公开(公告)号：US06897021B2

公开(公告)日：2005-05-24

申请号：US09820778

申请日：2001-03-30

申请人： Hiroshi Nagasawa ,  Akira Fukunaga ,  Masayoshi Hirose

发明人： Hiroshi Nagasawa ,  Akira Fukunaga ,  Masayoshi Hirose

IPC分类号： C12Q1/68 ,  C40B40/06 ,  C40B60/14 ,  G01N33/543 ,  G01N33/545 ,  G01N33/552 ,  C07H21/04 ,  G01N33/53

CPC分类号： G01N33/54346 ,  B01J2219/00317 ,  B01J2219/00497 ,  B01J2219/00527 ,  B01J2219/00585 ,  B01J2219/0059 ,  B01J2219/00596 ,  B01J2219/00605 ,  B01J2219/00608 ,  B01J2219/0061 ,  B01J2219/00612 ,  B01J2219/00617 ,  B01J2219/00621 ,  B01J2219/00626 ,  B01J2219/0063 ,  B01J2219/00637 ,  B01J2219/00641 ,  B01J2219/00644 ,  B01J2219/00659 ,  B01J2219/00722 ,  C40B40/06 ,  C40B60/14 ,  G01N33/545 ,  G01N33/552

摘要： A reaction probe chip which is prepared by loading a reactive probe on fine pieces of carrier such as particles, tile-like plates and then arraying and immobilizing the reactive probe-loaded carrier on a base material. The carrier fine pieces such as particles, tile-like plates and the like are porous or have a reactive surface, and the base material is preferably a thin inorganic plate or a thin organic plate is disclosed.The inorganic base material is preferably a glass slide or silicon wafer, and the organic base material is preferably a polyester film or polyethylene film. In case the porous carrier pieces are used, the reactivity of the inner surfaces of the porous carrier pores should be maintained during array or immobilization process of the reactive probe-loaded carrier.A composite substrate characterized in that on at least a section of the surface thereof, a plurality of porous regions are orderly arranged as compartments by non-porous regions, or a plurality of non-porous regions are orderly arranged as compartments by porous regions is also disclosed. The porous solid is preferably porous glass or porous ceramic, the porous glass is preferably split-phase porous glass, and the surface is preferably flattened by a process such as polishing.

公开(公告)号：US4837217A

公开(公告)日：1989-06-06

申请号：US850533

申请日：1986-04-11

申请人： Tomoyuki Ogura ,  Yasuo Kawamura ,  Masatoshi Baba ,  Shigeru Ishii ,  Kiminori Hirata ,  Masaki Kudo ,  Yoshinori Ochiai ,  Masayoshi Hirose

发明人： Tomoyuki Ogura ,  Yasuo Kawamura ,  Masatoshi Baba ,  Shigeru Ishii ,  Kiminori Hirata ,  Masaki Kudo ,  Yoshinori Ochiai ,  Masayoshi Hirose

IPC分类号： A01N43/58 ,  C07D237/16 ,  C07D237/18 ,  C07D401/12 ,  C07D403/12 ,  C07D405/12 ,  C07D409/12

CPC分类号： C07D401/12 ,  A01N43/58 ,  C07D237/16 ,  C07D237/18 ,  C07D403/12 ,  C07D405/12 ,  C07D409/12

摘要： A 3(2H)-pyridazinone derivative of the general formula (I): ##STR1## wherein R is a straight or branched C.sub.2 -C.sub.6 alkyl,A is a straight or branched C.sub.1 -C.sub.6 alkyl or a halogen atom,X is --O-- or --S--,R.sup.1 and R.sup.2 are each independently hydrogen atom or C.sub.1 -C.sub.3 alkyl,B is --CH.dbd.CH--, --N.dbd.CH--, --N.dbd.N--, --S--, --O-- or ##STR2## wherein R.sup.3 is hydrogen or C.sub.1 -C.sub.3 alkyl, Y is a halogen atom, a straight or branched C.sub.1 -C.sub.6 alkyl, a C.sub.3 -C.sub.6 cycloalkyl or cycloalkoxy, and other substituents,n is 0 or an integer of 1 to 3, and when n is 2 or 3, Y may be same or different, with the proviso that when B is --CH.dbd.CH--, n is an integer of 1 to 3 and at least one of Y is --O--W, as this term is defined in the specification.A process for the preparation of said derivatives is also provided. These derivatives are useful as an active ingredient of insecticidal, acaricidal, nematicidal and/or fungicidal compositions for agricultural and horticultural uses as well as of expellent compositions for ticks parasitic on animals.

