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1.发明申请公开(公告)号：US20100332201A1
公开(公告)日：2010-12-30
申请号：US12826575
申请日：2010-06-29
CPC分类号： H01J37/32935 , H01J37/32477
摘要： A method for assessing health status of a processing chamber is provided. The method includes executing a recipe. The method also includes receiving processing data from a set of sensors during execution of the recipe. The method further includes analyzing the processing data utilizing a set of multi-variate predictive models. The method yet also includes generating a set of component wear data values. The method yet further includes comparing the set of component wear data values against a set of useful life threshold ranges. The method moreover includes generating a warning if the set of component wear data values is outside of the set of useful life threshold ranges.
摘要翻译： 提供了一种用于评估处理室的健康状况的方法。 该方法包括执行食谱。 该方法还包括在执行配方期间从一组传感器接收处理数据。 该方法还包括利用一组多变量预测模型分析处理数据。 该方法还包括生成一组组件磨损数据值。 该方法还包括将组件磨损数据值集合与一组使用寿命阈值范围进行比较。 该方法还包括如果组件磨损数据值的集合超出了使用寿命阈值范围的集合，则产生警告。
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2.发明申请ARRANGEMENT FOR IDENTIFYING UNCONTROLLED EVENTS AT THE PROCESS MODULE LEVEL AND METHODS THEREOF 有权在过程模块级别识别非受控事件的安排及其方法公开(公告)号：US20100332014A1
公开(公告)日：2010-12-30
申请号：US12826568
申请日：2010-06-29
IPC分类号： G06F19/00
CPC分类号： H01J37/32935 , G05B2219/31202
摘要： A method for detecting an in-situ fast transient event within a processing chamber during substrate processing is provided. The method includes a set of sensors comparing a data set to a set of criteria (in-situ fast transient events) to determine if the first data set includes a potential in-situ fast transient event. If the first data set includes the potential in-situ fast transient event, the method also includes saving an electrical signature that occurs in a time period during which the potential in-situ fast transient event occurs. The method further includes comparing the electrical signature against a set of stored arc signatures. If a match is determined, the method yet also includes classifying the electrical signature as a first in-situ fast transient event and determining a severity level for the first in-situ fast transient event based on a predefined set of threshold ranges.
摘要翻译： 提供了一种用于在衬底处理期间检测处理室内的原位快速瞬变事件的方法。 该方法包括将数据集与一组标准（原位快速瞬变事件）进行比较的一组传感器，以确定第一数据集是否包括潜在的原位快速瞬变事件。 如果第一数据集包括潜在的原位快速瞬变事件，则该方法还包括保存在潜在的原位快速瞬变事件发生的时间段内发生的电特征。 该方法还包括将电特征与一组存储的电弧特征进行比较。 如果确定匹配，则该方法还包括将电特征分类为第一原位快速瞬时事件，并且基于预定义的一组阈值范围来确定第一原位快速瞬时事件的严重性级别。
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公开(公告)号：US08358416B2
公开(公告)日：2013-01-22
申请号：US13415763
申请日：2012-03-08
IPC分类号： G01N21/00
CPC分类号： G01N21/274 , G01J3/02 , G01J3/0205 , G01J3/0218 , G01J3/0294 , G01J3/443 , G01N21/68
摘要： A processing system having a chamber for in-situ optical interrogation of plasma emission to quantitatively measure normalized optical emission spectra is provided. The processing chamber includes a confinement ring assembly, a flash lamp, and a set of quartz windows. The processing chamber also includes a plurality of collimated optical assemblies, the plurality of collimated optical assemblies are optically coupled to the set of quartz windows. The processing chamber also includes a plurality of fiber optic bundles. The processing chamber also includes a multi-channel spectrometer, the multi-channel spectrometer is configured with at least a signal channel and a reference channel, the signal channel is optically coupled to at least the flash lamp, the set of quartz windows, the set of collimated optical assemblies, the illuminated fiber optic bundle, and the collection fiber optic bundle to measure a first signal.
