公开(公告)号：US20090117154A1

公开(公告)日：2009-05-07

申请号：US12066963

申请日：2006-09-14

申请人： Lai-Xi Wang ,  Jingsong Wang ,  Timothy Fouts

发明人： Lai-Xi Wang ,  Jingsong Wang ,  Timothy Fouts

IPC分类号： A61K39/21 ,  C12N7/00 ,  A61K31/715 ,  G01N33/566 ,  C08L77/00

CPC分类号： C07H3/06 ,  A61K31/70 ,  A61K31/7004 ,  A61K31/702 ,  A61K31/715 ,  A61K31/716 ,  A61K31/785 ,  A61K47/58 ,  G01N2400/10 ,  A61K2300/00

摘要： Inhibitors that block the DC-SIGN mediated transmission of the HIV-virus from mucosal infection sites to T-lymphocytes. In one embodiment, the inhibitors include at least one oligosaccharide chain attached to a scaffolding framework in which the number of the oligosaccharide chains attached to the scaffold can be 2, 3, 4 or more. In another embodiment, HIV-I viral infection is treated by administration of a composition including a therapeutically effective amount of an oligosaccharide cluster and/or oligosaccharide/protein cluster binding DC-SIGN, to inhibit DC-SIGN from binding to HIV envelope glycoprotein.

摘要翻译： 阻断DC-SIGN介导的HIV病毒从粘膜感染部位传播到T淋巴细胞的抑制剂。 在一个实施方案中，抑制剂包括连接到支架框架的至少一个寡糖链，其中附着于支架的寡糖链的数目可以是2,3,4或更多。 在另一个实施方案中，通过施用包含治疗有效量的寡糖簇和/或寡糖/蛋白质簇结合DC-SIGN的组合物来治疗HIV-1病毒感染，以抑制DC-SIGN结合HIV包膜糖蛋白。

公开(公告)号：US20120127448A1

公开(公告)日：2012-05-24

申请号：US13262802

申请日：2010-05-25

申请人： Yu Zhu ,  Ming Zhang ,  Jingsong Wang ,  Li Tian ,  Dengfeng Xu ,  Wensheng Yin ,  Guanghong Duan ,  Jinchun Hu

发明人： Yu Zhu ,  Ming Zhang ,  Jingsong Wang ,  Li Tian ,  Dengfeng Xu ,  Wensheng Yin ,  Guanghong Duan ,  Jinchun Hu

IPC分类号： G03B27/58

CPC分类号： G03F7/70733 ,  G03F7/70716

摘要： A dual wafer stage exchanging system for a lithographic device is disclosed, said system comprises two wafer stages running between an exposure workstation and a pre-processing workstation, and said two stages are set on a base and suspended above the upper surface of the base by air bearings. Each wafer stages is passed through by a Y-direction guide rail respectively, wherein one end of said guide rail is connected with a main driving unit and another end of said guide rail is detachably coupled with one of the two X-direction auxiliary driving units with single degree of freedom, and said two wafer stages are capable of moving in Y-direction along the guide rails and moving in X-direction under the drive of the auxiliary driving units with single degree of freedom. The position exchange of said two wafer stages can be enabled by the detachment and connection of the Y-direction guide rails and the auxiliary units with single degree of freedom.

摘要翻译： 公开了一种用于光刻设备的双晶片台交换系统，所述系统包括在曝光工作站和预处理工作站之间运行的两个晶片台，并且所述两个阶段被设置在基座上并且悬挂在基座的上表面上方的上表面上方 空气轴承。 每个晶片台分别通过Y方向导轨穿过，其中所述导轨的一端与主驱动单元连接，并且所述导轨的另一端可拆卸地与两个X方向辅助驱动单元中的一个 具有单自由度，并且所述两个晶片台能够沿着导轨在Y方向上移动，并且在辅助驱动单元的驱动下以单自由度在X方向上移动。 所述两个晶片台的位置交换可以通过Y方向导轨和辅助单元以单个自由度的分离和连接来实现。

