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公开(公告)号:US08958054B2
公开(公告)日:2015-02-17
申请号:US13184107
申请日:2011-07-15
CPC分类号: G03F7/70341
摘要: A protrusion is provided on a barrier member which at least partly confines a liquid between a projection system and a substrate. The protrusion is closer to the projection system than other parts of the barrier member to promote a meniscus of liquid to adhere between the protrusion and the projection system.
摘要翻译: 在阻挡构件上设置突起,所述阻挡构件至少部分地将液体限制在投影系统和基板之间。 突起比屏障部件的其它部分更靠近投影系统,以促进液体的弯液面粘附在突起和投影系统之间。
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公开(公告)号:US08004654B2
公开(公告)日:2011-08-23
申请号:US12216669
申请日:2008-07-09
CPC分类号: G03F7/70341
摘要: A protrusion is provided on a barrier member which at least partly confines a liquid between a projection system and a substrate. The protrusion is closer to the projection system than other parts of the barrier member to promote a meniscus of liquid to adhere between the protrusion and the projection system.
摘要翻译: 在阻挡构件上设置突起,所述阻挡构件至少部分地将液体限制在投影系统和基板之间。 突起比屏障部件的其它部分更靠近投影系统,以促进液体弯液面粘附在突起和投影系统之间。
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公开(公告)号:US08988651B2
公开(公告)日:2015-03-24
申请号:US13242125
申请日:2011-09-23
申请人: Marcel Beckers , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Ferdy Migchelbrink , Elmar Evers
发明人: Marcel Beckers , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Ferdy Migchelbrink , Elmar Evers
CPC分类号: G03F7/70716 , G03F7/70341 , G03F7/70808
摘要: A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.
摘要翻译: 用于浸没式光刻设备的液体供应系统在投影系统的最终元件和基底之间提供浸液的层流。 控制系统使溢出的机会最小化,并且提取器包括被配置为使振动最小化的出口阵列。
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公开(公告)号:US20110273695A1
公开(公告)日:2011-11-10
申请号:US13184107
申请日:2011-07-15
IPC分类号: G03B27/54
CPC分类号: G03F7/70341
摘要: A protrusion is provided on a barrier member which at least partly confines a liquid between a projection system and a substrate. The protrusion is closer to the projection system than other parts of the barrier member to promote a meniscus of liquid to adhere between the protrusion and the projection system.
摘要翻译: 在阻挡构件上设置突起,所述阻挡构件至少部分地将液体限制在投影系统和基板之间。 突起比屏障部件的其它部分更靠近投影系统,以促进液体的弯液面粘附在突起和投影系统之间。
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公开(公告)号:US20120008116A1
公开(公告)日:2012-01-12
申请号:US13240908
申请日:2011-09-22
申请人: Marcel Beckers , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Ferdy Migchelbrink , Elmar Evers
发明人: Marcel Beckers , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Ferdy Migchelbrink , Elmar Evers
IPC分类号: G03B27/52
CPC分类号: G03F7/70716 , G03F7/70341 , G03F7/70808
摘要: A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.
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公开(公告)号:US08976334B2
公开(公告)日:2015-03-10
申请号:US13240908
申请日:2011-09-22
申请人: Marcel Beckers , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Ferdy Migchelbrink , Elmar Evers
发明人: Marcel Beckers , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Ferdy Migchelbrink , Elmar Evers
CPC分类号: G03F7/70716 , G03F7/70341 , G03F7/70808
摘要: A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.
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公开(公告)号:US08259287B2
公开(公告)日:2012-09-04
申请号:US12081168
申请日:2008-04-11
申请人: Marcel Beckers , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Ferdy Migchelbrink , Elmar Evers
发明人: Marcel Beckers , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Ferdy Migchelbrink , Elmar Evers
CPC分类号: G03F7/70716 , G03F7/70341 , G03F7/70808
摘要: A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.
摘要翻译: 用于浸没式光刻设备的液体供应系统在投影系统的最终元件和基底之间提供浸液的层流。 控制系统使溢出的机会最小化,并且提取器包括被配置为使振动最小化的出口阵列。
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公开(公告)号:US20120008118A1
公开(公告)日:2012-01-12
申请号:US13242125
申请日:2011-09-23
申请人: Marcel BECKERS , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Ferdy Migchelbrink , Elmar Evers
发明人: Marcel BECKERS , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Ferdy Migchelbrink , Elmar Evers
IPC分类号: G03B27/52
CPC分类号: G03F7/70716 , G03F7/70341 , G03F7/70808
摘要: A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.
摘要翻译: 用于浸没式光刻设备的液体供应系统在投影系统的最终元件和基底之间提供浸液的层流。 控制系统使溢出的机会最小化,并且提取器包括被配置为使振动最小化的出口阵列。
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公开(公告)号:US07411654B2
公开(公告)日:2008-08-12
申请号:US11098615
申请日:2005-04-05
申请人: Marcel Beckers , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Ferdy Migchelbrink , Elmar Evers
发明人: Marcel Beckers , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Ferdy Migchelbrink , Elmar Evers
CPC分类号: G03F7/70716 , G03F7/70341 , G03F7/70808
摘要: A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.
摘要翻译: 用于浸没式光刻设备的液体供应系统在投影系统的最终元件和基底之间提供浸液的层流。 控制系统使溢出的机会最小化,并且提取器包括被配置为使振动最小化的出口阵列。
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公开(公告)号:US20080273182A1
公开(公告)日:2008-11-06
申请号:US12216669
申请日:2008-07-09
IPC分类号: G03B27/52
CPC分类号: G03F7/70341
摘要: A protrusion is provided on a barrier member which at least partly confines a liquid between a projection system and a substrate. The protrusion is closer to the projection system than other parts of the barrier member to promote a meniscus of liquid to adhere between the protrusion and the projection system.
摘要翻译: 在阻挡构件上设置突起,所述阻挡构件至少部分地将液体限制在投影系统和基板之间。 突起比屏障部件的其它部分更靠近投影系统,以促进液体的弯液面粘附在突起和投影系统之间。
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