公开(公告)号：US12096678B2

公开(公告)日：2024-09-17

申请号：US15283672

申请日：2016-10-03

申请人： NIKON CORPORATION

发明人： Yasutaka Nishi ,  Makoto Nakazumi

IPC分类号： B05B13/02 ,  B05B7/08 ,  B05B13/04 ,  B05B16/60 ,  B05B17/06 ,  B05D1/02 ,  B05D3/06 ,  C23C24/08 ,  G03F7/16 ,  H10K71/00 ,  H10K71/60 ,  B05D3/10

CPC分类号： H10K71/00 ,  B05B7/0869 ,  B05B13/0221 ,  B05B13/0463 ,  B05B16/60 ,  B05B17/06 ,  B05D1/02 ,  B05D3/062 ,  C23C24/082 ,  G03F7/16 ,  H10K71/611 ,  B05D3/06 ,  B05D3/10 ,  B05D2252/02

摘要： A film forming apparatus, a substrate processing apparatus, and a device manufacturing method are provided, which improve the film thickness uniformity of a thin film that is formed on a substrate by spraying a thin film material. The film forming apparatus which forms a thin film on a substrate is provided with a nozzle that sprays a thin film material and an exhaust unit that discharges a gas. An exhaust port of the exhaust unit is arranged on a side that is opposite to the direction in which the gravity acts with respect to the substrate. The substrate processing apparatus performs a predetermined process on the substrate using the film forming apparatus. The device manufacturing method manufactures a device using the film forming apparatus.

公开(公告)号：US12096553B2

公开(公告)日：2024-09-17

申请号：US16572652

申请日：2019-09-17

申请人： CARNEGIE MELLON UNIVERSITY

发明人： Gary K. Fedder ,  Carmel Majidi ,  Philip R. LeDuc ,  Lee E. Weiss ,  Christopher J. Bettinger ,  Naser Naserifar

IPC分类号： H05K1/02 ,  B29C33/40 ,  H01L21/48 ,  H05K1/18 ,  H05K3/30 ,  H05K3/38 ,  H05K3/46 ,  B05D3/10 ,  H01L23/31 ,  H05K5/06

CPC分类号： H05K1/0283 ,  B29C33/40 ,  H01L21/4803 ,  H05K1/02 ,  H05K1/185 ,  H05K3/30 ,  H05K3/38 ,  H05K3/4644 ,  A61B2562/125 ,  A61B2562/164 ,  B05D3/10 ,  B05D3/107 ,  B05D3/108 ,  H01L23/3121 ,  H05K5/065 ,  H05K2201/1003

摘要： A flexible and stretchable integrated electronic device includes a substrate having a stiffness gradient, wherein a rigid electronic device is embedded within the substrate. The stiffness gradient within the substrate prevents delamination at the interface between the substrate and the embedded device. The stiffness gradient is accomplished by providing at least two distinct zones in the substrate with uniform stiffness, with each zone decreasing in stiffness as in a distance from the embedded device increases, or the gradient is accomplished by having a zone with a varying stiffness.

公开(公告)号：US12090510B2

公开(公告)日：2024-09-17

申请号：US16768315

申请日：2018-12-21

申请人： LG CHEM, LTD.

发明人： Hyun Taek Oh ,  Chang Hoon Sin ,  Kwang Seung Park ,  Moon Soo Park

IPC分类号： B05D1/38 ,  B05D3/10 ,  B05D5/06 ,  B05D7/24 ,  C09D5/00 ,  C09D183/04 ,  G02B1/113

CPC分类号： B05D1/38 ,  B05D3/10 ,  B05D5/063 ,  B05D7/24 ,  C09D5/006 ,  C09D183/04 ,  G02B1/113 ,  B05D2320/00 ,  B05D2350/63

摘要： Provided is a method for preparing a silica layer, comprising bringing to gelation a precursor layer formed from a precursor composition comprising a silica precursor, an acid catalyst and a surfactant.