公开(公告)号：US08836918B2

公开(公告)日：2014-09-16

申请号：US13262783

申请日：2010-04-02

申请人： Yu Zhu ,  Ming Zhang ,  Jingsong Wang ,  Li Tian ,  Dengfeng Xu ,  Wensheng Yin ,  Guanghong Duan ,  Jinchun Hu

发明人： Yu Zhu ,  Ming Zhang ,  Jingsong Wang ,  Li Tian ,  Dengfeng Xu ,  Wensheng Yin ,  Guanghong Duan ,  Jinchun Hu

IPC分类号： G03B27/58

CPC分类号： H01L21/682 ,  G03F7/70733 ,  G03F7/70758

摘要： A dual-stage exchange system for a lithographic apparatus comprises a silicon chip stage (10) operating in an exposure workstation (6) and a silicon chip stage (12) operating in a pre-processing workstation (7). Each silicon chip stage (10, 12) is supported by a six-freedom micro-motion stage, respectively. The silicon chip stage (10, 12) and the six-freedom micro-motion stage form a silicon chip stage group. The two silicon chip stage groups are provided on the same rectangular base stage (1) and suspended on an upper surface (2) of the base sage by air bearings. A double-freedom driving unit (21a, 21b, 22a, 22b) is provided on each edge of the base stage (1), respectively. The six-freedom micro-motion stage of the silicon chip stage group has an upper layer driver and a lower layer driver, capable of achieving six-freedom control. The double-freedom driving units (21a, 21b) on the long edges of the base stage are connected with the bases (62) of the six-freedom micro-motion stages, and the double-freedom driving units (22a, 22b) on the short edges of the base stage are connected with the stator coils (63) of the upper layer drivers of the six-freedom micro-motion stages.

摘要翻译： 用于光刻设备的双级交换系统包括在暴露工作站（6）中操作的硅芯片级（10）和在预处理工作站（7）中操作的硅芯片级（12）。 每个硅芯片级（10,12）分别由六自由度微动平台支撑。 硅片级（10,12）和六自由度微运动级形成硅芯片级组。 两个硅芯片台组设置在相同的矩形基台（1）上，并通过空气轴承悬挂在基座的上表面（2）上。 分别在基台（1）的每个边缘上设置双自由度驱动单元（21a，21b，22a，22b）。 硅片级组的六自由度微动阶段具有能够实现六自由度控制的上层驱动器和下层驱动器。 基台的长边缘上的双重自由度驱动单元（21a，21b）与六自由度微动台的基座（62）连接，双重自由度驱动单元（22a，22b）在 基台的短边缘与六自由度微动级的上层驱动器的定子线圈（63）连接。

公开(公告)号：US20120099095A1

公开(公告)日：2012-04-26

申请号：US13262829

申请日：2010-04-02

申请人： Yu Zhu ,  Ming Zhang ,  Jingsong Wang ,  Li Tian ,  Dengfeng Xu ,  Wensheng Yin ,  Guanghong Duan ,  Jinchun Hu

发明人： Yu Zhu ,  Ming Zhang ,  Jingsong Wang ,  Li Tian ,  Dengfeng Xu ,  Wensheng Yin ,  Guanghong Duan ,  Jinchun Hu

IPC分类号： G03B27/58

CPC分类号： G03F7/70733

摘要： A dual-stage exchange system for a lithographic apparatus comprises a silicon chip stage (13) operating in an exposure workstation (3) and a silicon chip (14) stage operating in a pre-processing workstation (4). The two silicon chip stages (13, 14) are provided on the same base stage (1), and suspended on an upper surface (2) of the base stage by air bearings. The two silicon chip stages (13, 14) can move along guide rails (15, 16) in the Y direction. One end of each guide rail (15, 16) is connected to a main driving unit (11, 12), and the other end of each guide rail (15, 16) is butt-jointed with an X-direction single-freedom auxiliary driving unit (7, 8). The silicon chip stages (13, 14) are driven by the single-freedom auxiliary driving units (7, 8) cooperated with the main driving units (11, 12) to move along the X direction. The single-freedom auxiliary driving units (7, 8) can be separated from or precisely butt-jointed with the Y-direction guide rails (15, 16), thereby achieving the position exchange of the two silicon chip stages (13, 14).

