公开(公告)号：US20150162165A1

公开(公告)日：2015-06-11

申请号：US14585829

申请日：2014-12-30

Applicant: Mapper Lithography IP B.V.

Inventor： Jerry PEIJSTER ,  Guido de Boer

IPC: H01J37/20 ,  H01J37/30 ,  H01J37/317

CPC classification number: H01J37/20 ,  H01J37/3002 ,  H01J37/3174 ,  H01J2237/2007 ,  H01J2237/202 ,  H01J2237/20264 ,  H01J2237/20278 ,  H01J2237/20292 ,  H01J2237/3175

Abstract: The invention relates to a charged particle beam lithography system comprising: a charged particle optical column arranged in a vacuum chamber for projecting a charged particle beam onto a target, wherein the column comprises deflecting means for deflecting the charged particle beam in a deflection direction, a target positioning device comprising a carrier for carrying the target, and a stage for carrying and moving the carrier along a first direction, wherein the first direction is different from the deflection direction, wherein the target positioning device comprises a first actuator for moving the stage in the first direction relative to the charged particle optical column, wherein the carrier is displaceably arranged on the stage and wherein the target positioning device comprises retaining means for retaining the carrier with respect to the stage in a first relative position.

Abstract translation: 本发明涉及一种带电粒子束光刻系统，包括：带电粒子光学柱，布置在真空室中，用于将带电粒子束投射到靶上，其中该柱包括偏转装置，用于偏转带电粒子束的偏转方向， 目标定位装置，包括用于承载目标的载体，以及用于沿着第一方向承载和移动载体的载物台，其中所述第一方向不同于所述偏转方向，其中所述目标定位装置包括用于使所述载物台移动的第一致动器 相对于带电粒子光学柱的第一方向，其中所述载体可位移地布置在所述载物台上，并且其中所述目标定位装置包括用于将所述载体相对于所述载物台保持在第一相对位置的保持装置。