Method and apparatus for deposition cleaning in a pumping line

    公开(公告)号:US11024489B2

    公开(公告)日:2021-06-01

    申请号:US16679640

    申请日:2019-11-11

    摘要: A method is provided for cleaning a pumping line having a plurality of inline plasma sources coupled thereto. The method includes supplying a cleaning gas to the pumping line from a wafer processing chamber connected to the pumping line. The method also includes generating a localized plasma at one or more of the plurality of inline plasma sources using the cleaning gas flowing in the pumping line. Each localized plasma is adapted to clean at least a portion of the pumping line. The method further includes determining one or more impedances of the localized plasma at the one or more inline plasma sources and monitoring the one or more impendences to detect an endpoint of the cleaning.

    Predictive diagnostics systems and methods using vacuum pressure control valves

    公开(公告)号:US10557736B2

    公开(公告)日:2020-02-11

    申请号:US15581875

    申请日:2017-04-28

    IPC分类号: G01F9/00 G01N17/00

    摘要: Calibration of a valve in a vacuum system and providing a diagnostic indication in the vacuum system using the calibration includes measuring conductance of the valve as a function of angular valve position and generating a conductance calibration map or function for use during operation of the valve. An actual angular valve position is set based on the received set point angular valve position and a difference between the measured valve conductance and a predefined metric of conductance versus angular valve position. An actual system conductance and a difference between the actual system conductance and a reference system conductance for the system are determined. The diagnostic indication of a fault in the system is generated based on the actual angular valve position of the valve and the difference between the actual system conductance and the reference system conductance for the system.

    Method and Apparatus for Deposition Cleaning in a Pumping Line

    公开(公告)号:US20200075298A1

    公开(公告)日:2020-03-05

    申请号:US16679640

    申请日:2019-11-11

    摘要: A vacuum pumping line plasma source is provided. The plasma source includes a body defining a generally cylindrical interior volume extending along a central longitudinal axis. The body has an input port for coupling to an input pumping line, an output port for coupling to an output pumping line, and an interior surface disposed about the generally cylindrical interior volume. The plasma source also includes a supply electrode disposed adjacent to a return electrode, and a barrier dielectric member, a least a portion of which is positioned between the supply electrode and the return electrode. The plasma source further includes a dielectric barrier discharge structure formed from the supply electrode, the return electrode, and the barrier dielectric member. The dielectric barrier discharge structure is adapted to generate a plasma in the generally cylindrical interior volume.

    Predictive diagnostics systems and methods using vacuum pressure control valves

    公开(公告)号:US11480457B2

    公开(公告)日:2022-10-25

    申请号:US16724844

    申请日:2019-12-23

    摘要: Calibration of a valve in a vacuum system and providing a diagnostic indication in the vacuum system using the calibration includes measuring conductance of the valve as a function of angular valve position and generating a conductance calibration map or function for use during operation of the valve. An actual angular valve position is set based on the received set point angular valve position and a difference between the measured valve conductance and a predefined metric of conductance versus angular valve position. An actual system conductance and a difference between the actual system conductance and a reference system conductance for the system are determined. The diagnostic indication of a fault in the system is generated based on the actual angular valve position of the valve and the difference between the actual system conductance and the reference system conductance for the system.

    Method and apparatus for deposition cleaning in a pumping line

    公开(公告)号:US11367598B2

    公开(公告)日:2022-06-21

    申请号:US17107146

    申请日:2020-11-30

    摘要: A vacuum pumping line plasma source is provided. The plasma source includes a body defining a generally cylindrical interior volume extending along a central longitudinal axis. The body has an input port for coupling to an input pumping line, an output port for coupling to an output pumping line, and an interior surface disposed about the generally cylindrical interior volume. The plasma source also includes a supply electrode disposed adjacent to a return electrode, and a barrier dielectric member, a least a portion of which is positioned between the supply electrode and the return electrode. The plasma source further includes a dielectric barrier discharge structure formed from the supply electrode, the return electrode, and the barrier dielectric member. The dielectric barrier discharge structure is adapted to generate a plasma in the generally cylindrical interior volume.

    Method and Apparatus for Deposition Cleaning in a Pumping Line

    公开(公告)号:US20210082672A1

    公开(公告)日:2021-03-18

    申请号:US17107146

    申请日:2020-11-30

    摘要: A vacuum pumping line plasma source is provided. The plasma source includes a body defining a generally cylindrical interior volume extending along a central longitudinal axis. The body has an input port for coupling to an input pumping line, an output port for coupling to an output pumping line, and an interior surface disposed about the generally cylindrical interior volume. The plasma source also includes a supply electrode disposed adjacent to a return electrode, and a barrier dielectric member, a least a portion of which is positioned between the supply electrode and the return electrode. The plasma source further includes a dielectric barrier discharge structure formed from the supply electrode, the return electrode, and the barrier dielectric member. The dielectric barrier discharge structure is adapted to generate a plasma in the generally cylindrical interior volume.

    Method and apparatus for deposition cleaning in a pumping line

    公开(公告)号:US10535506B2

    公开(公告)日:2020-01-14

    申请号:US15404457

    申请日:2017-01-12

    摘要: A vacuum pumping line plasma source is provided. The plasma source includes a body defining a generally cylindrical interior volume extending along a central longitudinal axis. The body has an input port for coupling to an input pumping line, an output port for coupling to an output pumping line, and an interior surface disposed about the generally cylindrical interior volume. The plasma source also includes a supply electrode disposed adjacent to a return electrode, and a barrier dielectric member, a least a portion of which is positioned between the supply electrode and the return electrode. The plasma source further includes a dielectric barrier discharge structure formed from the supply electrode, the return electrode, and the barrier dielectric member. The dielectric barrier discharge structure is adapted to generate a plasma in the generally cylindrical interior volume.

    PREDICTIVE DIAGNOSTICS SYSTEMS AND METHODS USING VACUUM PRESSURE CONTROL VALVES

    公开(公告)号:US20170328756A1

    公开(公告)日:2017-11-16

    申请号:US15581875

    申请日:2017-04-28

    IPC分类号: G01F9/00 G01N17/00

    摘要: Calibration of a valve in a vacuum system and providing a diagnostic indication in the vacuum system using the calibration includes measuring conductance of the valve as a function of angular valve position and generating a conductance calibration map or function for use during operation of the valve. An actual angular valve position is set based on the received set point angular valve position and a difference between the measured valve conductance and a predefined metric of conductance versus angular valve position. An actual system conductance and a difference between the actual system conductance and a reference system conductance for the system are determined. The diagnostic indication of a fault in the system is generated based on the actual angular valve position of the valve and the difference between the actual system conductance and the reference system conductance for the system.