Method of making color filter arrays by transferring colorant material
    1.
    发明授权
    Method of making color filter arrays by transferring colorant material 失效
    通过转移着色剂材料制造滤色器阵列的方法

    公开(公告)号:US5756240A

    公开(公告)日:1998-05-26

    申请号:US789590

    申请日:1997-01-24

    摘要: A method of making a color filter array on a first substrate having an array of pixels is disclosed. The method includes depositing and patterning a photoresist layer on the substrate layer to form selected openings over pixels in the array; providing a colorant layer having a transferable colorant material on a second substrate and positioning the second substrate such that the transferable colorant material is in transferable relationship with the first substrate; transferring the colorant material to the photoresist layer on the first substrate; and removing the patterned photoresist layer leaving behind the colorant material in the position of the openings over the selected pixels.

    摘要翻译: 公开了一种在具有像素阵列的第一基板上制作滤色器阵列的方法。 该方法包括沉积和图案化基底层上的光致抗蚀剂层以在阵列中的像素上形成选定的开口; 在第二基板上提供具有可转印着色剂材料的着色剂层,并且定位所述第二基板,使得所述可转印着色剂材料与所述第一基板具有可转移的关系; 将着色剂材料转移到第一衬底上的光致抗蚀剂层; 以及去除在所选择的像素上的开口位置留下着色剂材料的图案化光致抗蚀剂层。

    Method of making color filter arrays by transferring colorant and
lift-off
    2.
    发明授权
    Method of making color filter arrays by transferring colorant and lift-off 失效
    通过转移着色剂和剥离来制造滤色器阵列的方法

    公开(公告)号:US5900339A

    公开(公告)日:1999-05-04

    申请号:US976219

    申请日:1997-11-21

    摘要: A method of making a color filter array on a first substrate is disclosed. The method includes depositing and patterning a photoresist layer on the substrate to form openings over selected regions of the substrate; providing a colorant layer having a heat transferable colorant material on a second substrate and positioning the second substrate such that the heat transferable colorant layer is in transferable relationship with but spaced a distance from the first substrate; heating the second substrate sufficiently to cause substantially all of the heat transferable colorant material to transfer across the spaced distance to the patterned photoresist layer on the first substrate; and removing the patterned photoresist layer leaving behind the heat transferable colorant material in the position of the openings over the selected regions of the first substrate.

    摘要翻译: 公开了一种在第一衬底上制作滤色器阵列的方法。 该方法包括在衬底上沉积和图案化光致抗蚀剂层,以在衬底的选定区域上形成开口; 提供在第二基板上具有可传热着色剂材料的着色剂层,并且定位所述第二基板,使得所述可热转印着色剂层与所述第一基板具有可转移的关系,但间隔开距离; 充分加热第二基板以使基本上所有的可热传递的着色剂材料跨越间隔距离传递到第一基底上的图案化光致抗蚀剂层; 以及去除在第一基底的选定区域上的开口位置留下可传热着色剂材料的图案化光致抗蚀剂层。

    Unitary intensifying screen and radiographic element
    5.
    发明授权
    Unitary intensifying screen and radiographic element 失效
    单一增强屏幕和放射照相元件

    公开(公告)号:US4865944A

    公开(公告)日:1989-09-12

    申请号:US208708

    申请日:1988-06-20

    CPC分类号: G03C5/17 G03C5/16

    摘要: A unitary intensifying screen and radiographic element are disclosed comprised of adjacently coated silver halide emulsion and X radiation absorbing fluorescent layers. The fluorescent layer (a) is capable of attenuating at least 5 percent of a reference X radiation exposure produced by a Mo target tube operated at 28 kVp with a three phase power supply, wherein the reference X radiation exposure passes through 0.03 mm of Mo and 4.5 cm of poly(methyl methacrylate) to reach the fluorescent layer mounted 25 cm from a Mo anode of the target tube and attenuation is measured 50 cm beyond the fluorescent layer, (b) contains a phosphor which exhibits a conversion efficiency at least equal to that of calcium tungstate, (c) exhibits modulation transfer factors greater than those of reference curve A in FIG. 3, and (d) exhibits an optical density of less than 1.0. The emulsion and fluorescent layers are contiguously coated or optically coupled through a transmission medium transparent to latent image forming radiation and having a refractive index of at least 1.33, and the silver halide emulsion layer contains an agent for promoting the oxidation of silver atoms to silver ions to offset the effects of background radiation.

    Method of making color filter arrays
    6.
    发明授权
    Method of making color filter arrays 失效
    制作滤色片阵列的方法

    公开(公告)号:US5981112A

    公开(公告)日:1999-11-09

    申请号:US976337

    申请日:1997-11-21

    申请人: Luther C. Roberts

    发明人: Luther C. Roberts

    摘要: A method of making a color filter array on a first substrate comprising the steps of: providing at least one transferable colorant layer on a second substrate and positioning such transferable layers in transferable relationship with but spaced a distance from the first substrate; and heating the second substrate sufficiently to simultaneously transfer the colorant materials from the heat transferable colorant layers to the first substrate. Unwanted colorant is then removed by a lift-off process, by chemical mechanical polishing, or by etching, leaving behind the colorant materials in the position of the openings over selected regions.

    摘要翻译: 一种在第一衬底上制造滤色器阵列的方法,包括以下步骤:在第二衬底上提供至少一个可转移着色剂层,并将这些可转移层定位成可转移的关系,但与第一衬底间隔开距离; 并且充分加热第二基板以同时将着色剂材料从可传热着色剂层转移到第一基板。 然后通过剥离过程,化学机械抛光或通过蚀刻将不需要的着色剂除去,使着色剂材料留在选定区域上的开口位置。

    Method of making color filter arrays by colorant transfer using chemical
mechanical polishing
    8.
    发明授权
    Method of making color filter arrays by colorant transfer using chemical mechanical polishing 失效
    使用化学机械抛光通过着色剂转印制造滤色器阵列的方法

    公开(公告)号:US5776641A

    公开(公告)日:1998-07-07

    申请号:US787732

    申请日:1997-01-24

    IPC分类号: B41M5/385 G02B5/20 G03F7/00

    摘要: A method of making a color filter array on a first substrate having an array of pixels, comprising the steps of: depositing and patterning a photoresist layer on the substrate layer to form selected openings over pixels in the array; providing a transferable colorant layer on a second substrate and positioning such transferable layer in transferable relationship with the first substrate; transferring the colorant material to the photoresist layer on the first substrate, removing the patterned photoresist layer by chemical mechanical polishing, leaving behind the colorant material in the position of the openings over the selected pixels.

    摘要翻译: 一种在具有像素阵列的第一衬底上制造滤色器阵列的方法,包括以下步骤:在所述衬底层上沉积和图案化光致抗蚀剂层以在所述阵列中的像素上形成选定的开口; 在第二基底上提供可转移的着色剂层,并将这种可转移层定位成与第一基底可转移的关系; 将着色剂材料转移到第一衬底上的光致抗蚀剂层,通过化学机械抛光去除图案化的光刻胶层,使着色剂材料留在所选择的像素上的开口位置。