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    Method for manufacturing master substrate used for manufacturing grooved molding substrate, method for manufacturing stamper for manufacturing grooved molding substrate, method for manufacturing grooved molding substrate, grooved molding substrate, memory medium, memory device, and computer
    1.
    发明申请
    Method for manufacturing master substrate used for manufacturing grooved molding substrate, method for manufacturing stamper for manufacturing grooved molding substrate, method for manufacturing grooved molding substrate, grooved molding substrate, memory medium, memory device, and computer 审中-公开
    用于制造用于制造带槽成型基材的母基板的方法，用于制造用于制造带槽成型基板的压模的方法，用于制造带槽成型基板的方法，带槽成型基板，存储介质，存储器件和计算机

    公开(公告)号：US20050136360A1

    公开(公告)日：2005-06-23

    申请号：US11042206

    申请日：2005-01-26

    申请人： Madoka Nishiyama ,  Seiji Morita

    发明人： Madoka Nishiyama ,  Seiji Morita

    IPC分类号： B29C33/38 ,  B29C45/26 ,  B29D17/00 ,  C25D1/10 ,  G11B5/82 ,  G11B5/84 ,  G11B7/24 ,  G11B7/26 ,  G03C5/00

    CPC分类号： B29C45/2632 ,  B29D17/005 ,  C25D1/10 ,  G11B7/261 ,  G11B7/263

    摘要： A substrate having a photoresist coated thereon is exposed to exposure light along a line through a lens 1. The exposure position is moved from the initial position O1 to a position O2 that is separated from the initial position by a distance corresponding to the sum of a groove width Gw and a land width Lw. The exposure is carried out along a line parallel to the initial exposure line. By repeating this, exposed areas having a width Lw and a separation Gw are formed on the photoresist. The photoresist is developed to remove the exposed areas of the photoresist. A resin or the like is pressed on it to form a replica. From the replica, a stamper is manufactured using an electroforming method. Finally, a grooved molding substrate is manufactured from a glass or resin using the stamper. Although the land width Lw is defined by the effective spot diameter φ of the optical system, the groove width Gw can be less than this value.

    摘要翻译： 具有涂覆在其上的光致抗蚀剂的基板通过透镜1沿着线暴露于曝光光。曝光位置从初始位置O 1移动到位置O 2 其与初始位置分开与槽宽度Gw和槽脊宽度Lw之和相对应的距离。 沿着与初始曝光线平行的线进行曝光。 通过重复，在光致抗蚀剂上形成具有宽度Lw和分离Gw的曝光区域。 显影光致抗蚀剂以除去光致抗蚀剂的曝光区域。 树脂等压在其上以形成副本。 从复制品，使用电铸方法制造压模。 最后，使用压模由玻璃或树脂制造带槽的成型基板。 尽管平面宽度Lw由光学系统的有效光斑直径φi限定，但是槽宽度Gw可以小于该值。

    METHOD FOR MANUFACTURING MASTER SUBSTRATE USED FOR MANUFACTURING GROOVED MOLDING SUBSTRATE, METHOD FOR MANUFACTURING STAMPER FOR MANUFACTURING GROOVED MOLDING SUBSTRATE, METHOD FOR MANUFACTURING GROOVED MOLDING SUBSTRATE, GROOVED MOLDING SUBSTRATE, MEMORY MEDIUM, MEMORY DEVICE, AND COMPUTER
    2.
    发明授权
    METHOD FOR MANUFACTURING MASTER SUBSTRATE USED FOR MANUFACTURING GROOVED MOLDING SUBSTRATE, METHOD FOR MANUFACTURING STAMPER FOR MANUFACTURING GROOVED MOLDING SUBSTRATE, METHOD FOR MANUFACTURING GROOVED MOLDING SUBSTRATE, GROOVED MOLDING SUBSTRATE, MEMORY MEDIUM, MEMORY DEVICE, AND COMPUTER 有权
    用于制造用于制造压花成型基板的主基板的制造方法，制造用于制造成型模制基板的冲压器的方法，用于制造压花成型基板的方法，滚压模塑基板，存储介质，存储器件和计算机

