公开(公告)号：US4558949A

公开(公告)日：1985-12-17

申请号：US419514

申请日：1982-09-17

申请人： Makoto Uehara ,  Takeshi Sudo ,  Fujio Kanatani

发明人： Makoto Uehara ,  Takeshi Sudo ,  Fujio Kanatani

IPC分类号： G01B11/26 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  G01C1/00

CPC分类号： G03F9/7026 ,  G03F9/7034

摘要： Disclosed is a horizontal position detecting device for maintaining the surface of a body to be inspected vertically to the optical axis of a main objective lens. The device includes an illumination optical system and a condenser lens system. The illumination optical system supplies parallel light rays to the surface of the body from the direction oblique to the optical axis of the objective lens. The condenser lens system condenses the light rays supplied by the illumination optical system and reflected by the surface of the body. The optical axes of the illumination optical system and the condenser lens system are arranged substantially symmetrically with respect to the axis of the objective lens.

摘要翻译： 公开了一种水平位置检测装置，用于保持要被检查的主体的表面垂直于主物镜的光轴。 该装置包括照明光学系统和聚光透镜系统。 照明光学系统从与物镜的光轴倾斜的方向将平行的光线提供给身体的表面。 聚光透镜系统将由照明光学系统提供的光线和由身体表面反射的光线聚光。 照明光学系统和聚光透镜系统的光轴相对于物镜的轴线大致对称地设置。

公开(公告)号：US4563062A

公开(公告)日：1986-01-07

申请号：US641402

申请日：1984-08-14

申请人： Fujio Kanatani

发明人： Fujio Kanatani

IPC分类号： G02B21/02 ,  G02B21/00 ,  G02B27/40 ,  G02B7/02

CPC分类号： G02B21/00

摘要： A microscope optical system for observation of test object, comprises an objective lens and a compensator provided to be inserted into and retracted from the optical path of the objective lens. The compensator is inserted into the optical path according to the change of the optical path length of the medium between the object lens and object to maintain good image forming performance irrespective of such change of the optical path length.

摘要翻译： 用于观察被测物体的显微镜光学系统包括设置成插入物镜的光路并从后退的物镜和补偿器。 补偿器根据物镜和物体之间的介质的光程长度的变化插入到光路中，以保持良好的图像形成性能，而与光路长度的这种变化无关。

公开(公告)号：US4402596A

公开(公告)日：1983-09-06

申请号：US345645

申请日：1982-02-04

申请人： Fujio Kanatani

发明人： Fujio Kanatani

IPC分类号： H01L21/30 ,  G01B11/00 ,  G02B27/00 ,  G03F9/00 ,  H01L21/027 ,  H01L21/68 ,  G03B27/52 ,  G03B27/70

CPC分类号： G03F9/70

摘要： A projection type exposure device includes a main projection objective lens for projecting onto a wafer a predetermined pattern on a negative plate to be projected, a main illuminating optical system including a condenser lens for illuminating the negative plate to be projected, and an alignment optical system for forming the image of a reference mark provided on the negative plate to be projected and the image of an alignment mark on the wafer through the main projection objective lens from between the condenser lens and the main projection objective lens. The alignment optical system has a first objective lens and a second objective lens for condensing the light beam from the first objective lens, the first and second objective lenses being disposed on the same optical axis, and a reflecting member for bending the optical axis so that it is orthogonal to the negative plate to be projected. The first objective lens and the reflecting member are movable together relative to the negative plate to be projected.

摘要翻译： 投影式曝光装置包括：主投影物镜，用于将投射在负极板上的预定图案投影到晶片;主照明光学系统，包括用于照射待投影的负极板的聚光透镜;以及对准光学系统 用于在聚光透镜和主投影物镜之间通过主投影物镜形成设置在待投影的负板上的参考标记的图像和晶片上的对准标记的图像。 对准光学系统具有第一物镜和第二物镜，用于聚集来自第一物镜的光束，第一和第二物镜设置在相同的光轴上，以及反射构件，用于弯曲光轴，使得 它与要投影的负极板正交。 第一物镜和反射构件相对于负极板一起移动以被投影。