公开(公告)号：US07513194B2

公开(公告)日：2009-04-07

申请号：US11790677

申请日：2007-04-26

申请人： Naoto Yanagihara ,  Masayuki Seto ,  Mikio Nakashima ,  Nobuyuki Ushifusa

发明人： Naoto Yanagihara ,  Masayuki Seto ,  Mikio Nakashima ,  Nobuyuki Ushifusa

IPC分类号： B41N1/24

CPC分类号： B41N1/247 ,  H05K3/1225

摘要： A screen mask includes a screen mesh with a tensioning force of 196 to 392 N/mm; a tension mesh with a tensioning force of 49 to 98 N/mm; a resin plate (fixing part) arranged so as to surround the outer periphery of the screen mesh for fixing a part of the tension mesh with a tensioning force of 392 to 980 N/mm; and a screen frame. A length Ls of the screen mesh in a first direction intersecting a direction in which a squeegee squeegees on the screen mesh when performing a screen printing is 0.6 to 0.9 times a length Lt of the tension mesh in the first direction, a length Lk of the resin plate, the length Ls, and the length Lt in the first direction satisfy a relationship Lk=a(Lt+Ls)/2, where “a” is a coefficient in a range of 0.5 to 1.2.

摘要翻译： 屏幕掩模包括具有196至392N / mm的张力的筛网; 拉伸力为49〜98N / mm的张力网; 布置成围绕所述筛网的外周的树脂板（固定部），用于以392〜980N / mm的张力固定所述张力网的一部分; 和屏幕框架。 在进行丝网印刷时，与筛网上的刮板刮擦方向相交的第一方向的筛网长度Ls为第一方向上的张力网的长度Lt的0.6〜0.9倍， 树脂板，长度Ls和第一方向上的长度Lt满足关系Lk = a（Lt + Ls）/ 2，其中“a”是0.5至1.2范围内的系数。

公开(公告)号：US20080034991A1

公开(公告)日：2008-02-14

申请号：US11657559

申请日：2007-01-25

申请人： Mikio Nakashima ,  Naoto Yanagihara ,  Masayuki Seto ,  Nobuyuki Ushifusa

发明人： Mikio Nakashima ,  Naoto Yanagihara ,  Masayuki Seto ,  Nobuyuki Ushifusa

IPC分类号： B41M1/12

CPC分类号： B41M1/12 ,  B41F15/0818 ,  B41F15/14 ,  B41P2215/112 ,  B41P2215/50 ,  H05K3/0008 ,  H05K3/1216 ,  H05K2203/1476

摘要： A technique which enables screen printing on a large printed object is provided. A screen frame of a screen mask has a lower surface (third surface), a screen-mesh holding unit which holds a screen mesh, a surface (fourth surface) which is different from the lower surface, and a screen-frame fixing unit which is fixed in a state in which a first contact region which is a part or the entirety of the surface is in contact with a screen-frame holder of a printing device. The position of the first contact region in a cross section of the screen frame cut from the upper surface toward the lower surface is present above the lower surface.

摘要翻译： 提供了能够在大型印刷对象上进行丝网印刷的技术。 屏幕掩模的屏幕框架具有下表面（第三表面），保持筛网的筛网保持单元，与下表面不同的表面（第四表面）和屏幕框架固定单元，其中 固定在其中表面的一部分或全部的第一接触区域与打印装置的屏幕框架保持器接触的状态。 从上表面向下表面切割的屏幕框架的横截面中的第一接触区域的位置存在于下表面的上方。

