摘要:
The invention relates to a method of protecting wood against light-induced degradation by treatment with an impregnation which penetrates the surface of the wood comprising a) water without an organic solvent and b) a selected sterically hindered amine N-oxyl or N-hydroxyl. A further subject is the use of a sterically hindered amine N-oxyl or N-hydroxyl for the stabilization of wood.
摘要:
Aqueous storage-stable, non-sedimenting photoinitiator suspensions comprising (a) a mono- or bis-acylphosphine oxide of formula (I), wherein R1 is C1-C20alkyl; C2-C20alkyl interrupted by one or more O atoms; C1-C12alkoxy; phenyl-C1-C4alkyl; or phenyl that is unsubstituted or substituted by C1C20alkyl, C1-C12alkoxy, halogen, cyclopentyl, cyclohexyl, C2-C12alkenyl, C2-C18alkyl interrupted by one or more O atoms, and/or by phenyl-C1-C4alkyl; or R1 is biphenylyl; R2 is an aromatic radical or has one of the meanings give for R1; R3 and R4 are each independently of the other C1-C12alkyl, C1-C12alkoxy or halogen; and R5 is hydrogen, C1-C12alkyl, C1-C12alkoxy or halogen; (b) a dispersant; and (c) water are suitable especially in the photopolymerisation of aqueous formulations comprising ethylenically unsaturated monomers.
摘要:
Compounds of the formula I in which R1 is C1-C4alkyl, R2 is hydrogen, C1-C4alkyl or C1-C4alkoxy and R3, R4, R5, R6 and R7 independently of one another are hydrogen, halogen, C1-C20alkyl, cyclopentyl, cyclohexyl, C2-C12alkenyl, C2-C18alkyl which is interrupted by one or more oxygen atoms, or are phenyl-substituted C1-C4alkyl, or are phenyl which is unsubstituted or is mono- or disubstituted by C1-C4alkyl and/or C1-C4alkoxy, with the provisos that at least one of the radicals R3, R4, R5, R6 and R7 is other than hydrogen and that, if R1 and R2 are methyl, R3 and R6 are not methyl, and mixtures of such compounds with &agr;-hydroxy ketones, benzophenones and &agr;-amino ketones, are suitable as photoinitiators.
摘要:
Compounds of the formula I in which R1 is C1-C4alkyl, R2 is hydrogen, C1-C4alkyl or C1-C4alkoxy and R3, R3, R4, R5, R6, and R7 independently of one another are hydrogen, halogen, C1-C20alkyl, cyclopentyl, cyclohexyl, C2-C12alkenyl, C2-C18 alkyl which is interrupted by one or more oxygen atoms, or are phenyl-substituted C1-C4alkyl, or are phenyl which is unsubstituted or is mono- or disubstituted by C1-C4alkyl and/or C1-C4alkoxy, with the provisos that at least one of the radicals R3, R4, R5, R6 and R7 is other than hydrogen and that, if R1 and R2 are methyl, R3 and R6 are not methyl, and mixtures of such compounds with &agr;-hydroxy ketones, benzophenones and &agr;-amino ketones, are suitable as photoinitiators.
摘要:
The invention relates to a process for the production of strongly adherent coatings on an inorganic or organic substrate that comprises, in a first step a) subjecting the inorganic or organic substrate to the action of a low-temperature plasma discharge, a corona discharge, high-energy UV radiation or electron radiation, then discontinuing the radiation or discharge; in a further step b) under vacuum or at normal pressure, applying one or more photoinitiators containing at least one ethylenically unsaturated group to the inorganic or organic substrate, and allowing reaction with the free-radical sites formed there; and c1) coating the substrate so precoated with photoinitiator with a composition comprising at least one ethylenically unsaturated monomer or oligomer, and curing the coating by means of UV/VIS radiation or c2) depositing a metal, semi-metal oxide or metal oxide from the gaseous phase, in the presence of UV light, on the substrate so precoated with photoinitiator. The invention relates also to the use of photoinitiators having at least one ethylenically unsaturated group in the production of such layers and to the strongly adherent coatings themselves.
摘要:
Photoinitiator combinations comprising at least one compound of formula (I) wherein R1 is C1-C4alkyl, C1-C4alkoxy or halogen; R2 is hydrogen, C1-C4alkyl, C1-C4alkoxy or halogen; R3 is, for example, C1-C20alkyl, cyclopentyl, cyclohexyl, phenyl-C1-C4alkyl, naphthyl or biphenylyl or an O-, S- or N-containing 5- or 6-membered heterocyclic ring; and at least one compound of formula (II) wherein R1 and R2 are as defined above; R9 is, for example, C1-C20alkyl, cyclopentyl, cyclohexyl, phenyl-C1-C4alkyl, naphthyl, biphenylyl or an O-, S- or N-containing 5- or 6-membered heterocyclic ring; and R10 is, for example, C1-C20alkyl, C2-C20alkyl interrupted by one or more O atoms, cyclopentyl, cyclohexyl, phenyl-C1-C4alkyl, naphthyl, biphenylyl or an O-, S- or N-containing 5- or 6-membered heterocyclic ring; are reactive photohardeners causing only a low degree of yellowing in the cured substrates.
摘要:
Photoinitiator combinations comprising at least one compound of formula (I) R1 is C1-C4alkyl, C1-C4alkoxy or halogen; R2 is hydrogen, C1-C4alkyl, C1-C4alkoxy or halogen; R3 is, for example, C1-C20alkyl, cyclopentyl, cyclohexyl, phenyl-C1-C4alkyl, naphthyl or biphenylyl or an O—, S— or N-containing 5- or 6-membered heterocyclic ring; and at least one compound of formula (II) R1 and R2 are as defined above; R9 is, for example, C1-C20alkyl, cyclopentyl, cyclohexyl, phenyl-C1-C4alkyl, naphthyl, biphenylyl or an O—, S— or N-containing 5- or 6-membered heterocyclic ring; and R10 is, for example, C1-C20alkyl, C2-C20alkyl interrupted by one or more O atoms, cyclopentyl, cyclohexyl, phenyl-C1-C4alkyl, naphthyl, biphenylyl or an O—, S— or N-containing 5- or 6-membered heterocyclic ring; are reactive photo hardeners causing only a low degree of yellowing in the cured substrates.