120 µm .

    SHEET FOR SEMICONDUCTOR PROCESSING
    2.
    发明申请

    公开(公告)号:US20180286736A1

    公开(公告)日:2018-10-04

    申请号:US15764377

    申请日:2016-03-28

    Abstract: The sheet for semiconductor processing of the present invention includes a base, an unevenness-absorbing layer provided on one surface of the base, and a pressure sensitive adhesive layer provided on the unevenness-absorbing layer, wherein the pressure sensitive adhesive layer is composed of an energy ray-curable pressure sensitive adhesive, and a stress at rupture of the pressure sensitive adhesive layer after energy ray curing is 10 MPa or more.

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