公开(公告)号：US20080098911A1

公开(公告)日：2008-05-01

申请号：US11790677

申请日：2007-04-26

申请人： Naoto Yanagihara ,  Masayuki Seto ,  Mikio Nakashima ,  Nobuyuki Ushifusa

发明人： Naoto Yanagihara ,  Masayuki Seto ,  Mikio Nakashima ,  Nobuyuki Ushifusa

IPC分类号： B41N1/24

CPC分类号： B41N1/247 ,  H05K3/1225

摘要： A screen mask includes a screen mesh with a tensioning force of 196 to 392 N/mm; a tension mesh with a tensioning force of 49 to 98 N/mm; a resin plate (fixing part) arranged so as to surround the outer periphery of the screen mesh for fixing a part of the tension mesh with a tensioning force of 392 to 980 N/mm; and a screen frame. A length Ls of the screen mesh in a first direction intersecting a direction in which a squeegee squeegees on the screen mesh when performing a screen printing is 0.6 to 0.9 times a length Lt of the tension mesh in the first direction, a length Lk of the resin plate, the length Ls, and the length Lt in the first direction satisfy a relationship Lk=a(Lt+Ls)/2, where “a” is a coefficient in a range of 0.5 to 1.2.

摘要翻译： 屏幕掩模包括具有196至392N / mm的张力的筛网; 拉伸力为49〜98N / mm的张力网; 布置成围绕所述筛网的外周的树脂板（固定部），用于以392〜980N / mm的张力固定所述张力网的一部分; 和屏幕框架。 在进行丝网印刷时，与筛网上的刮板刮擦方向相交的第一方向的筛网长度Ls为第一方向上的张力网的长度Lt的0.6〜0.9倍， 树脂板，长度Ls和第一方向上的长度Lt满足关系Lk = a（Lt + Ls）/ 2，其中“a”是0.5至1.2范围内的系数。

公开(公告)号：US20080078297A1

公开(公告)日：2008-04-03

申请号：US11740321

申请日：2007-04-26

申请人： MASAYUKI SETO ,  Naoto Yanagihara ,  Mikio Nakashima

发明人： MASAYUKI SETO ,  Naoto Yanagihara ,  Mikio Nakashima

IPC分类号： B41L13/18

CPC分类号： B41F15/36 ,  H05K3/1225

摘要： The invention provides a technique which can improve a printing precision of a screen printing. A fixing mechanism for fixing a screen mask of a printer to a mask holder is structured such as to include a first fixing mechanism fixing sides of four sides of a frame existing in an outer peripheral edge of the screen mask arranged along an arrow corresponding to a sliding direction of a squeegee, and the mask holder, and a second fixing mechanism fixing a side of four sides of the frame arranged along a direction intersecting the arrow and in an opposite direction to the arrow as seen from the slide starting position, and the mask holder.

摘要翻译： 本发明提供了一种能够提高丝网印刷的打印精度的技术。 一种用于将打印机的屏幕掩模固定到掩模保持器的固定机构被构造成包括：第一固定机构，其固定在沿着对应于所述屏幕的箭头布置的屏幕的外围边缘中存在的框架的四边的侧面 刮板的滑动方向和掩模保持器，以及固定沿着与箭头相交的方向布置的框架的四侧的方向和与从滑动开始位置看的箭头相反的方向的第二固定机构， 面具座。

公开(公告)号：US09598320B2

公开(公告)日：2017-03-21

申请号：US14110734

申请日：2012-04-19

申请人： Naomichi Hori ,  Mikio Nakashima

发明人： Naomichi Hori ,  Mikio Nakashima

IPC分类号： C04B35/46 ,  C04B35/50 ,  C01G23/00 ,  C01G25/00 ,  F27B7/28 ,  F27B7/20 ,  F27D1/00

CPC分类号： C04B35/50 ,  C01G23/005 ,  C01G25/006 ,  F27B7/20 ,  F27B7/28 ,  F27D1/0006

摘要： Provided is a method of producing a composite metal oxide including, to calcine a composition containing an alkali metal and obtain a composite metal oxide, calcining the composition while being arranged on a mount a part of which in contact with the composition is formed of a metal oxide component. The metal oxide component has a content of K atoms ranging from 5 to 13 parts by weight in terms of K2O with respect to 100 parts by weight of the metal oxide component, and a total content of Al atoms, Zr atoms, Mg atoms, and Ce atoms ranging from 15 to 70 parts by weight in terms of oxides with respect to 100 parts by weight of the metal oxide component. The present invention thus provides a method of producing a composite metal oxide containing an alkali metal with reduced production costs.

