公开(公告)号：US20240153731A1

公开(公告)日：2024-05-09

申请号：US18039177

申请日：2021-11-24

申请人： KYOCERA Corporation

发明人： Takeshi MUNEISHI

IPC分类号： H01J37/147

CPC分类号： H01J37/147 ,  H01J2237/151

摘要： The manufacturing method for an electrostatic deflector includes: obtaining a plurality of first compacts having a sheet-like shape by molding a raw material containing a ceramic into each desired shape; obtaining a second compact by layering the plurality of first compacts; obtaining a tubular body by firing the second compact; and forming an internal electrode and an external electrode on an inner wall surface of the tubular body and on a surface other than the inner wall surface. In the obtaining the plurality of first compacts, a wiring layer serving as a connection conductor that electrically connects the internal electrode and the external electrode is formed on a surface of the first compact that is predetermined.

公开(公告)号：US20230154723A1

公开(公告)日：2023-05-18

申请号：US17359365

申请日：2019-12-06

申请人： ASML Netherlands B.V.

发明人： Yan REN ,  Albertus Victor Gerardus MANGNUS

IPC分类号： H01J37/147 ,  H01J37/145 ,  H01J37/28 ,  H01J37/20 ,  H01J37/09 ,  G01N23/2251

CPC分类号： H01J37/1478 ,  H01J37/1474 ,  H01J37/145 ,  H01J37/28 ,  H01J37/20 ,  H01J37/09 ,  G01N23/2251 ,  H01J2237/0455 ,  H01J2237/2611 ,  H01J2237/151 ,  H01J2237/226 ,  H01J2237/04926 ,  H01J2237/103 ,  G01N2223/07 ,  G01N2223/418 ,  G01N2223/507

摘要： Embodiments consistent with the disclosure herein include methods and a multi-beam apparatus configured to emit charged-particle beams for imaging a top and side of a structure of a sample, including: a deflector array including a first deflector and configured to receive a first charged-particle beam and a second charged-particle beam; a blocking plate configured to block one of the first charged-particle beam and the second charged-particle beam; and a controller having circuitry and configured to change the configuration of the apparatus to transition between a first mode and a second mode. In the first mode, the deflector array directs the second charged-particle beam to the top of the structure, and the blocking plate blocks the first charged-particle beam. And in the second mode, the first deflector deflects the first charged-particle beam to the side of the structure, and the blocking plate blocks the second charged-particle beam.

公开(公告)号：US09805908B2

公开(公告)日：2017-10-31

申请号：US15044510

申请日：2016-02-16

申请人： ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH

发明人： Matthias Firnkes ,  Stefan Lanio

IPC分类号： H01J37/12 ,  H01J37/147 ,  H01J37/153

CPC分类号： H01J37/1472 ,  H01J2237/151 ,  H01J2237/28

摘要： A signal charged particle deflection device for a charged particle beam device is provided. The signal charged particle deflection device includes a beam bender configured for deflecting the signal charged particle beam, wherein the beam bender includes a first electrode and a second electrode providing an optical path for the signal charged particle beam therebetween, wherein the first electrode has a first cross section in a plane perpendicular to the optical path, and the second electrode has a second cross section in the plane perpendicular to the optical path, and wherein a first part of the first cross section and a second part of the second cross section provide the optical path therebetween, and wherein the first part and the second part are different in shape.

公开(公告)号：US09502213B2

公开(公告)日：2016-11-22

申请号：US14831225

申请日：2015-08-20

申请人： Nissin Ion Equipment Co., Ltd.