摘要翻译： 通式（I）的3（2H） - 哒嗪酮衍生物：其中R是直链或支链C 2 -C 6烷基，A是直链或支链C 1 -C 6烷基或卤素原子，X是-O - 或-S-，R1和R2各自独立地为氢原子或C1-C3烷基，B为-CH = CH-，-N = CH-，-N = N-，-S-，-O-或

公开(公告)号：US4255447A

公开(公告)日：1981-03-10

申请号：US65340

申请日：1979-08-09

申请人： Kiyomi Ozawa ,  Shigeru Ishii ,  Mamoru Hayashi ,  Masayoshi Hirose ,  Kiminori Hirata

发明人： Kiyomi Ozawa ,  Shigeru Ishii ,  Mamoru Hayashi ,  Masayoshi Hirose ,  Kiminori Hirata

IPC分类号： C07C253/00 ,  A01N53/00 ,  A01N53/08 ,  C07C67/00 ,  C07C255/39 ,  C07C121/75

CPC分类号： A01N53/00

摘要： Phenylcyclopropane carboxylic acid derivatives having the formula (I) ##STR1## wherein X represents a C.sub.2 -C.sub.10 straight or branched alkyl group, are novel compounds having excellent acaricidal effect.

摘要翻译： 具有式（I）的苯基环丙烷羧酸衍生物（I）其中X表示C2-C10直链或支链烷基，是具有优异杀螨效果的新型化合物。

公开(公告)号：US5716264A

公开(公告)日：1998-02-10

申请号：US683424

申请日：1996-07-18

申请人： Norio Kimura ,  Ritsuo Kikuta ,  You Ishii ,  Masayoshi Hirose

发明人： Norio Kimura ,  Ritsuo Kikuta ,  You Ishii ,  Masayoshi Hirose

IPC分类号： B24B37/00 ,  B24B53/007 ,  B24B21/18

CPC分类号： B24B53/017

摘要： A polishing apparatus is employed to polish an object to be polished by urging the surface of the object to be polished against the surface of a polishing cloth and causing a relative movement therebetween, while supplying a polishing liquid into an area between the object to be polished and the polishing cloth. A plurality of nozzles spray respective fluid jets to strike against the surface of the cloth. The plurality of nozzles include more than one type of nozzle which vary flow velocity, flow rate, angle of spray, and cross-sectional configuration of a jet. The plurality of nozzles have axes positioned at a location at different distances from the rotation axis of the polishing cloth.

摘要翻译： 抛光装置用于通过将待抛光物体的表面推压在抛光布的表面上并在其之间相对移动，同时将抛光液体提供到待抛光对象之间的区域中来抛光待抛光物体 和抛光布。 多个喷嘴喷射相应的流体射流以抵靠布的表面。 多个喷嘴包括不止一种类型的喷嘴，其改变流速，流速，喷射角度和射流的横截面构造。 多个喷嘴具有位于与抛光布的旋转轴线不同的距离处的轴线。

公开(公告)号：US5643056A

公开(公告)日：1997-07-01

申请号：US550117

申请日：1995-10-30

申请人： Masayoshi Hirose ,  Seiji Ishikawa ,  Norio Kimura ,  Yoshimi Sasaki ,  Kouki Yamada ,  Fujio Aoyama ,  Noburu Shimizu ,  Katsuya Okumura

发明人： Masayoshi Hirose ,  Seiji Ishikawa ,  Norio Kimura ,  Yoshimi Sasaki ,  Kouki Yamada ,  Fujio Aoyama ,  Noburu Shimizu ,  Katsuya Okumura

IPC分类号： B24B7/22 ,  B24B29/02 ,  B24B37/07 ,  B24B37/10 ,  H01L21/304 ,  B24B1/00

CPC分类号： B24B7/228 ,  B24B29/02 ,  B24B37/04

摘要： A drum-type polishing apparatus for producing a flat mirror polish on an object such as a semiconductor wafer, is capable of three degrees of freedom of movement of a drum member with respect to the wafer. The relative movements can be made, successively or simultaneously, at right angles to an axis of the drum, parallel to the surface of the wafer, as well as at any desired angular orientations. Combined with a follower device to provide automatic compensation for unevenness in pressing pressure applied to the wafer during polishing, the polishing apparatus offers outstanding uniformity in polishing quality and high productivity, even for large diameter wafers, with a comparatively modest investment in both facility space and equipment cost.