公开(公告)号：US08266820B2

公开(公告)日：2012-09-18

申请号：US13209741

申请日：2011-08-15

申请人： Hideki Nishimura ,  Mikio Nakashima

发明人： Hideki Nishimura ,  Mikio Nakashima

IPC分类号： F26B3/00

CPC分类号： H01L21/67109 ,  H01L21/02052 ,  H01L21/67034 ,  H01L21/67248

摘要： A substrate processing method which can reduce the number of particles to be left on each substrate is provided. In the substrate processing method, substrates W to be processed are dried, by using a fluid heated by a heating apparatus having one or more heating mechanisms. The substrate processing method comprises a first step of supplying a mixed fluid containing a gas and a processing liquid and heated by the heating apparatus, into a processing chamber in which the substrates to be processed are placed, and a second step of supplying the heated gas into the processing chamber. The output of at least one of the heating mechanisms is kept at a preset constant value for a period of time during which a predetermined time passes after the start of the first step. In the second step, the output of the heating mechanism is determined under a feed back control.

摘要翻译： 提供了可以减少要留在每个基板上的颗粒数量的基板处理方法。 在基板处理方法中，通过使用由具有一个或多个加热机构的加热装置加热的流体来干燥待加工的基板W. 基板处理方法包括：第一步骤，将含有气体和处理液体的混合流体供给并被加热装置加热到其中放置待处理基板的处理室中;以及第二步骤， 进入处理室。 至少一个加热机构的输出在第一步骤开始之后的预定时间过去的一段时间内保持在预设的恒定值。 在第二步骤中，在反馈控制下确定加热机构的输出。

公开(公告)号：US20110296707A1

公开(公告)日：2011-12-08

申请号：US13209741

申请日：2011-08-15

申请人： Hideki NISHIMURA ,  Mikio Nakashima

发明人： Hideki NISHIMURA ,  Mikio Nakashima

IPC分类号： F26B3/02

CPC分类号： H01L21/67109 ,  H01L21/02052 ,  H01L21/67034 ,  H01L21/67248

摘要： A substrate processing method which can reduce the number of particles to be left on each substrate is provided. In the substrate processing method, substrates W to be processed are dried, by using a fluid heated by a heating apparatus having one or more heating mechanisms. The substrate processing method comprises a first step of supplying a mixed fluid containing a gas and a processing liquid and heated by the heating apparatus, into a processing chamber in which the substrates to be processed are placed, and a second step of supplying the heated gas into the processing chamber. The output of at least one of the heating mechanisms is kept at a preset constant value for a period of time during which a predetermined time passes after the start of the first step. In the second step, the output of the heating mechanism is determined under a feed back control.

摘要翻译： 提供了可以减少要留在每个基板上的颗粒数量的基板处理方法。 在基板处理方法中，通过使用由具有一个或多个加热机构的加热装置加热的流体来干燥待加工的基板W. 基板处理方法包括：第一步骤，将含有气体和处理液体的混合流体供给并被加热装置加热到其中放置待处理基板的处理室中;以及第二步骤， 进入处理室。 至少一个加热机构的输出在第一步骤开始之后的预定时间过去的一段时间内保持在预设的恒定值。 在第二步骤中，在反馈控制下确定加热机构的输出。

公开(公告)号：US07593625B2

公开(公告)日：2009-09-22

申请号：US11481253

申请日：2006-07-06

申请人： Yuji Kamikawa ,  Mikio Nakashima ,  Osamu Tsuda

发明人： Yuji Kamikawa ,  Mikio Nakashima ,  Osamu Tsuda

IPC分类号： F24F3/14 ,  H05B3/40

CPC分类号： F24H1/101 ,  F24H1/162 ,  F28F2245/06

摘要： Disclosed is a fluid heating apparatus including a halogen lamp 23, and a tubular structure 26 surrounding the heating lamp and having a fluid inlet 24 and a fluid outlet 25. The tubular structure 26 comprises plural straight pipes 26a arrayed circumferentially around the halogen lamp 26, with adjacent straight pipes 26a being in contact with each other, or being slightly spaced from each other. At least the surfaces, facing the halogen lamp 26, of the straight pipes 26a are coated with a black paint 27, or a radiant-light-absorbing paint.

