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    Network architecture and protocol for cluster of lithography machines
    1.
    发明授权
    Network architecture and protocol for cluster of lithography machines 有权
    光刻机集群的网络架构和协议

    公开(公告)号：US09086912B2

    公开(公告)日：2015-07-21

    申请号：US13452990

    申请日：2012-04-23

    申请人： Marcel Nicolaas Jacobus Van Kervinck ,  Guido De Boer

    发明人： Marcel Nicolaas Jacobus Van Kervinck ,  Guido De Boer

    IPC分类号： G06F9/46 ,  G06F9/48 ,  G03F7/20 ,  H01J37/317 ,  B82Y10/00 ,  B82Y40/00

    CPC分类号： G06F9/48 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/70483 ,  G03F7/70508 ,  G03F7/70525 ,  G03F7/70991 ,  G05B19/41865 ,  G06F9/4881 ,  H01J37/3177

    摘要： A clustered substrate processing system comprising one or more lithography elements, each lithography element arranged for independent exposure of substrates according to pattern data. Each lithography element comprises a plurality of lithography subsystems, a control network arranged for communication of control information between the lithography subsystems and at least one element control unit for transmitting commands to and receiving responses from the lithography subsystems. Each lithography element also comprises a cluster front-end for interface to an operator or host system. The front-end is arranged for issuing a process program to the element control unit, the process program comprising a set of predefined commands and associated parameters, each command corresponding to a predefined action or sequence of actions to be performed by one or more of the lithography subsystems, and the parameters further defining how the action or sequence of actions are to be performed.

    摘要翻译： 包括一个或多个光刻元件的聚集基板处理系统，每个光刻元件被布置成根据图案数据独立地曝光基板。 每个光刻元件包括多个光刻子系统，控制网络被布置用于在光刻子系统与至少一个元件控制单元之间进行控制信息的通信，用于向光刻子系统发送命令并从光刻子系统接收响应。 每个光刻元件还包括用于与操作者或主机系统接口的群集前端。 前端被布置成用于向元件控制单元发出处理程序，该处理程序包括一组预定义的命令和相关联的参数，每个命令对应于由一个或多个 光刻子系统，以及进一步定义如何执行动作或动作序列的参数。

    LITHOGRAPHY SYSTEM AND METHOD FOR STORING POSITIONAL DATA OF A TARGET
    3.
    发明申请
    LITHOGRAPHY SYSTEM AND METHOD FOR STORING POSITIONAL DATA OF A TARGET 有权
    用于存储目标的位置数据的算法系统和方法

    公开(公告)号：US20130016327A1

    公开(公告)日：2013-01-17

    申请号：US13545896

    申请日：2012-07-10

    申请人： Alexius Otto Looije ,  Michel Pieter Dansberg ,  Marcel Nicolaas Jacobus Van Kervinck ,  Guido De Boer

    发明人： Alexius Otto Looije ,  Michel Pieter Dansberg ,  Marcel Nicolaas Jacobus Van Kervinck ,  Guido De Boer

    IPC分类号： G03B27/53

    CPC分类号： G03F7/70725 ,  G03F7/70775

    摘要： The invention relates to a lithography system for patterning a target, said system comprising a feedback control system comprising an actuator for displacing the target, a measurement system for measuring a position of said target, and a control unit adapted for controlling the actuator based on the position measured by the measurement system, said feedback control system having a first latency being a maximum latency between measuring and controlling the actuator based on said measuring, a storage system for storing the measured positions, comprising a receive buffer and a storage unit with a second latency being an average latency between receiving measured positions in the receive buffer and storing said measured positions in the storage unit, wherein the first latency is at least an order of magnitude smaller than the second latency, the feedback control system comprising a unidirectional connection for transmitting said measured positions to the storage system.

    摘要翻译： 本发明涉及一种用于图案化目标的光刻系统，所述系统包括反馈控制系统，该反馈控制系统包括用于移动目标的致动器，用于测量所述目标的位置的测量系统，以及适于基于 由所述测量系统测量的位置，所述反馈控制系统具有基于所述测量来测量和控制所述致动器之间的最大等待时间的第一等待时间，用于存储测量位置的存储系统，包括接收缓冲器和具有第二 延迟是在接收缓冲器中接收测量位置和存储存储单元中的所述测量位置之间的平均等待时间，其中第一等待时间比第二等待时间小至少一个数量级，反馈控制系统包括用于传输的单向连接 称存储系统的测量位置。

