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1.发明授权Process for producing high-purity silica by reacting crude silica with ammonium fluoride 失效粗二氧化硅与氟化铵反应生产高纯二氧化硅的方法
公开(公告)号：US5458864A
公开(公告)日：1995-10-17
申请号：US68166
申请日：1993-05-28
申请人： Makoto Tsugeno , Kenji Tanimoto , Masao Kubo
发明人： Makoto Tsugeno , Kenji Tanimoto , Masao Kubo
CPC分类号： C01B33/103 , C01B33/186 , C01P2004/61 , C01P2006/12 , C01P2006/22 , C01P2006/80
摘要： A process for producing a high-purity silica, which comprises the steps of reacting a crude silica with ammonium fluoride, acid ammonium fluoride or a mixture thereof in an aqueous medium to produce ammonium silicofluoride, separating the ammonium silicofluoride from an unreacted silica and impurities by the means of a solid/liquid separation, and reacting the thus-obtained ammonium silicofluoride with ammonia in an aqueous medium. This process is a low cost process, and enables to control properties of silica.
摘要翻译： 一种制备高纯度二氧化硅的方法，其包括以下步骤：将粗二氧化硅与氟化铵，酸性氟化铵或其混合物在水性介质中反应，生成硅酸铵，将硅酸铵与未反应的二氧化硅和杂质分离 固/液分离的方法，并将如此得到的硅酸铵与氨在水介质中反应。 这个过程是一个低成本的过程，并且能够控制二氧化硅的性质。
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2.发明授权Process for producing high-purity silica by reacting crude silica with ammonium fluoride 失效粗二氧化硅与氟化铵反应生产高纯二氧化硅的方法
公开(公告)号：US5266289A
公开(公告)日：1993-11-30
申请号：US612475
申请日：1990-11-14
申请人： Makoto Tsugeno , Kenji Tanimoto , Masao Kubo
发明人： Makoto Tsugeno , Kenji Tanimoto , Masao Kubo
CPC分类号： C01B33/103 , C01B33/186 , C01P2004/61 , C01P2006/12 , C01P2006/22 , C01P2006/80
摘要： A process for producing a high-purity silica, which comprises the steps of reacting a crude silica with ammonium fluoride, acid ammonium fluoride or a mixture thereof in an aqueous medium to produce ammonium silicofluoride, separating the ammonium silicofluoride from an unreacted silica and impurities by the means of a solid/liquid separation, and reacting the thus-obtained ammonium silicofluoride with ammonia in an aqueous medium. This process is a low cost process, and enables to control properties of silica.
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公开(公告)号：US5230953A
公开(公告)日：1993-07-27
申请号：US625424
申请日：1990-12-11
申请人： Makoto Tsugeno , Yasushi Takako , Masao Kubo , Tokumi Mochiyama , Yoshito Yuri
发明人： Makoto Tsugeno , Yasushi Takako , Masao Kubo , Tokumi Mochiyama , Yoshito Yuri
CPC分类号： C08K3/36 , C01B33/186 , C09C1/30 , C09C1/3027 , C01P2004/03 , C01P2004/32 , C01P2004/51 , C01P2004/61 , C01P2004/62 , C01P2006/12 , C01P2006/14 , C01P2006/80 , C01P2006/90 , Y10T428/259 , Y10T428/2982
摘要： Silica particles having an average particle size of 5 to 100 .mu.m, a BET specific surface area of not more than 20 m.sup.2 /g and a pore volume of not more than 0.1 ml/g, each of which has on its surface a plurality of protuberances with a smooth configuration , a diameter at half the protuberance height of the said protuberance being 0.2 to 5.0 .mu.m and a height of the said protuberance being 0.2 to 4.0 .mu.m, and a process for producing the silica particles, which comprises (A) reacting hydrosilicofluoric acid, ammonium silicofluoride or a mixture thereof with ammonia in an aqueous medium to form a silica slurry, (B) separating a silica from the silica slurry, and (C) calcining, after optionally drying, the separated silica at a temperature of not less than 500.degree. C.