公开(公告)号：US10059026B2

公开(公告)日：2018-08-28

申请号：US15315217

申请日：2015-06-30

申请人： Dow Global Technologies LLC

发明人： Xue Chen ,  Stephen W. King

IPC分类号： B27K3/02 ,  B05D7/06 ,  B27K3/50 ,  B27K3/15 ,  C08H8/00 ,  C08L23/14 ,  D21H17/07 ,  D21H17/35 ,  D21H17/43 ,  B27K3/08 ,  B27K5/00 ,  B27K3/36 ,  B27K3/42 ,  B27K3/34 ,  B27K3/38 ,  A01N33/02 ,  A01N33/04 ,  A01N27/00 ,  A01N33/06 ,  B05D1/36 ,  B05D3/10 ,  B05D5/00 ,  D06M101/06 ,  C08K5/17 ,  C08K5/18 ,  C08L23/08 ,  D06M13/325 ,  D06M15/227 ,  D06M15/263 ,  D06M15/267

CPC分类号： B27K3/50 ,  A01N27/00 ,  A01N33/02 ,  A01N33/04 ,  A01N33/06 ,  B05D1/36 ,  B05D3/10 ,  B05D3/107 ,  B05D5/00 ,  B05D7/06 ,  B05D2203/20 ,  B05D2507/00 ,  B05D2507/005 ,  B05D2507/01 ,  B05D2507/015 ,  B05D2507/02 ,  B05D2507/025 ,  B27K3/0278 ,  B27K3/0292 ,  B27K3/08 ,  B27K3/153 ,  B27K3/34 ,  B27K3/36 ,  B27K3/38 ,  B27K3/42 ,  B27K5/007 ,  B27K5/0075 ,  B27K2240/20 ,  B27K2240/70 ,  C08H8/00 ,  C08K5/17 ,  C08K5/18 ,  C08L23/0876 ,  C08L23/14 ,  D06M13/325 ,  D06M15/227 ,  D06M15/263 ,  D06M15/267 ,  D06M2101/06 ,  D21H17/07 ,  D21H17/35 ,  D21H17/43 ,  C08L23/0815

摘要： The present disclosure describes a treated cellulosic material comprising: a cellulosic material having a porous structure defining a plurality of pores, at least a portion of the pores containing a treating agent comprising: a polymer comprising an olefin-carboxylic acid copolymer; and a modifying agent comprising a hydrophobic amine.

公开(公告)号：US20180206336A1

公开(公告)日：2018-07-19

申请号：US15923442

申请日：2018-03-16

申请人： CARNEGIE MELLON UNIVERSITY

发明人： Gary K. Fedder ,  Carmel Majidi ,  Philip R. LeDuc ,  Lee E. Weiss ,  Christopher J. Bettinger ,  Naser Naserifar

IPC分类号： H05K1/02 ,  H05K1/18 ,  H05K3/30 ,  H05K3/46 ,  H05K3/38

CPC分类号： H05K1/0283 ,  A61B2562/125 ,  A61B2562/164 ,  B05D3/10 ,  B05D3/107 ,  B05D3/108 ,  B29C33/40 ,  H01L21/4803 ,  H01L23/3121 ,  H05K1/02 ,  H05K1/185 ,  H05K3/30 ,  H05K3/38 ,  H05K3/4644 ,  H05K5/065 ,  H05K2201/1003

摘要： A flexible and stretchable integrated electronic device comprising a substrate having a stiffness gradient, wherein a rigid electronic device is embedded within the substrate. The stiffness gradient within the substrate prevents delamination at the interface between the substrate and the embedded device. A method of fabricating an integrated electronic device having a stiffness gradient comprises applying a curing agent to an uncured polymer base material.

公开(公告)号：US20180161737A1

公开(公告)日：2018-06-14

申请号：US15319041

申请日：2015-12-01

申请人： SIGMA-TECHNOLOGY INC.

