公开(公告)号：US20180044813A1

公开(公告)日：2018-02-15

申请号：US15551052

申请日：2016-02-23

Applicant: MACDERMID ENTHONE, INC.

Inventor： Frank Noffke ,  Andreas Konigshofen ,  Axel Fuhrmann ,  Christoph Werner

IPC: C25D21/11 ,  C09K15/26 ,  C08J7/06 ,  C25D5/56 ,  C25D5/34 ,  C23C18/38 ,  C23C18/16 ,  C23C18/20 ,  C23C18/22 ,  C23C18/30 ,  C23C18/32 ,  C09K15/30 ,  C25D17/08

CPC classification number: C25D21/11 ,  C08J7/02 ,  C08J7/06 ,  C08J7/065 ,  C09K15/26 ,  C09K15/30 ,  C23C18/1625 ,  C23C18/1653 ,  C23C18/2086 ,  C23C18/22 ,  C23C18/30 ,  C23C18/32 ,  C23C18/38 ,  C25D5/34 ,  C25D5/56 ,  C25D17/08

Abstract: The invention relates to an aqueous inhibition composition for the inhibition of electrochemical metal plating on polymer surfaces, said inhibition composition comprising an inhibition agent selected from the group of compounds having at least one sulfur and at least one nitrogen atom as well as to a method for the inhibition of an insulated surface of a rack area. The inventive inhibition composition is capable to provide a solution for prohibiting unintended metallization on insulated areas of the racks when non-chromic etching is utilized for plating on plastics processes.