摘要翻译： 用于在诸如半导体晶片的物体上制造平面镜抛光的滚筒式抛光装置能够使鼓构件相对于晶片具有三个自由度的移动。 相对运动可以连续或同时地与滚筒的轴线成直角，平行于晶片的表面以及任何期望的角度取向。 结合跟随装置，为抛光期间对晶片施加的压力压力的不均匀性提供自动补偿，抛光装置即使对于大直径晶片也具有优异的抛光质量均匀性和高生产率，在设备空间和 设备成本

公开(公告)号：US5616063A

公开(公告)日：1997-04-01

申请号：US309193

申请日：1994-09-20

申请人： Katsuya Okumura ,  Riichirou Aoki ,  Hiromi Yajima ,  Masako Kodera ,  Shirou Mishima ,  Atsushi Shigeta ,  Masayoshi Hirose ,  Norio Kimura ,  Seiji Ishikawa

发明人： Katsuya Okumura ,  Riichirou Aoki ,  Hiromi Yajima ,  Masako Kodera ,  Shirou Mishima ,  Atsushi Shigeta ,  Masayoshi Hirose ,  Norio Kimura ,  Seiji Ishikawa

IPC分类号： H01L21/302 ,  B08B1/04 ,  B24B27/00 ,  B24B37/04 ,  B24B37/34 ,  B24B51/00 ,  B24B55/12 ,  H01L21/00 ,  H01L21/677 ,  B24B49/00

CPC分类号： H01L21/67167 ,  B08B1/04 ,  B08B13/00 ,  B24B27/0023 ,  B24B37/04 ,  B24B37/345 ,  B24B51/00 ,  B24B55/12 ,  H01L21/67028 ,  H01L21/67046 ,  H01L21/67057 ,  H01L21/67161 ,  H01L21/67219 ,  H01L21/67745

摘要： A polishing apparatus is a cluster type of apparatus having a plurality of units which perform various operations. The polishing apparatus includes a universal transfer robot having at least one arm for transferring a workpiece, a plurality of units disposed around the universal transfer robot and including a loading unit for receiving the workpiece to be polished, at least one polishing unit for polishing the workpiece, at least one washing unit for washing the workpiece which has been polished and an unloading unit for receiving the cleaned workpiece. Discrete mechanisms respectively transfer a clean workpiece and a dirty workpiece amongst the units.

摘要翻译： 抛光装置是具有执行各种操作的多个单元的集群类型的装置。 抛光装置包括具有用于传送工件的至少一个臂的通用传送机器人，设置在通用传送机器人周围的多个单元，并且包括用于接收被抛光工件的装载单元，用于抛光工件的至少一个抛光单元 至少一个用于清洗已经被抛光的工件的洗涤单元和用于接收清洁的工件的卸载单元。 离散机构分别在单元之间传送清洁的工件和脏工件。

公开(公告)号：US5476414A

公开(公告)日：1995-12-19

申请号：US124550

申请日：1993-09-22

申请人： Masayoshi Hirose ,  Manabu Tsujimura ,  Seiji Ishikawa ,  Norio Kimura ,  You Ishii

发明人： Masayoshi Hirose ,  Manabu Tsujimura ,  Seiji Ishikawa ,  Norio Kimura ,  You Ishii

IPC分类号： B24B37/10 ,  B24B37/30 ,  H01L21/304 ,  B24B7/22

CPC分类号： H01L21/02024 ,  B24B37/107 ,  B24B37/30

摘要： A workpiece such as a semiconductor wafer is supported on a top ring and polished by an abrasive cloth on a turntable while the top ring is being pressed against the turntable and the turntable and the top ring are being rotated. The top ring is coupled to a top ring drive shaft, coupled to a pressure cylinder for pressing the top ring, and to a motor for rotating the top ring. A spherical bearing is interposed between the top ring and the top ring drive shaft for allowing the top ring to align with the upper surface of the moving turntable. A torque transmitting mechanism is operatively coupled between the top ring and the top ring drive shaft for rotating the top ring in synchronization with the top ring drive shaft.

摘要翻译： 诸如半导体晶片的工件被支撑在顶环上并且通过研磨布在转盘上抛光，同时顶环被压靠在转台上，并且转台和顶环正在旋转。 顶环联接到顶环驱动轴，联接到用于按压顶环的压力缸，以及用于旋转顶环的电动机。 在顶环和顶环驱动轴之间插入有球面轴承，用于允许顶环与活动转台的上表面对准。 扭矩传递机构可操作地联接在顶环和顶环驱动轴之间，用于与顶环驱动轴同步地旋转顶环。

公开(公告)号：US4908379A

公开(公告)日：1990-03-13

申请号：US185992

申请日：1988-04-25

申请人： Yasuyuki Nakajima ,  Takahiro Makabe ,  Kazunari Nakayama ,  Tatsuo Numata ,  Kiminori Hirata ,  Masaki Kudo ,  Yoshinori Ochiai ,  Masayoshi Hirose

