ANTIREFLECTIVE COATING COMPOSITION AND PROCESS THEREOF
    1.
    发明申请
    ANTIREFLECTIVE COATING COMPOSITION AND PROCESS THEREOF 有权
    抗反射涂料组合物及其工艺

    公开(公告)号:US20140370444A1

    公开(公告)日:2014-12-18

    申请号:US13917022

    申请日:2013-06-13

    IPC分类号: G03F7/09 C09D165/00

    摘要: The present invention relates to an absorbing hard mask antireflective coating composition comprising a novel polymer, where the novel polymer comprises in the backbone of the polymer four repeat units -A-, -B-, -C- and -D-, where A is repeat unit which comprises a fused aromatic ring in its backbone, B has the structure (1), C is a hydroxylbiphenyl of structure (2) and D is a derivatized fluorene of structure (3), where R1 is C1-C4alkyl, R2 is C1-C4alkyl, R3 and R4 are independently hydrogen or C1-C4 alkyl, and Ar′ and Ar″ are independently phenylenic, or naphthalenic derived moieties, R5 and R6 are independently —OH or —CH2)nOH where n=2-4, and R7 and R8 are independently hydrogen or C1-C4 alkyl. This invention also relates to a process for forming an image using the novel antireflective coating composition.

    摘要翻译: 本发明涉及一种包含新型聚合物的吸收性硬掩模抗反射涂料组合物,其中新型聚合物在聚合物的主链中包含四个重复单元-A-, - B - , - C-和-D-,其中A为 重复单元在其骨架中包含稠合芳环,B具有结构(1),C是结构(2)的羟基联苯,D是结构式(3)的衍生化芴,其中R 1是C 1 -C 4烷基,R 2是 C 1 -C 4烷基,R 3和R 4独立地为氢或C 1 -C 4烷基,Ar'和Ar“独立地为亚苯基或萘衍生部分,R 5和R 6独立地为-OH或-CH 2)n OH,其中n = 并且R 7和R 8独立地为氢或C 1 -C 4烷基。 本发明还涉及使用新型抗反射涂料组合物形成图像的方法。