公开(公告)号：US10240236B2

公开(公告)日：2019-03-26

申请号：US14641179

申请日：2015-03-06

Applicant: Lam Research Corporation

Inventor： James Lee ,  George Andrew Antonelli ,  Kevin M. McLaughlin ,  Andrew John McKerrow ,  Curtis Bailey ,  Alexander R. Fox ,  Stephen Lau ,  Eugene Smargiassi ,  Casey Holder ,  Troy Daniel Ribaudo ,  Xiaolan Chen

IPC: B08B7/00 ,  B08B9/00 ,  C23C16/44 ,  C23C16/48 ,  H01L21/67 ,  H01L21/687

Abstract: Apparatuses and methods for cleaning a semiconductor processing chamber is provided. The semiconductor processing chamber may include a UV radiation source, a substrate holder, and a UV transmissive window. The UV transmissive window may include one or multiple panes. One or more panes of the UV transmissive window may be non-reactive with fluorine containing chemistries. In multi-pane windows a purge gas flow path may be formed in the gap between windows. A purge gas may be flowed through the purge gas flow path to prevent process gases used in the chamber interior from reaching one or more panes of the UV transmissive window.

公开(公告)号：US20160258057A1

公开(公告)日：2016-09-08

申请号：US14641179

申请日：2015-03-06

Applicant: Lam Research Corporation

Inventor： James Lee ,  George Andrew Antonelli ,  Kevin M. McLaughlin ,  Andrew John McKerrow ,  Curtis Bailey ,  Alexander R. Fox ,  Stephen Lau ,  Eugene Smargiassi ,  Casey Holder ,  Troy Daniel Ribaudo ,  Xiaolan Chen

IPC: C23C16/44 ,  C23C16/52 ,  C23C16/48 ,  H01L21/67

CPC classification number: C23C16/488 ,  B08B7/0057 ,  B08B9/00 ,  C23C16/4405 ,  C23C16/4408 ,  H01L21/67115 ,  H01L21/6719 ,  H01L21/68764 ,  H01L21/68771

Abstract: Apparatuses and methods for cleaning a semiconductor processing chamber is provided. The semiconductor processing chamber may include a UV radiation source, a substrate holder, and a UV transmissive window. The UV transmissive window may include one or multiple panes. One or more panes of the UV transmissive window may be non-reactive with fluorine containing chemistries. In multi-pane windows a purge gas flow path may be formed in the gap between windows. A purge gas may be flowed through the purge gas flow path to prevent process gases used in the chamber interior from reaching one or more panes of the UV transmissive window.

Abstract translation: 提供了用于清洁半导体处理室的设备和方法。 半导体处理室可以包括UV辐射源，衬底保持器和UV透射窗。 UV透射窗可以包括一个或多个窗格。 UV透射窗的一个或多个窗可以与含氟化学物质不反应。 在多窗格窗口中，可以在窗口之间的间隙中形成净化气体流动路径。 净化气体可以流过净化气体流动路径，以防止室内使用的工艺气体到达UV透射窗的一个或多个窗格。