Multiple fluid product stream processing
    1.
    发明申请
    Multiple fluid product stream processing 审中-公开
    多流体产品流处理

    公开(公告)号:US20080105316A1

    公开(公告)日:2008-05-08

    申请号:US11583761

    申请日:2006-10-18

    IPC分类号: B01F5/04

    摘要: The disclosure is directed to techniques for processing multiple fluid product streams. The techniques employ multiple intensifier pump systems in combination with a fluid processing device to mix, react or otherwise combine multiple fluid product streams. The intensifier pump systems produce fluid product streams with substantially uniform pressure levels for introduction into the fluid processing device. The fluid processing device directs the multiple fluid product streams at one another via opposing flow paths, providing a dispersed phase. The intensifier pump systems include supply pumps that deliver separate fluid products at intermediate pressure levels. Charge intensifier pumps receive the separate fluid products and apply hydraulic intensification to expel the products at high pressure levels. Product intensifier pumps receive the intensified fluid products and expel them at high pressures. The supply, charge and product intensifier pumps operate in a coordinated manner to maintain a substantially uniform fluid pressures without significant pulsation.

    摘要翻译: 本公开涉及用于处理多个流体产物流的技术。 这些技术使用多个增压泵系统与流体处理装置组合以混合,反应或以其他方式组合多个流体产物流。 增压泵系统产生具有基本上均匀的压力水平的流体产物流,用于引入流体处理装置。 流体处理装置通过相对的流动路径将多个流体产物流引导到彼此,从而提供分散相。 增压泵系统包括供应泵,其在中等压力水平下提供分开的流体产品。 充电增压泵接收单独的流体产品并施加液压强化以在高压水平下排出产品。 产品增压泵接收强化的流体产品并在高压下排出。 供应,充电和产品增压泵以协调的方式操作,以保持基本上均匀的流体压力而没有显着的脉动。

    Processing of a CMP slurry for improved planarization of integrated circuit wafers
    2.
    发明申请
    Processing of a CMP slurry for improved planarization of integrated circuit wafers 审中-公开
    用于改进集成电路晶片的平坦化的CMP浆料的处理

    公开(公告)号:US20080076332A1

    公开(公告)日:2008-03-27

    申请号:US11525375

    申请日:2006-09-21

    IPC分类号: B24B7/00

    摘要: The disclosure is directed to a system that processes chemical mechanical planarization (CMP) slurries to reduce or eliminate large particles in the slurries, which can scratch integrated circuit wafers without substantially altering a percentage of solids in the CMP slurry by weight. In particular, the system breaks up particles of a CMP slurry using an intensifier pump system and a fluid processing device. The techniques have proven much more effective than conventional filtering techniques in reducing or eliminating scratches to integrated circuit wafers when a processed CMP slurry is used in a CMP process.

    摘要翻译: 本公开涉及一种处理化学机械平坦化(CMP)浆料以减少或消除浆料中的大颗粒的系统,其可以刮擦集成电路晶片而基本上不改变CMP浆料中固体的重量百分比。 特别地,该系统使用增压泵系统和流体处理装置分解CMP浆料的颗粒。 在CMP工艺中使用经处理的CMP浆料时,这些技术已被证明比传统的过滤技术更有效地减少或消除了对集成电路晶片的划痕。

    Open-end filter assembly for fluid processing system
    3.
    发明申请
    Open-end filter assembly for fluid processing system 审中-公开
    用于流体处理系统的开放式过滤器组件

    公开(公告)号:US20080185326A1

    公开(公告)日:2008-08-07

    申请号:US11703476

    申请日:2007-02-07

    IPC分类号: B01D35/02 B01D35/22

    CPC分类号: B01D29/115 B01D29/908

    摘要: The disclosure is directed to a fluid processing system utilizing an open-end filter assembly to produce a product fluid. The system includes a fluid pump to deliver the raw fluid to a fluid processor and a heat exchanger to control the temperature of the processed fluid. The processed fluid is sent to an open-end filter assembly that allows a first portion of the processed fluid to pass through a filter element. A second portion of the processed fluid does not pass through the filter element and is directed back to the high pressure pump for further processing. In one example, the open-end filter assembly includes an outer cylinder that surrounds a cylindrical filter element to create an outer flow channel and an inner flow channel. Fluid may be introduced to the outer flow channel in a tangential orientation to enhance circular flow around the filter element.