发明人： Yasuyuki Nakajima ,  Takahiro Makabe ,  Kazunari Nakayama ,  Tatsuo Numata ,  Kiminori Hirata ,  Masaki Kudo ,  Yoshinori Ochiai ,  Masayoshi Hirose

IPC分类号： A01N43/40 ,  A01N43/54 ,  A01N43/64 ,  A01N43/707 ,  A01N43/90 ,  C07D239/52 ,  C07D239/54 ,  C07D239/553 ,  C07D239/56 ,  C07D239/58 ,  C07D239/60 ,  C07D251/20 ,  C07D251/38 ,  C07D253/075 ,  C07D401/12 ,  C07D471/04 ,  C07D487/04 ,  C07D498/04 ,  C07D513/04

CPC分类号： C07D239/553 ,  A01N43/40 ,  A01N43/54 ,  A01N43/64 ,  A01N43/707 ,  A01N43/90 ,  C07D239/52 ,  C07D239/56 ,  C07D239/60 ,  C07D251/20 ,  C07D251/38 ,  C07D253/075 ,  C07D401/12 ,  C07D471/04 ,  C07D487/04 ,  C07D513/04

摘要： A nitrogen-containing heterocyclic compound of the following formula: ##STR1## wherein D represents --N.dbd. or ##STR2## E represents .dbd.N--, ##STR3## G represents --N.dbd., ##STR4## with proviso that when G represents --N.dbd. or ##STR5## the bond of G and E is double bond; and G represents ##STR6## the bond thereof is a single bond, but the case that D represents ##STR7## E represents ##STR8## and G represents --N.dbd. is omitted (R.sup.1, R.sup.2, R.sup.9, R.sup.10, X, Y, A and Q are specified in the specification), as well as compositions for controlling and/or preventing pests and blights, said compositions containing one or two or more of said compounds as an active ingredient.

公开(公告)号：US4524252A

公开(公告)日：1985-06-18

申请号：US435219

申请日：1982-10-19

申请人： Tetuji Okazaki ,  Kanji Kawasaki ,  Masayoshi Hirose

发明人： Tetuji Okazaki ,  Kanji Kawasaki ,  Masayoshi Hirose

IPC分类号： G04F3/06 ,  H01H7/00

CPC分类号： G04F3/06 ,  Y10T74/2106

摘要： A motor-driven electric timer consists of a motor, a reduction gear assembly for reducing a rotational speed from the motor to a predetermined speed, an externally actuatable slider having at one side wall thereof a rack, a clutch mechanism consisting of a pinion gear driven by the reduction gear assembly for driving the rack and a spring wire disengageably biasing the pinion gear for engagement with the rack, a switching lever member following a side wall of the slider, a contact member actuated by the switching lever member, and a flat-shaped housing enclosing the timer.

摘要翻译： 电动电动定时器包括电动机，用于将电动机的转速降低到预定速度的减速装置组件，具有在其一个侧壁上的机架的外部可致动的滑块，由小齿轮驱动的离合器机构 通过用于驱动齿条的减速齿轮组件和能够与小齿轮可分离地偏置地与齿条接合的弹簧丝线，沿着滑块的侧壁，由切换杆构件致动的接触构件和平板状构件的切换杆构件， 包围定时器的外壳。

公开(公告)号：US4504483A

公开(公告)日：1985-03-12

申请号：US408912

申请日：1982-08-17

申请人： Kiyomi Ozawa ,  Masataka Hatanaka ,  Masayoshi Hirose ,  Masaki Kudo

发明人： Kiyomi Ozawa ,  Masataka Hatanaka ,  Masayoshi Hirose ,  Masaki Kudo

IPC分类号： A01N53/04 ,  A01N43/40 ,  A01N53/00 ,  C07D213/64 ,  C07D213/643 ,  C07D213/647

CPC分类号： C07D213/643 ,  A01N43/40 ,  A01N53/00 ,  C07D213/647

摘要： Fluorine substituted pyridine methyl esters having the formula ##STR1## wherein R represents ##STR2## in which X is chlorine or difluoromethoxy; Y is chlorine or tert-butyl; and Z is a halogen atom, are novel compounds which are useful as insecticides and acaricides.

摘要翻译： 氟取代的吡啶甲酯，其具有式（I）其中R表示其中X为氯或二氟甲氧基的X为 Y是氯或叔丁基; Z是卤原子，是可用作杀虫剂和杀螨剂的新型化合物。