发明人： Yoshiaki TACHIBANA

IPC分类号： B01F1/00 ,  B01F3/04 ,  B01F5/02 ,  B01F15/06 ,  H01L21/02 ,  H01L21/033 ,  H01L21/304 ,  B05B7/16

CPC分类号： B01F1/0005 ,  B01F1/00 ,  B01F3/04 ,  B01F3/04049 ,  B01F5/02 ,  B01F5/0231 ,  B01F15/06 ,  B05B7/16 ,  B05B7/1666 ,  B05B7/32 ,  B05D1/02 ,  B05D3/10 ,  B08B3/02 ,  B08B3/08 ,  H01L21/02052 ,  H01L21/027 ,  H01L21/0331 ,  H01L21/304

摘要： Provided are a cleaning method and cleaning device for cleaning with micro/nano-bubbles, with which a simple method of spraying a treatment solution containing micro/nano-bubbles onto a substrate to be processed makes it possible to efficiently and reliably peel off residual resist or remove contaminants from the substrate, while reducing an environmental load. This cleaning method is characterized in that, with respect to a substrate to be treated to which a resist film has adhered onto the substrate or a substrate to be treated to which the surface thereof has been contaminated with a metal or metal compounds, the resist film is peeled off or the metals or metal compounds are removed by spraying onto the substrate to be treated a treatment solution containing gaseous micro/nano-bubbles and having a temperature maintained at 30° C. to 90° C., the mean particle size of the micro/nano-bubbles when measured by an ice embedding method using a cryo-transmission electron microscope being 100 nm or smaller, preferably 30 nm or smaller, and also preferably the density of such bubbles being 108 or more bubbles per 1 mL.

公开(公告)号：US20170025644A1

公开(公告)日：2017-01-26

申请号：US15283672

申请日：2016-10-03

申请人： NIKON CORPORATION

发明人： Yasutaka NISHI ,  Makoto NAKAZUMI

IPC分类号： H01L51/56 ,  B05D1/02 ,  B05D3/06 ,  H01L51/00

CPC分类号： H01L51/56 ,  B05D1/02 ,  B05D3/06 ,  B05D3/062 ,  B05D3/10 ,  B05D2252/02 ,  C23C24/082 ,  G03F7/16 ,  H01L51/0022

摘要： A film forming apparatus, a substrate processing apparatus, and a device manufacturing method are provided, which improve the film thickness uniformity of a thin film that is formed on a substrate by spraying a thin film material. The film forming apparatus which forms a thin film on a substrate is provided with a nozzle that sprays a thin film material and an exhaust unit that discharges a gas. An exhaust port of the exhaust unit is arranged on a side that is opposite to the direction in which the gravity acts with respect to the substrate. The substrate processing apparatus performs a predetermined process on the substrate using the film forming apparatus. The device manufacturing method manufactures a device using the film forming apparatus.

摘要翻译： 提供一种成膜装置，基板处理装置和装置制造方法，其通过喷涂薄膜材料来改善在基板上形成的薄膜的膜厚均匀性。 在基板上形成薄膜的成膜装置设置有喷射薄膜材料的喷嘴和排出气体的排气单元。 排气单元的排气口布置在与重力相对于基板作用的方向相反的一侧。 基板处理装置使用成膜装置对基板进行规定的处理。 装置制造方法制造使用成膜装置的装置。

公开(公告)号：US09511995B2

公开(公告)日：2016-12-06

申请号：US13397230

申请日：2012-02-15

申请人： Brian Lee Wardle ,  Fabio Ferruccio Fachin ,  Stefan Nikles ,  Mathew Varghese

发明人： Brian Lee Wardle ,  Fabio Ferruccio Fachin ,  Stefan Nikles ,  Mathew Varghese

IPC分类号： B81C1/00 ,  G01P15/08

CPC分类号： B05D3/10 ,  B81B2201/0235 ,  B81B2203/0109 ,  B81C1/00007 ,  B81C1/0019 ,  G01P15/0802 ,  Y10T428/24612

摘要： The disclosure generally relates to method and apparatus for forming three-dimensional MEMS. More specifically, the disclosure relates to a method of controlling out-of-plane buckling in microstructural devices so as to create micro-structures with out-of-plane dimensions which are 1×, 5×, 10×, 100× or 500× the film's thickness or above the surface of the wafer. An exemplary device formed according to the disclosed principles, includes a three dimensional accelerometer having microbridges extending both above and below the wafer surface.