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4.发明授权Insecticidal 1-N-phenylcarbamoyl-3-(4-difluoromethoxyphenyl)-4-phenyl-2-pyrazoline derivatives 失效杀虫剂1-N-苯基氨基甲酰基-3-（4-二氟甲氧基苯基）-4-苯基-2-吡唑啉衍生物
公开(公告)号：US4540706A
公开(公告)日：1985-09-10
申请号：US461666
申请日：1983-01-27
申请人： Kiyomi Ozawa , Yasuyuki Nakajima , Makoto Tsugeno , Shigeru Ishii , Masataka Hatanaka , Masayoshi Hirose , Masaki Kudo
发明人： Kiyomi Ozawa , Yasuyuki Nakajima , Makoto Tsugeno , Shigeru Ishii , Masataka Hatanaka , Masayoshi Hirose , Masaki Kudo
IPC分类号： A01N43/56 , C07C45/00 , C07C45/65 , C07C45/68 , C07C45/71 , C07C45/74 , C07C45/75 , C07D231/06
CPC分类号： C07D231/06 , C07C255/00 , C07C323/00 , C07C45/004 , C07C45/65 , C07C45/68 , C07C45/71 , C07C45/74 , C07C45/75
摘要： Pyrazoline derivatives useful as insecticides having the formula ##STR1## wherein X represents a hydrogen atom or a halogen atom; Y represents a halogen atom, a trifluoromethyl group or --A--R'; R represents a C.sub.1-10 alkyl group, a lower alkenyl group or a lower alkynyl group; and A represents an oxygen atom, a sulfur atom, a sulfinyl group or a sulfonyl group and R' represents a halogen-substituted lower alkyl group.
摘要翻译： 吡唑啉衍生物可用作具有式（I）的杀虫剂，其中X表示氢原子或卤素原子; Y表示卤原子，三氟甲基或-A-R'; R表示C 1-10烷基，低级烯基或低级炔基; A表示氧原子，硫原子，亚磺酰基或磺酰基，R'表示卤素取代的低级烷基。
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公开(公告)号：US4410732A
公开(公告)日：1983-10-18
申请号：US387778
申请日：1982-06-14
申请人： Kiyomi Ozawa , Yasuyuki Nakajima , Makoto Tsugeno
发明人： Kiyomi Ozawa , Yasuyuki Nakajima , Makoto Tsugeno
IPC分类号： A01N35/04 , C07C45/00 , C07C45/68 , C07C45/71 , C07C45/74 , C07C49/84 , C07C67/00 , C07C225/16 , C07D231/06 , C07C49/825
CPC分类号： C07C255/00 , C07C323/00 , C07C45/68 , C07C45/71 , C07C45/74 , C07C49/84
摘要： Ketone derivatives represented by the general formula (I) ##STR1## where R is --CH.sub.2 R.sup.1 (where R.sup.1 is a hydrogen atom or an alkyl group), a halogen-substituted alkyl group, a cyano-substituted alkyl group, a cyclopropyl group, ##STR2## (where R.sup.2 is a hydrogen atom or an alkyl group and Y is a hydrogen atom or a halogen atom) or ##STR3## (where R.sup.3 is a hydrogen atom, an alkyl group, a phenyl group or a halogen-substituted phenyl group, and Z is a hydrogen atom or a halogen atom), and X is an oxygen atom or a sulfur atom.
