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公开(公告)号：US20240284584A1
公开(公告)日：2024-08-22
申请号：US18112712
申请日：2023-02-22
Applicant: MKS Instruments, Inc.
Inventor： Ilya Pokidov , Chiu-Ying Tai , Joseph Desjardins , Gordon Hill , Michael Harris
CPC classification number: H05H1/52 , H05H1/4652 , H05H2242/10
Abstract: A plasma apparatus of a plasma processing system is provided. The plasma apparatus defines a toroidal plasma channel and includes multiple end blocks defining respective portions of the toroidal plasma channel. Each end block includes an end-block tube constructed from a first electrically conductive material and a dielectric coating disposed on an interior surface of the end-block tube. The plasma apparatus also includes multiple mid-blocks defining respective portions of the toroidal plasma channel. Each mid-block includes at least one heat sink located adjacent to a substantially linear tube with a thermal interface disposed therebetween. The thermal interface is in physical communication with the tube and the at least one heat sink. The mid-block tube has a substantially uniform wall thickness and is constructed from a dielectric material. The at least one heat sink is constructed from a second electrically conductive material.
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公开(公告)号：US11024489B2
公开(公告)日：2021-06-01
申请号：US16679640
申请日：2019-11-11
Applicant: MKS Instruments, Inc.
Inventor： Gordon Hill , Scott Benedict , Kevin Wenzel
Abstract: A method is provided for cleaning a pumping line having a plurality of inline plasma sources coupled thereto. The method includes supplying a cleaning gas to the pumping line from a wafer processing chamber connected to the pumping line. The method also includes generating a localized plasma at one or more of the plurality of inline plasma sources using the cleaning gas flowing in the pumping line. Each localized plasma is adapted to clean at least a portion of the pumping line. The method further includes determining one or more impedances of the localized plasma at the one or more inline plasma sources and monitoring the one or more impendences to detect an endpoint of the cleaning.
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公开(公告)号：US10557736B2
公开(公告)日：2020-02-11
申请号：US15581875
申请日：2017-04-28
Applicant: MKS Instruments, Inc.
Inventor： David Brian Chamberlain , Vladislav Davidkovich , Scott Benedict , Gordon Hill
Abstract: Calibration of a valve in a vacuum system and providing a diagnostic indication in the vacuum system using the calibration includes measuring conductance of the valve as a function of angular valve position and generating a conductance calibration map or function for use during operation of the valve. An actual angular valve position is set based on the received set point angular valve position and a difference between the measured valve conductance and a predefined metric of conductance versus angular valve position. An actual system conductance and a difference between the actual system conductance and a reference system conductance for the system are determined. The diagnostic indication of a fault in the system is generated based on the actual angular valve position of the valve and the difference between the actual system conductance and the reference system conductance for the system.
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公开(公告)号：US20190243392A1
公开(公告)日：2019-08-08
申请号：US15887447
申请日：2018-02-02
Applicant: MKS Instruments, Inc.
Inventor： Junhua Ding , Michael L'Bassi , Gordon Hill
IPC: G05D7/06 , G01F1/36 , C23C16/52 , C23C16/455
CPC classification number: G05D7/0647 , C23C16/45525 , C23C16/52 , G01F1/36 , G01F1/363 , G01F15/005
Abstract: A fluid control system for pulse delivery of a fluid include a flow channel, an isolation valve to initiate and terminate a pulse of fluid from the flow channel, and a pulse mass flow controller (MFC). The MFC includes a control valve to control flow of fluid in the flow channel, a flow sensor to measure flow rate in the flow channel, and a controller to control flow of fluid through the control valve and switching of the isolation valve, to control a mass of fluid delivered during the pulse of fluid. Controlling the flow of fluid through the control valve can be based on feedback from the flow sensor during the pulse initiated and terminated by the isolation valve.
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公开(公告)号：US12207385B2
公开(公告)日：2025-01-21
申请号：US18112712
申请日：2023-02-22
Applicant: MKS Instruments, Inc.
Inventor： Ilya Pokidov , Chiu-Ying Tai , Joseph Desjardins , Gordon Hill , Michael Harris
Abstract: A plasma apparatus of a plasma processing system is provided. The plasma apparatus defines a toroidal plasma channel and includes multiple end blocks defining respective portions of the toroidal plasma channel. Each end block includes an end-block tube constructed from a first electrically conductive material and a dielectric coating disposed on an interior surface of the end-block tube. The plasma apparatus also includes multiple mid-blocks defining respective portions of the toroidal plasma channel. Each mid-block includes at least one heat sink located adjacent to a substantially linear tube with a thermal interface disposed therebetween. The thermal interface is in physical communication with the tube and the at least one heat sink. The mid-block tube has a substantially uniform wall thickness and is constructed from a dielectric material. The at least one heat sink is constructed from a second electrically conductive material.
