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公开(公告)号：US20120248313A1
公开(公告)日：2012-10-04
申请号：US13432558
申请日：2012-03-28
IPC分类号： G01J5/10
CPC分类号： G01S13/887 , G01J5/10 , G01K11/006 , G01N21/3563 , G01N21/3581
摘要： One embodiment of the invention includes a material detection system. The system includes a sensor system configured to collect radiation from a region of interest. The collected radiation can include a plurality of frequency bands. The system also includes a processing unit configured to detect a material of interest. The material of interest can be a concealed dielectric material, and the processing unit can be configured to decompose the collected radiation into natural resonance signals to analyze the natural resonance signals to detect an anomaly corresponding to the concealed dielectric material based on wave characteristics of the natural resonance signals. The processing unit could also include processing layers associated with the plurality of frequency bands for detecting and identifying the material of interest based on wave characteristics associated with each of the plurality of frequency bands of the collected radiation.
摘要翻译： 本发明的一个实施例包括材料检测系统。 该系统包括被配置为收集来自感兴趣区域的辐射的传感器系统。 收集的辐射可以包括多个频带。 该系统还包括被配置为检测感兴趣的材料的处理单元。 感兴趣的材料可以是隐藏的介电材料，并且处理单元可以被配置为将收集的辐射分解成天然共振信号，以分析天然共振信号，以基于天然的波的特征来检测对应于隐藏的介电材料的异常 共振信号。 处理单元还可以包括与多个频带相关联的处理层，用于基于与收集的辐射的多个频带中的每个频带相关联的波特性来检测和识别感兴趣的材料。
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公开(公告)号：US20150198703A1
公开(公告)日：2015-07-16
申请号：US14156095
申请日：2014-01-15
CPC分类号： G06K9/4604 , G01J5/0066 , G01J5/0825 , G01J5/60 , G01J2005/0077 , G01K11/006 , G01S7/499 , G01S13/89 , G01V8/005 , G06K9/00577
摘要： A detection system includes a polarization analyzer that generates one or more null detection values if an object is sensed in a received millimeter wave (MMW) brightness temperature data set. The polarization analyzer analyzes a polarization parameter in the received MMW brightness temperature data set to generate the one or more null detection values. An object detector detects if the object is present based on a comparison of the one or more null detection values to a predetermined threshold. A singular value decomposition (SVD) unit is enabled by the object detector to decompose the MMW brightness temperature data set into a plurality of image layers. Each image layer includes at least one feature of a scene. An identification unit analyzes the plurality of image layers from the SVD unit to determine a shape or a location of the object from the scene.
摘要翻译： 检测系统包括如果在接收的毫米波（MMW）亮度温度数据集中感测到物体时产生一个或多个零检测值的偏振分析器。 偏振分析器分析所接收的MMW亮度温度数据集中的极化参数以产生一个或多个空检测值。 对象检测器基于一个或多个空检测值与预定阈值的比较来检测对象是否存在。 通过对象检测器启用奇异值分解（SVD）单元，将MMW亮度温度数据集分解为多个图像层。 每个图像层包括场景的至少一个特征。 识别单元从SVD单元分析多个图像层以确定来自场景的对象的形状或位置。
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3.发明申请SYSTEMS AND METHODS FOR DETECTING AND/OR IDENTIFYING MATERIALS BASED ON ELECTROMAGNETIC RADIATION 有权基于电磁辐射检测和/或识别材料的系统和方法公开(公告)号：US20120248314A1
公开(公告)日：2012-10-04
申请号：US13432606
申请日：2012-03-28
IPC分类号： G01J5/10
CPC分类号： G01S13/887 , G01J5/10 , G01K11/006 , G01N21/3563 , G01N21/3581
摘要： One embodiment of the invention includes a material detection and/or identification system. The system includes an electromagnetic (EM) sensor system configured to collect EM radiation from a region of interest. The collected EM radiation could comprise orthogonally-polarized EM radiation. The system also includes a processing unit configured to detect and identify a material of interest in the region of interest. As an example, the processing unit could measure reflectivity data associated with a material of interest based on the collected EM radiation and calculate a refractive index of a material of interest based on the measured reflectivity data, such that the material of interest is identified based on the refractive index. The processing unit can also be configured to calculate a surface roughness associated with the material, such that the refractive index can be calculated based on the surface roughness associated with the material.
摘要翻译： 本发明的一个实施例包括材料检测和/或识别系统。 该系统包括被配置为从感兴趣区域收集EM辐射的电磁（EM）传感器系统。 收集的EM辐射可以包括正交极化的EM辐射。 该系统还包括处理单元，该处理单元被配置为检测并识别感兴趣区域中的感兴趣的材料。 作为示例，处理单元可以基于所收集的EM辐射来测量与感兴趣的材料相关联的反射率数据，并基于所测量的反射率数据计算感兴趣的材料的折射率，使得基于 折射率。 处理单元还可以被配置为计算与材料相关联的表面粗糙度，使得可以基于与材料相关联的表面粗糙度来计算折射率。
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