公开(公告)号：US09442366B2

公开(公告)日：2016-09-13

申请号：US14588013

申请日：2014-12-31

Applicant: MACRONIX International Co., Ltd.

Inventor： Chiung-Jung Tu ,  Chih-Hao Huang

IPC: G03F1/38 ,  G03F1/36

CPC classification number: G03F1/38 ,  G03F1/36

Abstract: A layout pattern and a photomask including the layout pattern are provided. The layout pattern includes a plurality of main patterns and at least one auxiliary pattern. The main patterns are arranged in parallel to one another and extend in a first direction. The at least one auxiliary pattern is located between two outermost main patterns and connects the two outermost main patterns. The at least one auxiliary pattern is arranged in a second direction. The second direction is different from the first direction.

Abstract translation: 提供布局图案和包括布局图案的光掩模。 布局图案包括多个主图案和至少一个辅助图案。 主图案彼此平行布置并沿第一方向延伸。 至少一个辅助图案位于两个最外面的主图案之间并且连接两个最外面的主图案。 所述至少一个辅助图案被布置在第二方向上。 第二个方向与第一个方向不同。

公开(公告)号：US20160187768A1

公开(公告)日：2016-06-30

申请号：US14588013

申请日：2014-12-31

Applicant: MACRONIX International Co., Ltd.

Inventor： Chiung-Jung Tu ,  Chih-Hao Huang

IPC: G03F1/42

CPC classification number: G03F1/38 ,  G03F1/36

Abstract: A layout pattern and a photomask including the layout pattern are provided. The layout pattern includes a plurality of main patterns and at least one auxiliary pattern. The main patterns are arranged in parallel to one another and extend in a first direction. The at least one auxiliary pattern is located between two outermost main patterns and connects the two outermost main patterns. The at least one auxiliary pattern is arranged in a second direction. The second direction is different from the first direction.

Abstract translation: 提供布局图案和包括布局图案的光掩模。 布局图案包括多个主图案和至少一个辅助图案。 主图案彼此平行布置并沿第一方向延伸。 至少一个辅助图案位于两个最外面的主图案之间并且连接两个最外面的主图案。 所述至少一个辅助图案被布置在第二方向上。 第二个方向与第一个方向不同。