公开(公告)号：US20160340543A1

公开(公告)日：2016-11-24

申请号：US15111007

申请日：2015-01-08

申请人： SUMITOMO BAKELITE CO., LTD.

发明人： Fumihiro Maeda ,  Yasushi Arita

IPC分类号： C09D161/06 ,  C09D165/00 ,  E21B41/02 ,  F16L58/10 ,  E21B17/00 ,  B05D7/22 ,  C09D5/08

CPC分类号： C09D161/06 ,  B05D3/10 ,  B05D3/102 ,  B05D3/107 ,  B05D3/108 ,  B05D7/222 ,  B05D2202/00 ,  B05D2254/00 ,  B05D2254/04 ,  C08G2261/344 ,  C09D5/08 ,  C09D161/00 ,  C09D161/02 ,  C09D161/04 ,  C09D161/12 ,  C09D161/14 ,  C09D161/16 ,  C09D161/18 ,  C09D161/34 ,  C09D165/00 ,  E21B17/00 ,  E21B41/02 ,  F16L55/164 ,  F16L55/1645 ,  F16L57/00 ,  F16L58/10 ,  F16L58/1009 ,  F16L2101/16

摘要： There is provided a coating material for coating at least a part of an inner wall of a pipe for transporting oil and or gas mined from underground. It contains an acid curing agent and an acid curable resin to be cured by the acid curing agent. The coating material passes through the pipe for transporting the oil and/or gas mined from the underground to coat at least a part of the inner wall of the pipe with a cured product of the acid curable resin. It is possible to provide the coating material for coating the inner wall of the pipe for transporting the oil and/or gas mined from the underground to prevent corrosion of the inner wall of the pipe by a high anti-corrosion effect thereof. There is also provided a method for coating the inner wall of the pipe with the cured product of the coating material.

摘要翻译： 提供了用于涂覆用于输送从地下开采的油和/或煤气的管道的内壁的至少一部分的涂料。 它含有通过酸固化剂固化的酸固化剂和酸固化树脂。 涂料通过管道，用于输送从地下开采的油和/或气体，用酸固化树脂的固化产物涂覆在管的内壁的至少一部分上。 可以提供用于涂覆管道内壁的涂料，用于运输从地下开采的油和/或气体，以防止管道内壁由于其高的防腐蚀作用而被腐蚀。 还提供了用涂层材料的固化产物涂覆管的内壁的方法。

公开(公告)号：US20160297985A1

公开(公告)日：2016-10-13

申请号：US15055987

申请日：2016-02-29

申请人： Dow Global Technologies LLC ,  Rohm and Haas Electronic Materials LLC

发明人： Zhifeng BAI ,  Michael K. GALLAGHER ,  Zidong WANG ,  Christopher J. TUCKER ,  Matthew T. BISHOP ,  Elissei IAGODKINE ,  Mark S. OLIVER

IPC分类号： C09D143/04 ,  C09D7/12 ,  B05D3/00 ,  C09D5/00

CPC分类号： C09D143/04 ,  B05D3/007 ,  B05D3/10 ,  C08G61/02 ,  C08G61/12 ,  C08G2261/3424 ,  C08G2261/344 ,  C08G2261/65 ,  C08L25/10 ,  C08L25/16 ,  C08L27/06 ,  C08L51/04 ,  C08L51/06 ,  C08L51/08 ,  C08L63/00 ,  C08L71/02 ,  C09D5/00 ,  C09D7/65 ,  C09J165/00 ,  H01L21/6835 ,  H01L2221/68318 ,  H05K3/285 ,  C08L65/00

摘要： Arylcyclobutene polymers having improved toughness are provided. Compositions and methods for coating arylcyclobutene polymers having improved toughness are also provided.

摘要翻译： 提供具有改善的韧性的芳族环烯烃聚合物。 还提供了具有改善的韧性的用于涂覆芳基环丁烯聚合物的组合物和方法。