发明人： Sami K. Hahto ,  Tetsuro Yamamoto

IPC分类号： H01J37/317 ,  H01J37/30

CPC分类号： H01J37/3171 ,  H01J37/3007 ,  H01J2237/047 ,  H01J2237/04756 ,  H01J2237/10 ,  H01J2237/121 ,  H01J2237/151 ,  H01J2237/24542 ,  H01J2237/30472

摘要： In one aspect, an ion implantation system is disclosed, which comprises a deceleration system configured to receive an ion beam and decelerate the ion beam at a deceleration ratio of at least 2, and an electrostatic bend disposed downstream of the deceleration system for causing a deflection of the ion beam. The electrostatic bend includes three tandem electrode pairs for receiving the decelerated beam, where each electrode pair has an inner and an outer electrode spaced apart to allow passage of the ion beam therethrough. Each of the electrodes of the end electrode pair is held at an electric potential less than an electric potential at which any of the electrodes of the middle electrode pair is held and the electrodes of the first electrode pair are held at a lower electric potential relative to the electrodes of the middle electrode pair.

摘要翻译： 一方面，公开了一种离子注入系统，其包括减速系统，该减速系统被配置为接收离子束并且以至少为2的减速比使离子束减速，以及设置在减速系统下游的静电弯曲件，用于引起偏转 的离子束。 静电弯曲包括用于接收减速梁的三个串联电极对，其中每个电极对具有间隔开的内电极和外电极，以允许离子束通过其中。 端电极对的每个电极被保持在比中间电极对的电极被保持的电位小的电位，并且第一电极对的电极相对于第一电极对的电位保持在较低的电位 中间电极对的电极。

公开(公告)号：US09455116B2

公开(公告)日：2016-09-27

申请号：US14692395

申请日：2015-04-21

申请人： Axcelis Technologies, Inc.

发明人： Causon Ko-Chuan Jen ,  William Bintz

IPC分类号： H01J37/00 ,  H01J37/147 ,  H01J37/20 ,  H01J37/317

CPC分类号： H01J37/1474 ,  H01J37/1478 ,  H01J37/20 ,  H01J37/3171 ,  H01J2237/08 ,  H01J2237/1506 ,  H01J2237/151 ,  H01J2237/152 ,  H01J2237/20207 ,  H01J2237/20214 ,  H01J2237/31701 ,  H01J2237/31708

摘要： An ion implantation system and method is provided for varying an angle of incidence of a scanned ion beam relative to the workpiece concurrent with the scanned ion beam impacting the workpiece. The system has an ion source configured to form an ion beam and a mass analyzer configured to mass analyze the ion beam. An ion beam scanner is configured to scan the ion beam in a first direction, therein defining a scanned ion beam. A workpiece support is configured to support a workpiece thereon, and an angular implant apparatus is configured to vary an angle of incidence of the scanned ion beam relative to the workpiece. The angular implant apparatus comprises one or more of an angular energy filter and a mechanical apparatus operably coupled to the workpiece support, wherein a controller controls the angular implant apparatus, thus varying the angle of incidence of the scanned ion beam relative to the workpiece concurrent with the scanned ion beam impacting the workpiece.

摘要翻译： 提供离子注入系统和方法，用于与扫描的离子束同时冲击工件，改变扫描离子束相对于工件的入射角。 该系统具有构造成形成离子束的离子源和被配置为质量分析离子束的质量分析器。 离子束扫描器被配置成沿着第一方向扫描离子束，其中限定扫描的离子束。 工件支撑件构造成在其上支撑工件，并且角度注入装置被配置为改变扫描离子束相对于工件的入射角。 角植入装置包括角度能量过滤器和可操作地耦合到工件支撑件的机械装置中的一个或多个，其中控制器控制角度注入装置，从而改变扫描离子束相对于工件的入射角度，同时与 扫描的离子束撞击工件。