    Lithography system and method for storing positional data of a target
    4.
    发明授权
    Lithography system and method for storing positional data of a target 有权
    光刻系统和存储目标位置数据的方法

    公开(公告)号：US09009631B2

    公开(公告)日：2015-04-14

    申请号：US13545896

    申请日：2012-07-10

    申请人： Alexius Otto Looije ,  Michel Pieter Dansberg ,  Marcel Nicolaas Jacobus Van Kervinck ,  Guido De Boer

    发明人： Alexius Otto Looije ,  Michel Pieter Dansberg ,  Marcel Nicolaas Jacobus Van Kervinck ,  Guido De Boer

    IPC分类号： G06F17/50 ,  G03F7/20

    CPC分类号： G03F7/70725 ,  G03F7/70775

    摘要： The invention relates to a lithography system for patterning a target, said system comprising a feedback control system comprising an actuator for displacing the target, a measurement system for measuring a position of said target, and a control unit adapted for controlling the actuator based on the position measured by the measurement system, said feedback control system having a first latency being a maximum latency between measuring and controlling the actuator based on said measuring, a storage system for storing the measured positions, comprising a receive buffer and a storage unit with a second latency being an average latency between receiving measured positions in the receive buffer and storing said measured positions in the storage unit, wherein the first latency is at least an order of magnitude smaller than the second latency, the feedback control system comprising a unidirectional connection for transmitting said measured positions to the storage system.

    摘要翻译： 本发明涉及一种用于图案化目标的光刻系统，所述系统包括反馈控制系统，该反馈控制系统包括用于移动目标的致动器，用于测量所述目标的位置的测量系统，以及适于基于 由所述测量系统测量的位置，所述反馈控制系统具有基于所述测量来测量和控制所述致动器之间的最大等待时间的第一等待时间，用于存储测量位置的存储系统，包括接收缓冲器和具有第二 延迟是在接收缓冲器中接收测量位置和存储存储单元中的所述测量位置之间的平均等待时间，其中第一等待时间比第二等待时间小至少一个数量级，反馈控制系统包括用于传输的单向连接 称存储系统的测量位置。

    Method of processing a substrate in a lithography system
    5.
    发明授权
    Method of processing a substrate in a lithography system 有权
    在光刻系统中处理衬底的方法

    公开(公告)号：US08936994B2

    公开(公告)日：2015-01-20

    申请号：US13460191

    申请日：2012-04-30

    申请人： Vincent Sylvester Kuiper ,  Erwin Slot ,  Marcel Nicolaas Jacobus Van Kervinck ,  Guido De Boer ,  Hendrik Jan De Jong

    发明人： Vincent Sylvester Kuiper ,  Erwin Slot ,  Marcel Nicolaas Jacobus Van Kervinck ,  Guido De Boer ,  Hendrik Jan De Jong

    IPC分类号： H01L21/76 ,  G03F7/20 ,  H01L21/67 ,  H01L21/677

    CPC分类号： G03F7/70733 ,  G03F7/7075 ,  H01L21/67178 ,  H01L21/67225 ,  H01L21/67745

    摘要： A method of processing substrates in a lithography system unit, the lithography system unit comprising at least two substrate preparation units, a load lock unit comprising at least first and second substrate positions, and a substrate handling robot for transferring substrates between the substrate preparation units and the load lock unit. The method comprises providing a sequence of substrates to be exposed to the robot, including an Nth substrate, an N−1th substrate, and an N+1th substrate; transferring the Nth substrate to a first one of the substrate preparation units; clamping the Nth substrate on a first substrate support structure in the first substrate preparation unit to form a clamped Nth substrate; transferring the clamped Nth substrate from the first substrate preparation unit to an unoccupied one of the first and second positions in the load lock unit; and exposing the clamped Nth substrate in the lithography system unit.

    摘要翻译： 一种在光刻系统单元中处理衬底的方法，所述光刻系统单元包括至少两个衬底制备单元，包括至少第一和第二衬底位置的负载锁定单元，以及用于在衬底制备单元和 负载锁定单元。 该方法包括提供要暴露于机器人的一系列衬底，包括第N衬底，第N-1衬底和第N + 1衬底; 将第N衬底转移到第一衬底制备单元中; 将第N基板夹持在第一基板制备单元中的第一基板支撑结构上以形成夹紧的第N基板; 将所夹紧的第N基板从所述第一基板准备单元传送到所述装载锁定单元中的第一和第二位置中未被占用的基板; 并将光刻系统单元中夹紧的第N基片曝光。