摘要翻译： 提供一种具有用于等离子体发射的原位光询问室以定量测量归一化光发射光谱的处理系统。 处理室包括限制环组件，闪光灯和一组石英窗。 处理室还包括多个准直光学组件，多个准直光学组件光学耦合到该组石英窗口。 处理室还包括多个光纤束。 处理室还包括多通道光谱仪，多通道光谱仪配置有至少一个信号通道和一个参考通道，信号通道光学耦合到至少闪光灯，该组石英窗，该组 准直光学组件，照明光纤束和收集光纤束以测量第一信号。
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公开(公告)号：US08144328B2
公开(公告)日：2012-03-27
申请号：US12418492
申请日：2009-04-03
IPC分类号： G01N21/00
CPC分类号： G01N21/274 , G01J3/02 , G01J3/0205 , G01J3/0218 , G01J3/0294 , G01J3/443 , G01N21/68
摘要： An arrangement for in-situ optical interrogation of plasma emission to quantitatively measure normalized optical emission spectra in a plasma chamber is provided. The arrangement includes a flash lamp and a set of quartz windows. The arrangement also includes a plurality of collimated optical assemblies, which is optically coupled to the set of quartz windows. The arrangement further includes a plurality of fiber optic bundles, which comprises at least an illumination fiber optic bundle, a collection fiber optic bundle, and a reference fiber optic bundle. The arrangement more over includes a multi-channel spectrometer, which is configured with at least a signal channel and a reference channel. The signal channel is optically coupled to at least the flash lamp, the set of quartz windows, the set of collimated optical assemblies, the illuminated fiber optic bundle, and the collection fiber optic bundle to measure a first signal.
摘要翻译： 提供了用于等离子体发射的原位光询问以定量测量等离子体室中的归一化光发射光谱的布置。 该装置包括闪光灯和一组石英窗。 该布置还包括多个准直的光学组件，其光耦合到该组石英窗口。 该布置还包括多个光纤束，其包括至少照明光纤束，收集光纤束和参考光纤束。 更多的布置包括多通道光谱仪，其被配置有至少一个信号通道和参考通道。 信号通道光学耦合到至少闪光灯，该组石英窗，该组准直光学组件，照明光纤束和收集光纤束以测量第一信号。
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公开(公告)号：US20090251700A1
公开(公告)日：2009-10-08
申请号：US12418492
申请日：2009-04-03
IPC分类号： G01N21/25
CPC分类号： G01N21/274 , G01J3/02 , G01J3/0205 , G01J3/0218 , G01J3/0294 , G01J3/443 , G01N21/68
摘要： An arrangement for in-situ optical interrogation of plasma emission to quantitatively measure normalized optical emission spectra in a plasma chamber is provided. The arrangement includes a flash lamp and a set of quartz windows. The arrangement also includes a plurality of collimated optical assemblies, which is optically coupled to the set of quartz windows. The arrangement further includes a plurality of fiber optic bundles, which comprises at least an illumination fiber optic bundle, a collection fiber optic bundle, and a reference fiber optic bundle. The arrangement more over includes a multi-channel spectrometer, which is configured with at least a signal channel and a reference channel. The signal channel is optically coupled to at least the flash lamp, the set of quartz windows, the set of collimated optical assemblies, the illuminated fiber optic bundle, and the collection fiber optic bundle to measure a first signal.
