-
1.发明申请METHOD AND APPARATUS FOR REAL TIME FAULT DETECTION IN HIGH SPEED SEMICONDUCTOR PROCESSES 审中-公开用于高速半导体工艺中的实时故障检测的方法和装置公开(公告)号：US20100014748A1
公开(公告)日：2010-01-21
申请号：US12176829
申请日：2008-07-21
IPC分类号： G06K9/00
CPC分类号： H01L21/67253 , H01L21/67242
摘要： An apparatus for collecting data during processing of a structure, such as a semiconductor wafer, which includes data collection devices or sensors positioned in a processing chamber for processing the wafer. The data collection sensors may operate at speeds of about 10 Hertz (Hz). A controller communicates and receives data from the data collection sensors. A data processing device communicates with the controller for receiving and processing the data, and the data processing device analyzes the data and determines at least one process response.
摘要翻译： 一种用于在诸如半导体晶片的结构的处理期间收集数据的装置，其包括位于处理室中用于处理晶片的数据收集装置或传感器。 数据采集传感器可以以大约10赫兹（Hz）的速度运行。 控制器从数据采集传感器传送和接收数据。 数据处理装置与控制器通信以接收和处理数据，并且数据处理装置分析数据并确定至少一个处理响应。
-
公开(公告)号：US08634949B2
公开(公告)日：2014-01-21
申请号：US12783736
申请日：2010-05-20
申请人： Brian C. Barker , Edward P. Higgins , Richard L. Kleinhenz , Gary R. Moore , Mark L. Reath , Justin W. Wong , Horst Zisgen
发明人： Brian C. Barker , Edward P. Higgins , Richard L. Kleinhenz , Gary R. Moore , Mark L. Reath , Justin W. Wong , Horst Zisgen
IPC分类号： G06F19/00
摘要： A solution for managing a manufacturing environment using operating data for each of a plurality of tools in the manufacturing environment. The operating data can include actual resource consumption data and/or actual exhaust generation data for a tool while the tool implements at least a portion of a recipe to manufacture one of a plurality of types of products manufactured in the manufacturing environment. Operation of the manufacturing environment can be configured to optimize one or more aspects of resource consumption and/or exhaust generation during the manufacture of desired quantities of the plurality of types of products within a desired time frame using the operating data.
摘要翻译： 用于使用制造环境中的多个工具中的每一个的操作数据来管理制造环境的解决方案。 操作数据可以包括用于工具的实际资源消耗数据和/或实际排气产生数据，同时工具实施配方的至少一部分以制造在制造环境中制造的多种类型的产品中的一种。 制造环境的操作可以被配置为在使用操作数据在期望的时间范围内制造期望量的多种类型的产品期间优化资源消耗和/或废气产生的一个或多个方面。
-
公开(公告)号：US20110288668A1
公开(公告)日：2011-11-24
申请号：US12783736
申请日：2010-05-20
申请人： Brian C. Barker , Edward P. Higgins , Richard L. Kleinhenz , Gary R. Moore , Mark L. Reath , Justin W. Wong , Horst Zisgen
发明人： Brian C. Barker , Edward P. Higgins , Richard L. Kleinhenz , Gary R. Moore , Mark L. Reath , Justin W. Wong , Horst Zisgen
IPC分类号： G06F19/00
摘要： A solution for managing a manufacturing environment using operating data for each of a plurality of tools in the manufacturing environment. The operating data can include actual resource consumption data and/or actual exhaust generation data for a tool while the tool implements at least a portion of a recipe to manufacture one of a plurality of types of products manufactured in the manufacturing environment. Operation of the manufacturing environment can be configured to optimize one or more aspects of resource consumption and/or exhaust generation during the manufacture of desired quantities of the plurality of types of products within a desired time frame using the operating data.
摘要翻译： 用于使用制造环境中的多个工具中的每一个的操作数据来管理制造环境的解决方案。 操作数据可以包括用于工具的实际资源消耗数据和/或实际排气产生数据，同时工具实施配方的至少一部分以制造在制造环境中制造的多种类型的产品中的一种。 制造环境的操作可以被配置为在使用操作数据在期望的时间范围内制造期望量的多种类型的产品期间优化资源消耗和/或废气产生的一个或多个方面。
-
公开(公告)号：US07094614B2
公开(公告)日：2006-08-22
申请号：US09681126
申请日：2001-01-16
申请人： Douglas S. Armbrust , John M. Baker , Arne W. Ballantine , Roger W. Cheek , Doreen D. DiMilia , Mark L. Reath , Michael B. Rice
发明人： Douglas S. Armbrust , John M. Baker , Arne W. Ballantine , Roger W. Cheek , Doreen D. DiMilia , Mark L. Reath , Michael B. Rice
CPC分类号： H01L21/28556 , C23C16/52
摘要： A method and apparatus are provided for controlling a CVD process used to deposit films on semiconductor substrates wherein the by-products of the reaction are measured and monitored during the reaction preferably using mass spectrometry and the results used to calculate the concentrations of the by-products and to control the CVD reaction process based on the by-product concentrations. An exemplary CVD process is the deposition of tungsten metal on a semiconductor wafer. A preferred method and apparatus uses a capillary gas sampling device for removing the by-product gases of the reaction as a feed for the mass spectrometer. The capillary gas sampling device is preferably connected to a differential pump.
-
5.发明申请METHOD OF SYSTEM MAINTENANCE PLANNING BASED ON CONTINUAL ROBOT PARAMETER MONITORING 审中-公开基于连续机器人参数监测的系统维护规划方法公开(公告)号：US20090078562A1
公开(公告)日：2009-03-26
申请号：US11858406
申请日：2007-09-20
申请人： Gary J. Johnson , Mark L. Reath , David C. Strippe
发明人： Gary J. Johnson , Mark L. Reath , David C. Strippe
IPC分类号： G05B19/19
CPC分类号： G05B19/41875 , G05B2219/32234 , G05B2219/45031 , H01L21/67259 , H01L21/67745 , H01L21/67748 , Y02P90/20 , Y02P90/22 , Y02P90/86
摘要： At least one substrate location sensor is provided on a piece of equipment containing two adjoined chambers between which substrates may be transferred one at a time. Deviation of substrate position from a predetermined optimal position is measured as a substrate is transferred between the two adjoined chambers. Measured data on the deviation of substrate position is entered into a statistical control program hosted in a computing means. The measured data indicates the level of performance of the robot and/or the condition of alignment of components in one of the two chambers. As the statistical control generates flags based on the measured data, maintenance activities may be performed. Thus, maintenance activities may be performed on a “as-needed” basis, determined by the measurement data on performance of the equipment.
摘要翻译： 至少一个基板位置传感器设置在包含两个邻接的室的一个设备上，其间可以一次一个地转移基板。 当衬底在两个邻接的室之间转移时，测量衬底位置与预定最佳位置的偏差。 对基板位置的偏差的测量数据被输入到在计算装置中托管的统计控制程序中。 测量数据表示机器人的性能水平和/或两个腔室之一中部件对准的状态。 由于统计控制基于测量数据生成标志，因此可以执行维护活动。 因此，维护活动可以在“根据需要”的基础上进行，由关于设备性能的测量数据确定。
-
-
-
-
搜索结果
5 条记录 (耗时 0.022 秒)