摘要翻译： 用于光刻设备的双级交换系统包括在暴露工作站（3）中操作的硅芯片级（13）和在预处理工作站（4）中操作的硅芯片（14）级。 两个硅片级（13,14）设置在同一基台（1）上，并通过空气轴承悬挂在基台的上表面（2）上。 两个硅芯片级（13,14）可沿Y方向的导轨（15,16）移动。 每个导轨（15,16）的一端连接到主驱动单元（11,12），并且每个导轨（15,16）的另一端与X方向单自由度辅助 驱动单元（7,8）。 硅片级（13,14）由与主驱动单元（11,12）配合的单自由度辅助驱动单元（7,8）驱动以沿X方向移动。 单向辅助驱动单元（7,8）可以与Y方向导轨（15,16）分离或精确对接，从而实现两个硅芯片级（13,14）的位置交换， 。

公开(公告)号：US20120099094A1

公开(公告)日：2012-04-26

申请号：US13262783

申请日：2010-04-02

申请人： Yu Zhu ,  Ming Zhang ,  Jingsong Wang ,  Li Tian ,  Dengfeng Xu ,  Wensheng Yin ,  Guanghong Duan ,  Jinchun Hu

发明人： Yu Zhu ,  Ming Zhang ,  Jingsong Wang ,  Li Tian ,  Dengfeng Xu ,  Wensheng Yin ,  Guanghong Duan ,  Jinchun Hu

IPC分类号： G03B27/58

CPC分类号： H01L21/682 ,  G03F7/70733 ,  G03F7/70758

摘要： A dual-stage exchange system for a lithographic apparatus comprises a silicon chip stage (10) operating in an exposure workstation (6) and a silicon chip stage (12) operating in a pre-processing workstation (7). Each silicon chip stage (10, 12) is supported by a six-freedom micro-motion stage, respectively. The silicon chip stage (10, 12) and the six-freedom micro-motion stage form a silicon chip stage group. The two silicon chip stage groups are provided on the same rectangular base stage (1) and suspended on an upper surface (2) of the base sage by air bearings. A double-freedom driving unit (21a, 21b, 22a, 22b) is provided on each edge of the base stage (1), respectively. The six-freedom micro-motion stage of the silicon chip stage group has an upper layer driver and a lower layer driver, capable of achieving six-freedom control. The double-freedom driving units (21a, 21b) on the long edges of the base stage are connected with the bases (62) of the six-freedom micro-motion stages, and the double-freedom driving units (22a, 22b) on the short edges of the base stage are connected with the stator coils (63) of the upper layer drivers of the six-freedom micro-motion stages.

摘要翻译： 用于光刻设备的双级交换系统包括在暴露工作站（6）中操作的硅芯片级（10）和在预处理工作站（7）中操作的硅芯片级（12）。 每个硅芯片级（10,12）分别由六自由度微动平台支撑。 硅片级（10,12）和六自由度微运动级形成硅芯片级组。 两个硅芯片台组设置在相同的矩形基台（1）上，并通过空气轴承悬挂在基座的上表面（2）上。 分别在基台（1）的每个边缘上设置双自由度驱动单元（21a，21b，22a，22b）。 硅片级组的六自由度微动阶段具有能够实现六自由度控制的上层驱动器和下层驱动器。 基台的长边缘上的双重自由度驱动单元（21a，21b）与六自由度微动台的基座（62）连接，双重自由度驱动单元（22a，22b）在 基台的短边缘与六自由度微动级的上层驱动器的定子线圈（63）连接。

公开(公告)号：US09030648B2

公开(公告)日：2015-05-12

申请号：US13262802

申请日：2010-04-02

申请人： Yu Zhu ,  Ming Zhang ,  Jingsong Wang ,  Li Tian ,  Dengfeng Xu ,  Wensheng Yin ,  Guanghong Duan ,  Jinchun Hu

发明人： Yu Zhu ,  Ming Zhang ,  Jingsong Wang ,  Li Tian ,  Dengfeng Xu ,  Wensheng Yin ,  Guanghong Duan ,  Jinchun Hu

