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公开(公告)号：US10790118B2
公开(公告)日：2020-09-29
申请号：US15460611
申请日：2017-03-16
发明人： Mohammad Kamarehi , Ken Trenholm , Colin Sanford , Kevin Wenzel , Olivia Keller
摘要： A microwave system has a solid-state generator which generates microwave energy and includes at least one control input for receiving a control signal to vary electrically a parameter of the microwave energy. A microwave load receives the microwave energy and produces an effect in response to the microwave energy. A microwave conducting element couples the microwave energy to the microwave load. An impedance match adjusting device is coupled to the microwave conducting element to vary at least one of the parameters of the microwave energy. The effect produced in response to the microwave energy is altered by both electrical variation of the parameter of the microwave energy via the control signal and adjustment of the impedance match adjusting device to vary the parameter of the microwave energy.
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公开(公告)号：US20200075298A1
公开(公告)日：2020-03-05
申请号：US16679640
申请日：2019-11-11
发明人： Gordon Hill , Scott Benedict , Kevin Wenzel
摘要： A vacuum pumping line plasma source is provided. The plasma source includes a body defining a generally cylindrical interior volume extending along a central longitudinal axis. The body has an input port for coupling to an input pumping line, an output port for coupling to an output pumping line, and an interior surface disposed about the generally cylindrical interior volume. The plasma source also includes a supply electrode disposed adjacent to a return electrode, and a barrier dielectric member, a least a portion of which is positioned between the supply electrode and the return electrode. The plasma source further includes a dielectric barrier discharge structure formed from the supply electrode, the return electrode, and the barrier dielectric member. The dielectric barrier discharge structure is adapted to generate a plasma in the generally cylindrical interior volume.
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3.发明申请公开(公告)号：US20190089135A1
公开(公告)日：2019-03-21
申请号：US15705643
申请日：2017-09-15
发明人： Atul Gupta , Colin Sanford , Joshua Lamontagne , Kevin Wenzel
摘要： An apparatus and method for determining the health of a plasma system by igniting a plasma within a plasma confining volume generate an ignition signal with an ignition circuit and apply the ignition signal between a biased region and a grounded region in the vicinity of the plasma confining volume. A parameter in the ignition circuit is sensed, and the sensed parameter is compared to a first parameter threshold. A condition associated with the plasma confining volume is determined if the sensed parameter differs from the first voltage threshold, and a corrective action can be taken.
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公开(公告)号：US20180269037A1
公开(公告)日：2018-09-20
申请号：US15460611
申请日：2017-03-16
发明人： Mohammad Kamarehi , Ken Trenholm , Colin Sanford , Kevin Wenzel , Olivia Keller
IPC分类号： H01J37/32
摘要： A microwave system has a solid-state generator which generates microwave energy and includes at least one control input for receiving a control signal to vary electrically a parameter of the microwave energy. A microwave load receives the microwave energy and produces an effect in response to the microwave energy. A microwave conducting element couples the microwave energy to the microwave load. An impedance match adjusting device is coupled to the microwave conducting element to vary at least one of the parameters of the microwave energy. The effect produced in response to the microwave energy is altered by both electrical variation of the parameter of the microwave energy via the control signal and adjustment of the impedance match adjusting device to vary the parameter of the microwave energy.
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公开(公告)号：US20180195196A1
公开(公告)日：2018-07-12
申请号：US15400635
申请日：2017-01-06
发明人： Chiu-Ying Tai , Atul Gupta , Kevin Wenzel , Glenn Stanton
CPC分类号： C25D11/12 , C23C16/4404 , C25D11/026 , C25D11/06 , C25D11/08 , C25D11/18 , C25D11/26 , C25D11/30 , C25D11/34 , H01J37/32486 , H01J37/32495
摘要： A method is introduced for creating a protective oxide layer over a surface of a metallic structure for use in a semiconductor processing system. The method includes providing the metallic structure, anodizing the surface of the metallic structure to form an anodization layer on the surface, and converting, using a plasma electrolytic oxidation process, at least a portion of the anodization layer to form the protective oxide layer.