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Patent Agency Ranking
公开(公告)号：US11664197B2
公开(公告)日：2023-05-30
申请号：US17391724
申请日：2021-08-02
Applicant: MKS Instruments, Inc.
Inventor： Gordon Hill , Andrew Cowe , Ron Collins , Larry Bourget
CPC classification number: H01J37/32541 , C23C16/4405 , C23C16/50 , H01J37/32577 , H01J37/32862
Abstract: A plasma source is provided that includes a body defining an input port, an output port, and at least one discharge section extending along a central longitudinal axis between the input port and the output port. The at least one discharge section includes a return electrode defining a first generally cylindrical interior volume having a first interior diameter, a supply plate comprising a supply electrode, the supply plate defining a second generally cylindrical interior volume having a second interior diameter, and at least one spacer defining a third generally cylindrical interior volume having a third interior diameter. The third interior diameter is different from the first or second interior diameter. The at least one discharge section is formed from the spacer arranged between the return electrode and the supply plate along the central longitudinal axis to define a generally cylindrical discharge gap for generating a plasma therein.
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公开(公告)号：US11480457B2
公开(公告)日：2022-10-25
申请号：US16724844
申请日：2019-12-23
Applicant: MKS Instruments, Inc.
Inventor： David Brian Chamberlain , Vladislav Davidkovich , Scott Benedict , Gordon Hill
Abstract: Calibration of a valve in a vacuum system and providing a diagnostic indication in the vacuum system using the calibration includes measuring conductance of the valve as a function of angular valve position and generating a conductance calibration map or function for use during operation of the valve. An actual angular valve position is set based on the received set point angular valve position and a difference between the measured valve conductance and a predefined metric of conductance versus angular valve position. An actual system conductance and a difference between the actual system conductance and a reference system conductance for the system are determined. The diagnostic indication of a fault in the system is generated based on the actual angular valve position of the valve and the difference between the actual system conductance and the reference system conductance for the system.
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公开(公告)号：US20160208929A1
公开(公告)日：2016-07-21
申请号：US14995727
申请日：2016-01-14
Applicant: MKS Instruments, Inc.
Inventor： Gordon Hill
IPC: F16K1/226
CPC classification number: F16K1/2261 , F16K1/226 , F16K1/2263 , F16K1/2265 , F16K1/2266
Abstract: A valve assembly having a valve housing, the valve housing defining a passageway. A flapper valve arranged within the passageway is coupled to a rotatable valve shaft. A flexible wall, sealed along opposed edges to the valve housing, is controllable to at least two positions. The first position seals against the flapper valve and the second position releases the flapper valve allowing for ready movement of the valve.
Abstract translation: 具有阀壳体的阀组件，所述阀壳体限定通道。 布置在通道内的挡板阀联接到可旋转的阀轴。 沿与阀壳体相对的边缘密封的柔性壁可控制到至少两个位置。 第一位置与挡板阀密封，第二位置释放挡板阀，允许阀的准备运动。
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公开(公告)号：US20230036853A1
公开(公告)日：2023-02-02
申请号：US17391724
申请日：2021-08-02
Applicant: MKS Instruments, Inc.
Inventor： Gordon Hill , Andrew Cowe , Ron Collins , Larry Bourget
Abstract: A plasma source is provided that includes a body defining an input port, an output port, and at least one discharge section extending along a central longitudinal axis between the input port and the output port. The at least one discharge section includes a return electrode defining a first generally cylindrical interior volume having a first interior diameter, a supply plate comprising a supply electrode, the supply plate defining a second generally cylindrical interior volume having a second interior diameter, and at least one spacer defining a third generally cylindrical interior volume having a third interior diameter. The third interior diameter is different from the first or second interior diameter. The at least one discharge section is formed from the spacer arranged between the return electrode and the supply plate along the central longitudinal axis to define a generally cylindrical discharge gap for generating a plasma therein.
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公开(公告)号：US20170292633A1
公开(公告)日：2017-10-12
申请号：US15478623
申请日：2017-04-04
Applicant: MKS Instruments, Inc.
Inventor： Gordon Hill , David F. Broyer , David C. Neumeister , Bradly Raymond Lefevre
CPC classification number: F16K49/007 , F16K1/126 , F16K1/22 , F16K1/222 , F16K1/46 , F16K3/06 , F16K31/1221 , F16K41/10 , F16K51/02
Abstract: A cooled isolation valve includes a valve body, a stationary element coupled to the valve body, and a movable closure element movable with respect to the stationary element between a closed position in which the movable closure element and the stationary element are brought together and an open position. One of the movable closure element and the stationary element includes a sealing element. In the closed position of the movable closure element, the sealing element provides a seal between the movable closure element and the stationary element. A fluid channel is formed in contact with the movable closure element and movable with the movable closure element with respect to the stationary element, such that a fluid in the fluid channel effects heat transfer in the movable closure element. A bellows of the isolation valve can include a metallic substrate with a ceramic coating.
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