SEMICONDUCTOR DEVICE HAVING SIDE-DIFFUSED TRENCH PLUG

    公开(公告)号:US20170373142A1

    公开(公告)日:2017-12-28

    申请号:US15190469

    申请日:2016-06-23

    申请人: Littelfuse, Inc.

    摘要: A semiconductor device structure may include a substrate having a substrate base comprising a first dopant type; a semiconductor layer disposed on a surface of the substrate base, the semiconductor layer comprising a second dopant type and having an upper surface; and a semiconductor plug assembly comprising a semiconductor plug disposed within the semiconductor layer, the semiconductor plug extending from an upper surface of the semiconductor layer and having a depth at least equal to a thickness of the semiconductor layer, the semiconductor plug having a first boundary, the first boundary formed within the semiconductor layer, and having a second boundary, the second boundary formed within the semiconductor layer and disposed opposite the first boundary, wherein the first boundary and second boundary extend perpendicularly to the surface of the substrate base.

    SEMICONDUCTOR DEVICE HAVING SIDE-DIFFUSED TRENCH PLUG

    公开(公告)号:US20210091178A1

    公开(公告)日:2021-03-25

    申请号:US16950420

    申请日:2020-11-17

    申请人: Littelfuse, Inc.

    摘要: A semiconductor device structure may include a substrate having a substrate base comprising a first dopant type; a semiconductor layer disposed on a surface of the substrate base, the semiconductor layer comprising a second dopant type and having an upper surface; and a semiconductor plug assembly comprising a semiconductor plug disposed within the semiconductor layer, the semiconductor plug extending from an upper surface of the semiconductor layer and having a depth at least equal to a thickness of the semiconductor layer, the semiconductor plug having a first boundary, the first boundary formed within the semiconductor layer, and having a second boundary, the second boundary formed within the semiconductor layer and disposed opposite the first boundary, wherein the first boundary and second boundary extend perpendicularly to the surface of the substrate base.

    Method of manufacturing a semiconductor device having side-diffused trench plug

    公开(公告)号:US10943975B2

    公开(公告)日:2021-03-09

    申请号:US16457500

    申请日:2019-06-28

    申请人: Littelfuse, Inc.

    摘要: A semiconductor device structure may include a substrate having a substrate base comprising a first dopant type; a semiconductor layer disposed on a surface of the substrate base, the semiconductor layer comprising a second dopant type and having an upper surface; and a semiconductor plug assembly comprising a semiconductor plug disposed within the semiconductor layer, the semiconductor plug extending from an upper surface of the semiconductor layer and having a depth at least equal to a thickness of the semiconductor layer, the semiconductor plug having a first boundary, the first boundary formed within the semiconductor layer, and having a second boundary, the second boundary formed within the semiconductor layer and disposed opposite the first boundary, wherein the first boundary and second boundary extend perpendicularly to the surface of the substrate base.

    SEMICONDUCTOR DEVICE HAVING SIDE-DIFFUSED TRENCH PLUG

    公开(公告)号:US20190326390A1

    公开(公告)日:2019-10-24

    申请号:US16457500

    申请日:2019-06-28

    申请人: Littelfuse, Inc.

    摘要: A semiconductor device structure may include a substrate having a substrate base comprising a first dopant type; a semiconductor layer disposed on a surface of the substrate base, the semiconductor layer comprising a second dopant type and having an upper surface; and a semiconductor plug assembly comprising a semiconductor plug disposed within the semiconductor layer, the semiconductor plug extending from an upper surface of the semiconductor layer and having a depth at least equal to a thickness of the semiconductor layer, the semiconductor plug having a first boundary, the first boundary formed within the semiconductor layer, and having a second boundary, the second boundary formed within the semiconductor layer and disposed opposite the first boundary, wherein the first boundary and second boundary extend perpendicularly to the surface of the substrate base.