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公开(公告)号：US11024489B2
公开(公告)日：2021-06-01
申请号：US16679640
申请日：2019-11-11
发明人： Gordon Hill , Scott Benedict , Kevin Wenzel
摘要： A method is provided for cleaning a pumping line having a plurality of inline plasma sources coupled thereto. The method includes supplying a cleaning gas to the pumping line from a wafer processing chamber connected to the pumping line. The method also includes generating a localized plasma at one or more of the plurality of inline plasma sources using the cleaning gas flowing in the pumping line. Each localized plasma is adapted to clean at least a portion of the pumping line. The method further includes determining one or more impedances of the localized plasma at the one or more inline plasma sources and monitoring the one or more impendences to detect an endpoint of the cleaning.
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7.发明授权公开(公告)号：US10910798B2
公开(公告)日：2021-02-02
申请号：US16682693
申请日：2019-11-13
发明人： Atul Gupta , Colin Sanford , Joshua Lamontagne , Kevin Wenzel
摘要： An apparatus and method for determining the health of a plasma system by igniting a plasma within a plasma confining volume generate an ignition signal with an ignition circuit and apply the ignition signal between a biased region and a grounded region in the vicinity of the plasma confining volume. A parameter in the ignition circuit is sensed, and the sensed parameter is compared to a first parameter threshold. A condition associated with the plasma confining volume is determined if the sensed parameter differs from the first voltage threshold, and a corrective action can be taken.
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公开(公告)号：US11367598B2
公开(公告)日：2022-06-21
申请号：US17107146
申请日：2020-11-30
发明人： Gordon Hill , Scott Benedict , Kevin Wenzel
摘要： A vacuum pumping line plasma source is provided. The plasma source includes a body defining a generally cylindrical interior volume extending along a central longitudinal axis. The body has an input port for coupling to an input pumping line, an output port for coupling to an output pumping line, and an interior surface disposed about the generally cylindrical interior volume. The plasma source also includes a supply electrode disposed adjacent to a return electrode, and a barrier dielectric member, a least a portion of which is positioned between the supply electrode and the return electrode. The plasma source further includes a dielectric barrier discharge structure formed from the supply electrode, the return electrode, and the barrier dielectric member. The dielectric barrier discharge structure is adapted to generate a plasma in the generally cylindrical interior volume.
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公开(公告)号：US11222770B2
公开(公告)日：2022-01-11
申请号：US16993775
申请日：2020-08-14
发明人： Mohammad Kamarehi , Ken Trenholm , Colin Sanford , Kevin Wenzel , Olivia Keller
摘要： A microwave system has a solid-state generator which generates microwave energy and includes at least one control input for receiving a control signal to vary electrically a parameter of the microwave energy. A microwave load receives the microwave energy and produces an effect in response to the microwave energy. A microwave conducting element couples the microwave energy to the microwave load. An impedance match adjusting device is coupled to the microwave conducting element to vary at least one of the parameters of the microwave energy. The effect produced in response to the microwave energy is altered by both electrical variation of the parameter of the microwave energy via the control signal and adjustment of the impedance match adjusting device to vary the parameter of the microwave energy.
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公开(公告)号：US20210082672A1
公开(公告)日：2021-03-18
申请号：US17107146
申请日：2020-11-30
发明人： Gordon Hill , Scott Benedict , Kevin Wenzel
摘要： A vacuum pumping line plasma source is provided. The plasma source includes a body defining a generally cylindrical interior volume extending along a central longitudinal axis. The body has an input port for coupling to an input pumping line, an output port for coupling to an output pumping line, and an interior surface disposed about the generally cylindrical interior volume. The plasma source also includes a supply electrode disposed adjacent to a return electrode, and a barrier dielectric member, a least a portion of which is positioned between the supply electrode and the return electrode. The plasma source further includes a dielectric barrier discharge structure formed from the supply electrode, the return electrode, and the barrier dielectric member. The dielectric barrier discharge structure is adapted to generate a plasma in the generally cylindrical interior volume.
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