公开(公告)号：US09177759B2

公开(公告)日：2015-11-03

申请号：US14301403

申请日：2014-06-11

申请人： Hitachi High-Technologies Corporation

发明人： Wen Li ,  Ryo Kadoi ,  Hajime Kawano ,  Hiroyuki Takahashi

IPC分类号： H01J37/26 ,  H01J37/28 ,  H01J37/147

CPC分类号： H01J37/28 ,  H01J37/1471 ,  H01J37/265 ,  H01J2237/1504 ,  H01J2237/151 ,  H01J2237/1536

摘要： The present invention provides a processing apparatus using a scanning electron microscope, which includes the scanning electron microscope having an electron optical system radiating and scanning a focused electron beam on a sample placed on a stage to image the sample, and an image processing/control section which controls the scanning electron microscope and processes the image obtained by imaging with the scanning electron microscope. The electron optical system of the scanning electron microscope has image shift electrodes comprised of electrostatic electrodes, the image shift electrodes moving a position at which to apply the focused electron beam onto the sample with the stage stopped to thereby shift a region in which the sample is to be imaged.

摘要翻译： 本发明提供一种使用扫描型电子显微镜的处理装置，该扫描型电子显微镜具有扫描型电子显微镜，该扫描型电子显微镜具有电子光学系统，该放射线照射放置在载置台上的样品上以聚焦的电子束，以对图像进行成像，图像处理/ 其控制扫描电子显微镜并用扫描电子显微镜对通过成像获得的图像进行处理。 扫描电子显微镜的电子光学系统具有由静电电极构成的图像移动电极，图像移动电极移动将聚焦电子束施加到样品上的位置，停止载体，从而移动样品的区域 被成像。

公开(公告)号：US20150136967A1

公开(公告)日：2015-05-21

申请号：US14605985

申请日：2015-01-26

申请人： Advanced Ion Beam Technology, Inc.

发明人： Nicholas WHITE ,  Zhimin WAN ,  Erik COLLART

IPC分类号： H01J37/05 ,  H01J37/147 ,  H01J37/30 ,  H01J37/317

CPC分类号： H01J37/05 ,  H01J3/04 ,  H01J3/26 ,  H01J37/1472 ,  H01J37/3007 ,  H01J37/3171 ,  H01J2237/04756 ,  H01J2237/053 ,  H01J2237/057 ,  H01J2237/151 ,  H01J2237/303 ,  H01J2237/31701

摘要： A deceleration apparatus capable of decelerating a short spot beam or a tall ribbon beam is disclosed. In either case, effects tending to degrade the shape of the beam profile are controlled. Caps to shield the ion beam from external potentials are provided. Electrodes whose position and potentials are adjustable are provided, on opposite sides of the beam, to ensure that the shape of the decelerating and deflecting electric fields does not significantly deviate from the optimum shape, even in the presence of the significant space-charge of high current low-energy beams of heavy ions.

摘要翻译： 公开了一种减速装置，能够使短点光束或高色带光束减速。 在任一种情况下，都会控制趋向于降低光束轮廓形状的效果。 提供了用于将离子束屏蔽到外部电位的盖子。 其位置和电位可调的电极设置在梁的相对两侧，以确保减速和偏转电场的形状不会显着偏离最佳形状，即使存在显着的空间电荷高 目前低能量的重离子束。

公开(公告)号：US20140014852A1

公开(公告)日：2014-01-16

申请号：US14027697

申请日：2013-09-16

申请人： Mapper Lithography IP B.V.

发明人： Marco Jan Jaco WIELAND ,  Bert Jan KAMPHERBEEK ,  Alexander Hendrik VAN VEEN ,  Pieter KRUIT ,  Stijn Willem STEENBRINK

IPC分类号： H01J37/317

CPC分类号： H01J37/3175 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/12 ,  H01J37/3007 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/1205 ,  H01J2237/121 ,  H01J2237/151 ,  H01J2237/31774

摘要： A projection lens arrangement for a charged particle multi-beamlet system, the projection lens arrangement including one or more plates and one or more arrays of projection lenses. Each plate has an array of apertures formed in it, with projection lenses formed at the locations of the apertures. The arrays of projection lenses form an array of projection lens systems, each projection lens system comprising one or more of the projection lenses formed at corresponding points of the one or more arrays of projection lenses.