摘要翻译： 公开了一种包括卤素灯23和围绕加热灯并具有流体入口24和流体出口25的管状结构26的流体加热装置。管状结构26包括沿卤素灯26周向排列的多个直管26a， 相邻的直管26a彼此接触或者彼此稍微间隔开。 直管26a的至少面对卤素灯26的表面涂覆有黑色漆27或辐射光吸收涂料。

公开(公告)号：US20080060214A1

公开(公告)日：2008-03-13

申请号：US11896936

申请日：2007-09-06

申请人： Hideki Nishimura ,  Mikio Nakashima

发明人： Hideki Nishimura ,  Mikio Nakashima

IPC分类号： F26B3/00

CPC分类号： H01L21/67109 ,  H01L21/02052 ,  H01L21/67034 ,  H01L21/67248

摘要： A substrate processing method which can reduce the number of particles to be left on each substrate is provided. In the substrate processing method, substrates W to be processed are dried, by using a fluid heated by a heating apparatus having one or more heating mechanisms. The substrate processing method comprises a first step of supplying a mixed fluid containing a gas and a processing liquid and heated by the heating apparatus, into a processing chamber in which the substrates to be processed are placed, and a second step of supplying the heated gas into the processing chamber. The output of at least one of the heating mechanisms is kept at a preset constant value for a period of time during which a predetermined time passes after the start of the first step. In the second step, the output of the heating mechanism is determined under a feed back control.

摘要翻译： 提供了可以减少要留在每个基板上的颗粒数量的基板处理方法。 在基板处理方法中，通过使用由具有一个或多个加热机构的加热装置加热的流体来干燥待加工的基板W. 基板处理方法包括：第一步骤，将含有气体和处理液体的混合流体供给并被加热装置加热到其中放置待处理基板的处理室中;以及第二步骤， 进入处理室。 至少一个加热机构的输出在第一步骤开始之后的预定时间过去的一段时间内保持在预设的恒定值。 在第二步骤中，在反馈控制下确定加热机构的输出。

公开(公告)号：US20070017502A1

公开(公告)日：2007-01-25

申请号：US11481253

申请日：2006-07-06

申请人： Yuji Kamikawa ,  Mikio Nakashima ,  Osamu Tsuda

发明人： Yuji Kamikawa ,  Mikio Nakashima ,  Osamu Tsuda

IPC分类号： A47J27/62 ,  F24H9/20

CPC分类号： F24H1/101 ,  F24H1/162 ,  F28F2245/06

摘要： Disclosed is a fluid heating apparatus including a halogen lamp 23, and a tubular structure 26 surrounding the heating lamp and having a fluid inlet 24 and a fluid outlet 25. The tubular structure 26 comprises plural straight pipes 26a arrayed circumferentially around the halogen lamp 26, with adjacent straight pipes 26a being in contact with each other, or being slightly spaced from each other. At least the surfaces, facing the halogen lamp 26, of the straight pipes 26a are coated with a black paint 27, or a radiant-light-absorbing paint.

摘要翻译： 公开了一种流体加热装置，其包括卤素灯23和围绕加热灯并具有流体入口24和流体出口25的管状结构26。 管状结构26包括围绕卤素灯26周向排列的多个直管26a，相邻的直管26a彼此接触或彼此稍微间隔开。 直管26a的至少面向卤素灯26的表面涂覆有黑色漆27或辐射光吸收涂料。