    摘要翻译: 本公开涉及利用开放式过滤器组件来生产产品流体的流体处理系统。 该系统包括用于将原始流体输送到流体处理器的流体泵和用于控制被处理流体的温度的热交换器。 经处理的流体被送到开放式过滤器组件,其允许被处理流体的第一部分通过过滤元件。 被处理流体的第二部分不通过过滤元件并且被引导回到高压泵以进一步处理。 在一个示例中,开放式过滤器组件包括围绕圆柱形过滤器元件以形成外部流动通道和内部流动通道的外部圆筒。 可以以切向的方式将流体引入外部流动通道,以增强围绕过滤器元件的循环流动。

    Annular fluid processor with different annular path areas
    4.
    发明申请
    Annular fluid processor with different annular path areas 审中-公开
    环形流体处理器具有不同的环形路径区域

    公开(公告)号:US20080144430A1

    公开(公告)日:2008-06-19

    申请号:US11639472

    申请日:2006-12-14

    IPC分类号: B01F13/00

    摘要: The disclosure is directed to a high pressure fluid processing device for mixing, reacting, or otherwise combining fluids. The fluid processing device includes opposing, annular flow channels of different annular path areas. A first fluid enters the fluid processing device and flows through the first annular flow channel while the second fluid enters the fluid processing device and flows through the second annular flow channel. The opposing flows of fluids collide with one another within the flow channels, and exit through an outlet. The different annular path areas of the two annular flow channels may allow the two fluids to have different densities, viscosities, or both.

    摘要翻译: 本公开涉及用于混合,反应或以其它方式组合流体的高压流体处理装置。 流体处理装置包括不同环形路径区域的相对的环形流动通道。 当第二流体进入流体处理装置并流过第二环形流动通道时,第一流体进入流体处理装置并流过第一环形流动通道。 流体的相对流动在流动通道内相互碰撞,并通过出口离开。 两个环形流动通道的不同环形路径区域可以允许两种流体具有不同的密度,粘度或两者。

    Process for preparing a dispersion of hard particles in solvent
    6.
    发明授权
    Process for preparing a dispersion of hard particles in solvent 失效
    制备硬质颗粒在溶剂中的分散体的方法

    公开(公告)号:US6051630A

    公开(公告)日:2000-04-18

    申请号:US169872

    申请日:1998-10-12

    摘要: A process and a high pressure apparatus are disclosed which are useful in preparing magnetic dispersions and other dispersions of hard, non-compliant particulates. The apparatus can be monitored for clogs and wear and allows for relatively quick and inexpensive replacement of orifices. The apparatus includes a high pressure pump and a series of impingement chambers comprising an input manifold where the process stream is split into two or more streams and an output manifold where the streams are recombined after passing through restrictive orifices configured in such a manner that the streams impinge on each other at high velocities. The orifices in each succeeding impingement zone are the same size or smaller than the orifices in the preceding impingement zone, and the orifices in the final impingement zone must be smaller than the orifices in the first impingement zone.

    摘要翻译: 公开了一种方法和高压装置,其可用于制备硬的,不顺应的颗粒的磁性分散体和其它分散体。 该设备可以被监控堵塞和磨损,并允许相对快速和便宜的更换孔。 该装置包括高压泵和一系列冲击室,其包括输入歧管,其中过程流被分成两个或更多个流以及输出歧管,其中流在通过限制孔之后被重新组合, 以高速冲击彼此。 每个后续冲击区中的孔与前一冲击区中的孔相同或小于最终冲击区中的孔,并且最终冲击区中的孔必须小于第一冲击区中的孔。