    公开(公告)号：US06874262B2

    公开(公告)日：2005-04-05

    申请号：US10406438

    申请日：2003-04-04

    申请人： Madoka Nishiyama ,  Seiji Morita

    发明人： Madoka Nishiyama ,  Seiji Morita

    IPC分类号： B29C33/38 ,  B29C45/26 ,  B29D17/00 ,  C25D1/10 ,  G11B5/82 ,  G11B5/84 ,  G11B7/24 ,  G11B7/26 ,  G03C5/00

    CPC分类号： B29C45/2632 ,  B29D17/005 ,  C25D1/10 ,  G11B7/261 ,  G11B7/263

    摘要： A substrate having a photoresist coated thereon is exposed to exposure light along a line through a lens 1. The exposure position is moved from the initial position O1 to a position O2 that is separated from the initial position by a distance corresponding to the sum of a groove width Gw and a land width Lw. The exposure is carried out along a line parallel to the initial exposure line. By repeating this, exposed areas having a width Lw and a separation Gw are formed on the photoresist. The photoresist is developed to remove the exposed areas of the photoresist. A resin or the like is pressed on it to form a replica. From the replica, a stamper is manufactured using an electroforming method. Finally, a grooved molding substrate is manufactured from a glass or resin using the stamper. Although the land width Lw is defined by the effective spot diameter φ of the optical system, the groove width Gw can be less than this value.

    摘要翻译： 将其上涂覆有光致抗蚀剂的基板暴露于沿着穿过透镜1的线的曝光光。曝光位置从初始位置O1移动到与初始位置分开一定距离的位置O2，该距离对应于 槽宽Gw和焊盘宽度Lw。 沿着与初始曝光线平行的线进行曝光。 通过重复，在光致抗蚀剂上形成具有宽度Lw和分离Gw的曝光区域。 显影光致抗蚀剂以除去光致抗蚀剂的曝光区域。 树脂等压在其上以形成副本。 从复制品，使用电铸方法制造压模。 最后，使用压模由玻璃或树脂制造带槽的成型基板。 尽管平面宽度Lw由光学系统的有效光斑直径φi限定，但是槽宽度Gw可以小于该值。

    Optical recording medium for writing data using multiple pulses
    5.
    发明授权
    Optical recording medium for writing data using multiple pulses 有权
    用于使用多个脉冲写入数据的光学记录介质

    公开(公告)号：US08422353B2

    公开(公告)日：2013-04-16

    申请号：US13252806

    申请日：2011-10-04

    申请人： Kazuyo Umezawa ,  Seiji Morita ,  Koji Takazawa ,  Naomasa Nakamura ,  Naoki Morishita ,  Shinichi Katsuda

    发明人： Kazuyo Umezawa ,  Seiji Morita ,  Koji Takazawa ,  Naomasa Nakamura ,  Naoki Morishita ,  Shinichi Katsuda

    IPC分类号： G11B11/00

    CPC分类号： G11B7/24038 ,  G11B7/2467 ,  G11B7/2492 ,  G11B7/2495

    摘要： An optical recording medium including a plurality of recording layers to record/reproduce information using light with a predetermined wavelength, the information being recorded on one of the recording layers using a mark and a space, wherein a channel clock period T is provided for recording the mark on one of the recording layers. A plurality of pulses, including a last pulse arranged at an end of the pulses, are used to record the mark with length 3T, the mark being recorded with a condition that a width of the last pulse is minimum 0T and maximum 1.10T, in which a first subsequent level lower than a peak power level of the last pulse is arranged next to the last pulse, and a second subsequent level lower than the peak power level but higher than the first subsequent level is arranged next to the first subsequent level.