IPC分类号： G03B27/58 ,  G03F7/20

CPC分类号： G03F7/70733 ,  G03F7/70716

摘要： A dual wafer stage exchanging system for a lithographic device is disclosed, said system comprises two wafer stages running between an exposure workstation and a pre-processing workstation, and said two stages are set on a base and suspended above the upper surface of the base by air bearings. Each wafer stages is passed through by a Y-direction guide rail respectively, wherein one end of said guide rail is connected with a main driving unit and another end of said guide rail is detachably coupled with one of the two X-direction auxiliary driving units with single degree of freedom, and said two wafer stages are capable of moving in Y-direction along the guide rails and moving in X-direction under the drive of the auxiliary driving units with single degree of freedom. The position exchange of said two wafer stages can be enabled by the detachment and connection of the Y-direction guide rails and the auxiliary units with single degree of freedom.

摘要翻译： 公开了一种用于光刻设备的双晶片台交换系统，所述系统包括在曝光工作站和预处理工作站之间运行的两个晶片台，并且所述两个阶段被设置在基座上并且悬挂在基座的上表面上方的上表面上方 空气轴承。 每个晶片台分别通过Y方向导轨穿过，其中所述导轨的一端与主驱动单元连接，并且所述导轨的另一端可拆卸地与两个X方向辅助驱动单元中的一个 具有单自由度，并且所述两个晶片台能够沿着导轨在Y方向上移动，并且在辅助驱动单元的驱动下以单自由度在X方向上移动。 所述两个晶片台的位置交换可以通过Y方向导轨和辅助单元以单个自由度的分离和连接来实现。

公开(公告)号：US08860927B2

公开(公告)日：2014-10-14

申请号：US13262829

申请日：2010-04-02

申请人： Yu Zhu ,  Ming Zhang ,  Jingsong Wang ,  Li Tian ,  Dengfeng Xu ,  Wensheng Yin ,  Guanghong Duan ,  Jinchun Hu

发明人： Yu Zhu ,  Ming Zhang ,  Jingsong Wang ,  Li Tian ,  Dengfeng Xu ,  Wensheng Yin ,  Guanghong Duan ,  Jinchun Hu

IPC分类号： G03B27/58 ,  G03F7/20

CPC分类号： G03F7/70733

摘要： A dual-stage exchange system for a lithographic apparatus comprises a silicon chip stage (13) operating in an exposure workstation (3) and a silicon chip (14) stage operating in a pre-processing workstation (4). The two silicon chip stages (13, 14) are provided on the same base stage (1), and suspended on an upper surface (2) of the base stage by air bearings. The two silicon chip stages (13, 14) can move along guide rails (15, 16) in the Y direction. One end of each guide rail (15, 16) is connected to a main driving unit (11, 12), and the other end of each guide rail (15, 16) is butt-jointed with an X-direction single-freedom auxiliary driving unit (7, 8). The silicon chip stages (13, 14) are driven by the single-freedom auxiliary driving units (7, 8) cooperated with the main driving units (11, 12) to move along the X direction. The single-freedom auxiliary driving units (7, 8) can be separated from or precisely butt-jointed with the Y-direction guide rails (15, 16), thereby achieving the position exchange of the two silicon chip stages (13, 14).

摘要翻译： 用于光刻设备的双级交换系统包括在暴露工作站（3）中操作的硅芯片级（13）和在预处理工作站（4）中操作的硅芯片（14）级。 两个硅片级（13,14）设置在同一基台（1）上，并通过空气轴承悬挂在基台的上表面（2）上。 两个硅芯片级（13,14）可沿Y方向的导轨（15,16）移动。 每个导轨（15,16）的一端连接到主驱动单元（11,12），并且每个导轨（15,16）的另一端与X方向单自由度辅助 驱动单元（7,8）。 硅片级（13,14）由与主驱动单元（11,12）配合的单自由度辅助驱动单元（7,8）驱动以沿X方向移动。 单向辅助驱动单元（7,8）可以与Y方向导轨（15,16）分离或精确对接，从而实现两个硅芯片级（13,14）的位置交换， 。