摘要翻译： 一种用于带电粒子多子束系统的投影透镜装置，所述投影透镜装置包括一个或多个板和一个或多个投影透镜阵列。 每个板具有形成在其中的孔阵列，其中投影透镜形成在孔的位置处。 投影透镜的阵列形成投影透镜系统的阵列，每个投影透镜系统包括一个或多个投影透镜，其形成在一个或多个投影透镜阵列的对应点处。

公开(公告)号：US08183543B2

公开(公告)日：2012-05-22

申请号：US12178153

申请日：2008-07-23

申请人： Elmar Platzgummer

发明人： Elmar Platzgummer

IPC分类号： A61N5/00 ,  G21G5/00

CPC分类号： H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/12 ,  H01J37/3007 ,  H01J2237/0437 ,  H01J2237/0453 ,  H01J2237/04928 ,  H01J2237/1205 ,  H01J2237/1501 ,  H01J2237/151 ,  H01J2237/3045

摘要： A multi-beam source for generating a plurality of beamlets of energetic electrically charged particles. The multi-beam source includes an illumination system generating an illuminating beam of charged particles and a beam-forming system being arranged after the illumination system as seen in the direction of the beam, adapted to form a plurality of telecentric or homocentric beamlets out of the illuminating beam. The beam forming system includes a beam-splitter and an electrical zone device, the electrical zone having a composite electrode composed of a plurality of substantially planar partial electrodes, adapted to be applied different electrostatic potentials and thus influencing the beamlets.

摘要翻译： 一种用于产生能量带电粒子的多个子束的多光束源。 多光束源包括产生带电粒子的照明光束的照明系统，以及沿着光束的方向被布置在照明系统之后的束形成系统，适于在多个远心或同心圆的子束之外形成 照明光束。 束形成系统包括分光器和电区装置，电区具有由多个基本上平面的部分电极组成的复合电极，其适于施加不同的静电电势并因此影响子束。

公开(公告)号：US20120061583A1

公开(公告)日：2012-03-15

申请号：US13304427

申请日：2011-11-25

申请人： Marco Jan Jaco WIELAND ,  Bert Jan KAMPHERBEEK ,  Alexander Hendrik VAN VEEN ,  Pieter KRUIT ,  Stijn Willem Herman Karel STEENBRINK

发明人： Marco Jan Jaco WIELAND ,  Bert Jan KAMPHERBEEK ,  Alexander Hendrik VAN VEEN ,  Pieter KRUIT ,  Stijn Willem Herman Karel STEENBRINK

IPC分类号： H01J3/26 ,  H01J3/14

CPC分类号： H01J37/12 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3007 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/1205 ,  H01J2237/121 ,  H01J2237/151

摘要： The invention relates to a charged particle optical system comprising a beamlet generator for generating a plurality of charged particle beamlets, an electrostatic deflection system for deflecting the beamlets, and a projection lens system for directing the beamlets from the beamlet generator towards the target. The electrostatic deflection system comprises a first electrostatic deflector and a second electrostatic deflector for scanning charged particle beamlets over the target. The second electrostatic deflector is located behind the first electrostatic deflector so that, during operation of the system, a beamlet generated by the beamlet generator passes both of the electrostatic deflectors. During operation of the first and second electrostatic deflectors the system is adapted to apply voltages on the first electrostatic deflector and the second electrostatic deflector of opposite sign.

摘要翻译： 本发明涉及一种带电粒子光学系统，其包括用于产生多个带电粒子子束的子束发生器，用于偏转子束的静电偏转系统，以及用于将子束从小波发生器引导到目标的投影透镜系统。 静电偏转系统包括用于在靶上扫描带电粒子束的第一静电偏转器和第二静电偏转器。 第二静电偏转器位于第一静电偏转器的后面，使得在系统操作期间，由小梁发生器产生的子束通过两个静电偏转器。 在第一和第二静电偏转器的操作期间，系统适于在第一静电偏转器和相反符号的第二静电偏转器上施加电压。