摘要翻译： 由通式（I）表示的酮衍生物其中R为-CH 2 R 1（其中R 1为氢原子或烷基），卤素取代的烷基，氰基取代的烷基，环丙基 基团，其中R 2是氢原子或烷基，Y是氢原子或卤素原子）或者其中R 3是氢原子，烷基，苯基或卤素原子， 取代苯基，Z为氢原子或卤素原子），X为氧原子或硫原子。
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公开(公告)号：US4407813A
公开(公告)日：1983-10-04
申请号：US292710
申请日：1981-08-13
IPC分类号： A01N43/56 , C07C45/00 , C07C45/65 , C07C45/68 , C07C45/71 , C07C45/74 , C07C45/75 , C07D231/06
CPC分类号： C07D231/06 , C07C255/00 , C07C45/004 , C07C45/65 , C07C45/68 , C07C45/71 , C07C45/74 , C07C45/75
摘要： Pyrazoline derivatives having the formula ##STR1## wherein R.sup.1 represents hydrogen atom, a lower alkyl group, phenyl group or a halogen-substituted phenyl group; R.sup.2 represents hydrogen atom or phenyl group which can have halogen substituents; X represents oxygen or sulfur atom; Y and Z respectively represent hydrogen atom, a halogen atom, a lower alkyl group, a lower alkoxy group, nitro-group, trifluoromethyl group, a lower alkylthio group, an acyl group, nitrile group or a lower alkyl sulfonyl group.
摘要翻译： 具有下式的吡唑啉衍生物：其中R 1表示氢原子，低级烷基，苯基或卤素取代的苯基; R2表示氢原子或可具有卤素取代基的苯基; X表示氧或硫原子; Y和Z分别表示氢原子，卤素原子，低级烷基，低级烷氧基，硝基，三氟甲基，低级烷硫基，酰基，腈基或低级烷基磺酰基。
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7.发明申请Method of preventing adhesion of gypsum foreign matter of gypsum slurry, gypsum slurry supply stabilizing device with gypsum foreign matter adhesion prevention device, and method of manufacturing gypsum board by using the stabilizing device 审中-公开防止石膏浆料的石膏异物附着的石膏浆料供给稳定装置与石膏异物附着防止装置的方法，以及使用稳定装置制造石膏板的方法公开(公告)号：US20050077655A1
公开(公告)日：2005-04-14
申请号：US10504573
申请日：2003-02-14
申请人： Minoru Ikeda , Makoto Tsugeno , Junichi Yoshikawa
发明人： Minoru Ikeda , Makoto Tsugeno , Junichi Yoshikawa
CPC分类号： B28B1/08 , B28B17/023 , B28B19/0092
摘要： The method of preventing adhesion of gypsum foreign matter comprises providing ultrasonic vibration to a member coming into contact with a gypsum slurry containing air bubbles.
摘要翻译： 防止石膏异物附着的方法包括向与含有气泡的石膏浆接触的部件提供超声波振动。
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8.发明授权Insecticidal 3-difluoromethoxyphenyl-1-phenylcarbamoyl-2-pyrazolines 失效杀虫剂3-二氟甲氧基苯基-1-苯基氨基甲酰基-2-吡唑啉
公开(公告)号：US4464386A
公开(公告)日：1984-08-07
申请号：US455735
申请日：1983-01-05
IPC分类号： A01N43/56 , C07C45/00 , C07C45/65 , C07C45/68 , C07C45/71 , C07C45/74 , C07C45/75 , C07D231/06
CPC分类号： C07D231/06 , C07C255/00 , C07C323/00 , C07C45/004 , C07C45/65 , C07C45/68 , C07C45/71 , C07C45/74 , C07C45/75
摘要： Pyrazoline derivatives useful as insecticides having the formula ##STR1## wherein R.sup.1 represents hydrogen atom, a lower alkyl group, (CH.sub.2).sub.n CN group, (CH.sub.2).sub.n OR group, phenyl group or a halogen-substituted phenyl group; R.sup.2 represents hydrogen atom or methyl group; Y represents hydrogen atom or chlorine atom; X represents oxygen atom, sulfur atom, sulfinyl or sulfonyl group; R.sup.3 represents a halogen-substituted lower alkyl group; and n is integer 1 to 3 and R represents a lower alkyl group.
摘要翻译： 吡唑啉衍生物可用作具有式（I）的杀虫剂，其中R1表示氢原子，低级烷基，（CH2）nCN基，（CH2）nOR基，苯基或卤素取代的苯基; R2表示氢原子或甲基; Y表示氢原子或氯原子; X表示氧原子，硫原子，亚磺酰基或磺酰基; R3表示卤素取代的低级烷基; n为1〜3的整数，R为低级烷基。
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