摘要翻译： 提供了用于等离子体发射的原位光询问以定量测量等离子体室中的归一化光发射光谱的布置。 该装置包括闪光灯和一组石英窗。 该布置还包括多个准直的光学组件，其光耦合到该组石英窗口。 该布置还包括多个光纤束，其包括至少照明光纤束，收集光纤束和参考光纤束。 更多的布置包括多通道光谱仪，其被配置有至少一个信号通道和参考通道。 信号通道光学耦合到至少闪光灯，该组石英窗，该组准直光学组件，照明光纤束和收集光纤束以测量第一信号。
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公开(公告)号：US20120170039A1
公开(公告)日：2012-07-05
申请号：US13415763
申请日：2012-03-08
IPC分类号： G01J3/42
CPC分类号： G01N21/274 , G01J3/02 , G01J3/0205 , G01J3/0218 , G01J3/0294 , G01J3/443 , G01N21/68
摘要： A processing system having a chamber for in-situ optical interrogation of plasma emission to quantitatively measure normalized optical emission spectra is provided. The processing chamber includes a confinement ring assembly, a flash lamp, and a set of quartz windows. The processing chamber also includes a plurality of collimated optical assemblies, the plurality of collimated optical assemblies are optically coupled to the set of quartz windows. The processing chamber also includes a plurality of fiber optic bundles. The processing chamber also includes a multi-channel spectrometer, the multi-channel spectrometer is configured with at least a signal channel and a reference channel, the signal channel is optically coupled to at least the flash lamp, the set of quartz windows, the set of collimated optical assemblies, the illuminated fiber optic bundle, and the collection fiber optic bundle to measure a first signal.
摘要翻译： 提供一种具有用于等离子体发射的原位光询问室以定量测量归一化光发射光谱的处理系统。 处理室包括限制环组件，闪光灯和一组石英窗。 处理室还包括多个准直光学组件，多个准直光学组件光学耦合到该组石英窗口。 处理室还包括多个光纤束。 处理室还包括多通道光谱仪，多通道光谱仪配置有至少一个信号通道和一个参考通道，信号通道光学耦合到至少闪光灯，该组石英窗，该组 准直光学组件，照明光纤束和收集光纤束以测量第一信号。
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7.发明申请公开(公告)号：US20090002836A1
公开(公告)日：2009-01-01
申请号：US11772008
申请日：2007-06-29
IPC分类号： G02B27/30
CPC分类号： H05H1/0025 , G02B27/30
摘要： A method for optical interrogation of plasma during plasma processing in a plasma processing chamber is provided. The method includes providing an optical viewport. The method also includes providing a collimator arrangement. The collimator arrangement is configured with a plurality of collimators, wherein a first collimator of the plurality of collimators is separated by a connecting region from a second collimator in the plurality of collimators. The method further includes collecting optical signals, through the collimator arrangement, from the plasma within the plasma processing chamber while a substrate is being processed, resulting in highly collimated optical signals.
摘要翻译： 提供了一种在等离子体处理室中的等离子体处理期间对等离子体进行光询问的方法。 该方法包括提供光学视口。 该方法还包括提供准直器装置。 准直器装置配置有多个准直器，其中多个准直器中的第一准直仪由多个准直器中的第二准直器的连接区域分开。 该方法还包括在正在处理衬底的同时通过准直器装置从等离子体处理室内的等离子体收集光信号，导致高度准直的光信号。
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8.发明申请公开(公告)号：US20100332013A1
公开(公告)日：2010-12-30
申请号：US12826562
申请日：2010-06-29
IPC分类号： G06F19/00
CPC分类号： G05B23/0254 , G05B2219/37224
摘要： A method for predicting etch rate uniformity for qualifying health status of a processing chamber during substrate processing of substrates is provided. The method includes executing a recipe and receiving processing data from a first set of sensors. The method further includes analyzing the processing data utilizing a subsystem health check predictive model to determine calculated data, which includes at least one of etch rate data and uniformity data. The subsystem health check predictive model is constructed by correlating measurement data from a set of film substrates with processing data collected during analogous processing of a set of non-film substrates. The method yet also includes performing a comparison of the calculated data against a set of control limits as defined by the subsystem health check predictive model. The method yet further includes generating a warning if the calculated data is outside of the set of control limits.
