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公开(公告)号:US20220102116A1
公开(公告)日:2022-03-31
申请号:US17643866
申请日:2021-12-13
Applicant: MKS Instruments, Inc.
Inventor: Jin HUH , Aaron T. Radomski , Duy Nguyen , Soohan Kim
Abstract: A matching network for a system having a non-linear load and powered by a first RF power supply operating at a first frequency and a second RF power supply operating at a second frequency. The matching network includes a first matching network section for providing an impedance match between the first power supply and the load. The matching network also includes a second matching network section for providing an impedance match between the second power supply and the load. A the first matching network section includes a first variable reactance, and the variable reactance is controlled in accordance with IMD sensed in the signal applied to the load by the first RF power supply. The variable reactance is adjusted in accordance with the IMD to reduce the detected IMD.
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公开(公告)号:US20210118649A1
公开(公告)日:2021-04-22
申请号:US17073709
申请日:2020-10-19
Applicant: MKS Instruments, Inc.
Inventor: Jin HUH , Aaron T. RADOMSKI , Duy NGUYEN , Soohan KIM
Abstract: A matching network for a system having a non-linear load and powered by a first RF power supply operating at a first frequency and a second RF power supply operating at a second frequency. The matching network includes a first matching network section for providing an impedance match between the first power supply and the load. The matching network also includes a second matching network section for providing an impedance match between the second power supply and the load. A the first matching network section includes a first variable reactance, and the variable reactance is controlled in accordance with IMD sensed in the signal applied to the load by the first RF power supply. The variable reactance is adjusted in accordance with the IMD to reduce the detected IMD.
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公开(公告)号:US20190068158A1
公开(公告)日:2019-02-28
申请号:US16112055
申请日:2018-08-24
Applicant: MKS Instruments, Inc.
Inventor: David J. COUMOU , Dennis M. BROWN , Jeongseok JANG , Jin HUH
CPC classification number: H03H7/42 , H01J37/32183 , H01J2237/3323 , H01J2237/334 , H01P5/19 , H03H7/46 , H03H7/48
Abstract: A single input multiple output plasma control system includes a splitter that receives a single input and generates multiple outputs. Each output from the splitter is provided to a load. The splitter includes branch circuits connected between selected splitter outputs. The branch circuits control voltage, current, power, frequency, or phase between each branch to enable controlling a predetermined relationship between the voltage, current, power, impedance, frequency, or phase measured at each load.
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