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公开(公告)号：US5174813A
公开(公告)日：1992-12-29
申请号：US788917
申请日：1991-11-07
摘要： A polish formulation containing as components thereof at least one member selected from the group consisting of waxes, solvents, surfactants, thickening agents, abrasives, dyes, odorants and other ingredients normally used in making polishes. The improvement resides in incorporating into the polish formulation a derivatized amine functional organosilicon compound.
摘要翻译： 含有选自蜡，溶剂，表面活性剂，增稠剂，研磨剂，染料，气味剂和通常用于制造抛光剂的其它成分的至少一种成分的组分的抛光剂。 改进在于将抛光制剂掺入衍生的胺官能的有机硅化合物中。
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公开(公告)号：US5154759A
公开(公告)日：1992-10-13
申请号：US762130
申请日：1991-09-19
摘要： A polish formulation containing as components thereof at least one member selected from the group consisting of waxes, solvents, surfactants, thickening agents, abrasives, dyes, odorants and other ingredients normally used in making polishes. The improvement resides in incorporating into the polish formulation a novel reactive amine functional silicone polymer.
摘要翻译： 含有选自蜡，溶剂，表面活性剂，增稠剂，研磨剂，染料，气味剂和通常用于制造抛光剂的其它成分的至少一种成分的组分的抛光剂。 改进在于将抛光制剂掺入新的反应性胺官能的硅氧烷聚合物中。
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3.发明授权
公开(公告)号：US5258063A
公开(公告)日：1993-11-02
申请号：US880924
申请日：1992-05-11
CPC分类号： C09G1/06
摘要： A polish formulation containing as components thereof at least one member selected from the group consisting of waxes, solvents, surfactants, film formers, abrasives and other ingredients normally used in making polishes. The improvement resides in incorporating into the polish formulation as a film former a silylated polycycloaliphatic amine or epoxide.
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公开(公告)号：US5110891A
公开(公告)日：1992-05-05
申请号：US683898
申请日：1991-04-11
摘要： A polish formulation containing as components thereof at least one member selected from the group consisting of waxes, solvents, surfactants, thickening agents, abrasives, dyes, odorants and other ingredients normally used in making polishes. The improvement resides in incorporating into the polish formulation a novel reactive amine functional silicone polymer.
摘要翻译： 含有选自蜡，溶剂，表面活性剂，增稠剂，研磨剂，染料，气味剂和通常用于制造抛光剂的其它成分的至少一种成分的组分的抛光剂。 改进在于将抛光制剂掺入新的反应性胺官能的硅氧烷聚合物中。
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公开(公告)号：US5531814A
公开(公告)日：1996-07-02
申请号：US429256
申请日：1995-04-25
申请人： Bradley C. Bahr , David B. Selley
发明人： Bradley C. Bahr , David B. Selley
IPC分类号： C09G1/00 , C09D5/00 , C09D5/02 , C09D183/04 , C09D183/08 , C09D183/12 , C09G1/04 , C09G1/16
摘要： Hard surfaces are polished by applying an abrasive free, preferably clear, composition formed from an aqueous phase and a silicone phase. The aqueous phase contains water and a water soluble hydrophilic organic solvent. The silicone phase contains a volatile methyl siloxane, a siloxane polyether, and an organosilicon resin.
摘要翻译： 通过施加由水相和硅氧烷相形成的无磨料，优选透明的组合物来研磨硬表面。 水相含有水和水溶性亲水性有机溶剂。 硅氧烷相含有挥发性甲基硅氧烷，硅氧烷聚醚和有机硅树脂。
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