Optical apparatus, lithographic apparatus and device manufacturing method
    9.
    发明授权
    Optical apparatus, lithographic apparatus and device manufacturing method 失效
    光学设备,光刻设备和器件制造方法

    公开(公告)号:US07935218B2

    公开(公告)日:2011-05-03

    申请号:US11643955

    申请日:2006-12-22

    IPC分类号: C23F1/00

    摘要: An optical apparatus includes an illumination system configured to form a pulsed radiation beam, an optical element with a surface on which the radiation beam is incident in operation, and a gas source arranged to supply a mixture of a first type of gas and a second type of gas to a space adjacent the surface. Particles of the first and second types of gas are capable of reacting with the surface, when activated by the radiation beam. The gas source is configured to generate a combination of surface occupation numbers of molecules of the first and second types of gas on the surface under operating conditions, at least prior to pulses of the radiation beam, the combination of surface occupation numbers lying in a range in which reactions of particles with the surface during pulses of the radiation beam are in majority reversed.

    摘要翻译: 光学装置包括被配置为形成脉冲辐射束的照明系统,具有辐射束在其中入射的表面的光学元件,以及设置成供应第一类型气体和第二类型的混合物的气体源 的气体到邻近表面的空间。 当由辐射束激活时,第一和第二类气体的颗粒能够与表面反应。 气源被配置成至少在辐射束的脉冲之前,在工作条件下,在表面上产生第一和第二类气体的分子的表面占有数量的组合,表面占有数的组合在一个范围内 其中在辐射束的脉冲期间颗粒与表面的反应多数反转。