公开(公告)号：US20190145831A1

公开(公告)日：2019-05-16

申请号：US16080927

申请日：2017-02-17

Applicant: Martin BERZ

Inventor： Martin BERZ

IPC: G01J9/02 ,  G01B9/02

CPC classification number: G01J9/0246 ,  G01B9/02041 ,  G01B9/02097 ,  G01B9/02098 ,  G01J9/02

Abstract: The invention relates to a three-dimensional interferometer (100) for measuring a light field generated by an object (110), in particular the determination of an electric field (E1ij, E2ij), especially of the phase (Φ1ij, Φ2ij) or of the phase (Φ1ij, Φ2ij) and of the intensity or the absolute value of the electric field (E1ij, E2ij), having a first interferometer arm (150), which can be so configured or adjusted, especially configured, that a first light beam runs through it, a second interferometer arm (152) so configurable or adjustable, especially configured, that a second light beam runs through it, a beam splitter (101)—that is configured—located between an object point (112) of the object (110) on the one hand and the first interferometer arm (150) and the second interferometer arm (152) on the other hand, to split a light beam emanating from the object point (112) at the beam splitter (101) into the first light beam and the second light beam, a detection plane (131) or detection surface, which is located after the first interferometer arm (150) and the second interferometer arm (152) and which is configured so that on it the first light beam and the second light beam are brought into inference in an interference area (132), and an overlap device (106) located between the detection plane (131) on the one hand and between the first interferometer arm (150) and the second interferometer arm (152) on the other hand, wherein the beam splitter (101), the first interferometer arm (150), the second interferometer arm (152), the overlap device (106) and the detection plane (131) can be configured or adjusted, especially configured so that there is an object point (112) of the object (110) exactly a central ray (114) emanating from the object point (112) which is split at the beam splitter (101) into a first central ray (120) and a second central ray (121), wherein the central ray (114) is a part of the light beam, the first central ray (120) is part of the first light beam and runs through the first interferometer arm (150) and the second central ray (121) is part of the second beam and runs through the second interferometer arm (152), and wherein the first central ray (120) and the second central ray (121) overlap in a central image point (133) on the detection plane (131) in the interference area (132); and that for each light ray (115), which emanates from the object point (112) of the object (110) and is part of the light beam, but is not the central ray (114), there is a first light ray (125) that passes through the first interferometer arm (150) and a second light ray (126) that passes through the second interferometer arm (152), which are split off at the beam splitter (101) from the light ray (115) and which strike the detection plane (131) at different points (134, 135), and that there is for each image point (134) of the interference area (132), which is not the central image point (133), exactly a third light ray (116), which emanates from the object point (112), is not the central ray (114), runs through the first interferometer arm (150) and strikes the image point (134) on the detection plane (131), and gives exactly a fourth light ray (117), which emanates from the object point (112), that is not the third light ray (116) before the beam splitter, is not the central ray (114), runs through the second interferometer arm (152) and overlaps with the third light ray (116) at the image point (134) on the detection plane (131), wherein the third light ray (116) and the fourth light ray (117) before the beam splitter (101) are part of the light beam.In addition, the invention relates to a method for determining a phase difference (Ψij) at at least one image point (134), especially a point or a pixel grid (i, j) of a detection surface (131), of an interference area (132) between a first electric field (E1ij) and a second electric field (E2ij), which interfere at at least one image point (134), wherein the first electric field (E1ij) originates from a first interference arm (152) and the second electric field (E2ij) originates from a second interference arm (152), when using an invention-related interferometer.In addition, the invention relates to a method for determining a phase of an electric field (E1ij, E2ij) in a part of an interference area (132) on a detection plane (131) of a three-dimensional interferometer (100), especially of an interferometer (100) according to the claims 1 to 9, having the following steps: for a part of the interference area (132) determining the intensity or the absolute value of a first electric field (E1ij), which originates from a first interference arm (150), and of a second electric field (E2ij), which originates from a second interference arm (152) Determination of the part of the interference area (132), determination of the interference term (IF) according to the equation IFij=|E1ij|·|E2ij|·exp(i·Ψij), wherein Ψij is a phase-difference between the phase (Φ1ij) of the first electric field (E1ij) and the phase (Φ2ij) of the second electric field (E2ij), that can be determined especially with the help of the method according to claim 11, determination of a propagation matrix (U), wherein especially the Rayleigh-Sommerfeld propagation formula can be used, wherein an element of the propagation matrix (U) states how the first electric field (E1ij) for a given pixel grid of the interference area at a pixel with the indices i and j is transformed to the second electric field (E2ij) at a pixel with the indices m and n, and solution of the equation  E   1 ij  2 · ∑ m , n  U ij , mn _ · E   1 mn _ = IF ij · E   1 ij _ after the complex first electric field (E1ij).In addition, the invention relates to a computer program and to a computer program product for carrying out the two said methods.

公开(公告)号：US20170268866A1

公开(公告)日：2017-09-21

申请号：US15505420

申请日：2015-08-19

Applicant: Martin BERZ

Inventor： Martin BERZ

IPC: G01B9/02 ,  G01J3/453 ,  G01B11/24

CPC classification number: G01B9/02072 ,  G01B9/02097 ,  G01B11/2441 ,  G01J3/45 ,  G01J3/453 ,  G01J9/02

Abstract: An interferometer includes a first interferometer arm and a second interferometer arm. A first central beam, originating from a central image point of an image, passes through the first interferometer arm. A second central beam, originating from the central image point, passes through the second interferometer arm. The first central beam and the second central beam are superimposed and generate a kperpendicular=0 interference at a superposition point. A first light beam perpendicular to the first central beam, originating from an image point of the image, passes through the first interferometer arm. A second light beam perpendicular to the second central beam, originating from the image point, passes through the second interferometer arm. The first light beam and the second light beam overlap at the superposition point. At the superposition point, a wave vector component of the first light beam opposes a wave vector component of the second light beam.