公开(公告)号：US08089056B2

公开(公告)日：2012-01-03

申请号：US12393049

申请日：2009-02-26

申请人： Marco Jan Jaco Wieland ,  Bert Jan Kampherbeek ,  Alexander Hendrik Van Veen ,  Pieter Kruit ,  Stijn Willem Herman Karel Steenbrink

发明人： Marco Jan Jaco Wieland ,  Bert Jan Kampherbeek ,  Alexander Hendrik Van Veen ,  Pieter Kruit ,  Stijn Willem Herman Karel Steenbrink

IPC分类号： H01J37/12 ,  H01J37/30

CPC分类号： H01J37/12 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3007 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/1205 ,  H01J2237/121 ,  H01J2237/151

摘要： A charged particle multi-beamlet system for exposing a target using a plurality of beamlets. The system comprises a first plate having a plurality of holes formed in it, with a plurality of electrostatic projection lens systems formed at the location of each hole so that each electron beamlet passes through a corresponding projection lens system. The holes have sufficiently uniform placement and dimensions to enable focusing of the beamlets onto the surface of the target using a common control voltage. Preferably the electrostatic projection lens systems are controlled by a common electrical signal to focus the electron beamlets on the surface without correction of the focus or path of individual electron beamlets.

摘要翻译： 一种用于使用多个子束曝光目标的带电粒子多子束系统。 该系统包括在其中形成有多个孔的第一板，形成在每个孔的位置处的多个静电投影透镜系统，使得每个电子束通过相应的投影透镜系统。 这些孔具有足够均匀的放置和尺寸以使得能够使用公共控制电压将子束聚焦到靶的表面上。 优选地，静电投影透镜系统由公共电信号控制，以将电子束聚焦在表面上，而无需校正各个电子束的聚焦或路径。

公开(公告)号：US09105439B2

公开(公告)日：2015-08-11

申请号：US13304427

申请日：2011-11-25

申请人： Marco Jan Jaco Wieland ,  Bert Jan Kampherbeek ,  Alexander Hendrik Van Veen ,  Pieter Kruit ,  Stijn Willem Steenbrink

发明人： Marco Jan Jaco Wieland ,  Bert Jan Kampherbeek ,  Alexander Hendrik Van Veen ,  Pieter Kruit ,  Stijn Willem Steenbrink

IPC分类号： H01J37/317 ,  H01J37/12 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/30

CPC分类号： H01J37/12 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3007 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/1205 ,  H01J2237/121 ,  H01J2237/151

摘要： The invention relates to a charged particle optical system comprising a beamlet generator for generating a plurality of charged particle beamlets, an electrostatic deflection system for deflecting the beamlets, and a projection lens system for directing the beamlets from the beamlet generator towards the target. The electrostatic deflection system comprises a first electrostatic deflector and a second electrostatic deflector for scanning charged particle beamlets over the target. The second electrostatic deflector is located behind the first electrostatic deflector so that, during operation of the system, a beamlet generated by the beamlet generator passes both of the electrostatic deflectors. During operation of the first and second electrostatic deflectors the system is adapted to apply voltages on the first electrostatic deflector and the second electrostatic deflector of opposite sign.

摘要翻译： 本发明涉及一种带电粒子光学系统，其包括用于产生多个带电粒子子束的子束发生器，用于偏转子束的静电偏转系统，以及用于将子束从小波发生器引导到目标的投影透镜系统。 静电偏转系统包括用于在靶上扫描带电粒子束的第一静电偏转器和第二静电偏转器。 第二静电偏转器位于第一静电偏转器的后面，使得在系统操作期间，由小梁发生器产生的子束通过两个静电偏转器。 在第一和第二静电偏转器的操作期间，系统适于在第一静电偏转器和相反符号的第二静电偏转器上施加电压。