    摘要翻译： 一种光记录介质，包括使用预定波长的光记录/再现信息的多个记录层，所述信息使用标记和空间被记录在一个记录层上，其中提供通道时钟周期T用于记录 在其中一个记录层上标记。 包括布置在脉冲结束处的最后脉冲的多个脉冲用于记录长度为3T的标记，该标记以最后脉冲的宽度最小为0T且最大为1.10T的条件记录 其最后一个电平低于最后脉冲的峰值功率电平的第一后置电平被布置在最后脉冲的旁边，并且比峰值功率电平低但高于第一后续电平的第二后续电平被布置在第一后续电平旁边。

    Optical recording medium, information recording method, and information reproducing method
    9.
    发明授权
    Optical recording medium, information recording method, and information reproducing method 有权
    光记录介质，信息记录方法和信息再现方法

    公开(公告)号：US08174948B2

    公开(公告)日：2012-05-08

    申请号：US13093198

    申请日：2011-04-25

    申请人： Koji Takazawa ,  Seiji Morita ,  Kazuyo Umezawa ,  Naoki Morishita ,  Yasuaki Ootera ,  Hideo Ando ,  Naomasa Nakamura

    发明人： Koji Takazawa ,  Seiji Morita ,  Kazuyo Umezawa ,  Naoki Morishita ,  Yasuaki Ootera ,  Hideo Ando ,  Naomasa Nakamura

    IPC分类号： G11B7/00

    CPC分类号： G11B7/258 ,  G11B7/00452 ,  G11B7/00455 ,  G11B7/24038 ,  G11B7/246 ,  G11B7/259 ,  G11B2007/0013

    摘要： According to one embodiment, an optical recording medium is provided in which interlayer crosstalk is low and in which stable and high-quality recording characteristics can be obtained. To this end, an optical recording medium comprises a first recording part which includes a first recording layer and a first light reflecting layer and which is disposed on a side closer to a light receiving surface, and a second recording part which includes a second recording layer and a second light reflecting layer and which is disposed on a side farther from the light receiving surface, the first recording part and the second recording part being stacked, wherein the thickness of the second light reflecting layer is larger than the thickness of the first light reflecting layer.

    摘要翻译： 根据一个实施例，提供了一种光记录介质，其中层间串扰低，并且其中可以获得稳定和高质量的记录特性。 为此，光学记录介质包括第一记录部分，该第一记录部分包括第一记录层和第一光反射层，并且设置在靠近光接收表面的一侧;以及第二记录部分，其包括第二记录层 和第二光反射层，并且其被布置在离光接收表面更远的一侧，第一记录部分和第二记录部分被堆叠，其中第二光反射层的厚度大于第一光的厚度 反射层。

    Magnetic recording medium manufacturing method
    10.
    发明授权
    Magnetic recording medium manufacturing method 有权
    磁记录介质制造方法

    公开(公告)号：US08173029B2

    公开(公告)日：2012-05-08

    申请号：US12725403

    申请日：2010-03-16

    申请人： Seiji Morita ,  Shinobu Sugimura ,  Kazuyo Umezawa ,  Masatoshi Sakurai

    发明人： Seiji Morita ,  Shinobu Sugimura ,  Kazuyo Umezawa ,  Masatoshi Sakurai

    IPC分类号： B44C1/22

    CPC分类号： G11B5/855 ,  C08F220/18

    摘要： According to one embodiment, a cured first ultraviolet-curing resin material layer having a first three-dimensional pattern is formed on a first principal surface of a magnetic recording medium having a central hole. A cured second ultraviolet-curing resin material layer having a second three-dimensional pattern is formed on a second principal surface opposite to the first principal surface of the magnetic recording.

    摘要翻译： 根据一个实施方案，在具有中心孔的磁记录介质的第一主表面上形成具有第一三维图案的固化的第一紫外线固化树脂材料层。 在与磁记录的第一主表面相对的第二主表面上形成具有第二三维图案的固化的第二紫外线固化树脂材料层。