摘要翻译： 提供了一种用于在衬底的衬底处理期间预测用于限定处理室的健康状况的蚀刻速率均匀性的方法。 该方法包括执行食谱并从第一组传感器接收处理数据。 该方法还包括利用子系统健康检查预测模型来分析处理数据，以确定计算出的数据，其包括蚀刻速率数据和均匀性数据中的至少一个。 通过将来自一组膜基底的测量数据与在一组非膜基底的类似处理期间收集的处理数据相关联来构建子系统健康检查预测模型。 该方法还包括执行计算数据与由子系统健康检查预测模型定义的一组控制限制的比较。 该方法还包括如果所计算的数据超出该组控制限制，则产生警告。
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9.发明授权Arrangement for identifying uncontrolled events at the process module level and methods thereof 有权用于在过程模块级别识别不受控制的事件的安排及其方法公开(公告)号：US08983631B2
公开(公告)日：2015-03-17
申请号：US12555674
申请日：2009-09-08
IPC分类号： G05B11/01 , G06F19/00 , G06F9/50 , G05B19/418 , G06F11/20
CPC分类号： G06F9/5027 , G05B19/4184 , G05B2219/31202 , G05B2219/31293 , G05B2219/31318 , G05B2219/31481 , G05B2219/32209 , G05B2219/45031 , G06F11/2035 , G06F11/2043 , Y02P90/14 , Y02P90/18
摘要： A process-level troubleshooting architecture (PLTA) configured to facilitate substrate processing in a plasma processing system is provided. The architecture includes a process module controller. The architecture also includes a plurality of sensors, wherein each sensor of the plurality of sensors communicates with the process module controller to collect sensed data about one or more process parameters. The architecture further includes a process-module-level analysis server, wherein the process-module-level analysis server communicates directly with the plurality of sensors and the process module controller. The process-module-level analysis server is configured for receiving data, wherein the data include at least one of the sensed data from the plurality of sensors and process module and chamber data from the process module controller. The process-module-level analysis server is also configured for analyzing the data and sending interdiction data directly to the process module controller when a problem is identified during the substrate processing.
摘要翻译： 提供了一种配置为促进等离子体处理系统中的基板处理的过程级故障排除架构（PLTA）。 该架构包括一个进程模块控制器。 该架构还包括多个传感器，其中多个传感器中的每个传感器与过程模块控制器通信以收集关于一个或多个过程参数的感测数据。 该体系结构还包括一个过程模块级分析服务器，其中过程模块级分析服务器与多个传感器和过程模块控制器直接通信。 过程模块级分析服务器被配置为用于接收数据，其中数据包括来自多个传感器的感测数据中的至少一个以及来自处理模块控制器的处理模块和室数据。 过程模块级分析服务器还被配置为当在衬底处理期间识别出问题时，分析数据并将拦截数据直接发送到过程模块控制器。
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10.发明授权公开(公告)号：US08650002B2
公开(公告)日：2014-02-11
申请号：US12499696
申请日：2009-07-08
CPC分类号： H01J37/32935
摘要： A test system for facilitating determining whether a plasma processing system (which includes a plasma processing chamber) is ready for processing wafers. The test system may include a computer-readable medium storing at least a test program. The test program may include code for receiving electric parameter values derived from signals detected by at least one sensor when no plasma is present in the plasma processing chamber. The test program may also include code for generating electric model parameter values using the electric parameter values and a mathematical model. The test program may also include code for comparing the electric model parameter values with baseline model parameter value information. The test program may also include code for determining readiness of the plasma processing system based on the comparison. The test system may also include circuit hardware for performing one or more tasks associated with the test program.
摘要翻译： 用于有助于确定等离子体处理系统（其包括等离子体处理室）是否准备好用于处理晶片的测试系统。 测试系统可以包括至少存储测试程序的计算机可读介质。 测试程序可以包括用于接收由等离子体处理室中没有等离子体时由至少一个传感器检测到的信号导出的电参数值的代码。 测试程序还可以包括使用电参数值和数学模型产生电模型参数值的代码。 测试程序还可以包括用于将电模型参数值与基准模型参数值信息进行比较的代码。 测试程序还可以包括用于基于比较来确定等离子体处理系统的准备状态的代码。 测试系统还可以包括用于执行与测试程序相关联的一个或多个任务的电路硬件。
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