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    Apparatus for preparing electrophotographic photosensitive members
    2.
    发明授权
    Apparatus for preparing electrophotographic photosensitive members 失效
    用于制备电子照相感光构件的装置

    公开(公告)号：US4974964A

    公开(公告)日：1990-12-04

    申请号：US436931

    申请日：1989-11-13

    申请人： Toshiyuki Yoshihara ,  Yoichi Kawamorita ,  Tomohiro Kimura ,  Masaru Nakagawa ,  Masaaki Hiro

    发明人： Toshiyuki Yoshihara ,  Yoichi Kawamorita ,  Tomohiro Kimura ,  Masaru Nakagawa ,  Masaaki Hiro

    IPC分类号： B01F15/04 ,  B05C1/08 ,  B05C3/02 ,  B05C11/10 ,  G03G5/00 ,  G03G5/05

    CPC分类号： B01F15/0408 ,  G03G5/0525 ,  Y10T137/2509

    摘要： An apparatus for preparing electrophotographic photosensitive members comprises a means for forming a charge generation layer by coating a charge generation layer coating solution containing two or more kinds of charge-generating materials having different maximum absorption wavelengths, wherein the apparatus further comprises a means for measuring absorbance or transmittance at the respective maximum absorption wavelengths of said coating solution to measure the mixing ratio of the respective charge-generating materials, and a means for controlling the mixing ratio by controlling the feed amount of the respective charge-generating materials.

    摘要翻译： 一种用于制备电子照相感光构件的装置包括通过涂布含有两种或更多种具有不同最大吸收波长的电荷产生材料的电荷产生层涂布溶液形成电荷产生层的装置，其中该装置还包括用于测量吸光度的装置 或在所述涂布溶液的各个最大吸收波长处的透射率，以测量各个电荷产生材料的混合比，以及通过控制各个电荷产生材料的进料量来控制混合比的装置。

    Electrophotographic photosensitive member with combination of polymethyl methacrylate resins
    6.
    发明授权
    Electrophotographic photosensitive member with combination of polymethyl methacrylate resins 失效
    具有聚甲基丙烯酸甲酯树脂组合的电子照相感光构件

    公开(公告)号：US4818654A

    公开(公告)日：1989-04-04

    申请号：US4276

    申请日：1987-01-13

    申请人： Masaaki Hiro ,  Toshiyuki Yoshihara

    发明人： Masaaki Hiro ,  Toshiyuki Yoshihara

    IPC分类号： G03G5/00 ,  C08L33/04 ,  G03G5/043 ,  G03G5/05 ,  G03G5/14 ,  G03G5/04

    CPC分类号： G03G5/0546

    摘要： An electrophotographic photosensitive member is provided which has an electroconductive substrate and a photosensitive layer, said photosensitive layer containing at least one of (I) polymethyl methacrylates having a molecular weight of 28.times.10.sup.4 or lower, preferably 1.0.times.10.sup.4 to 28.times.10.sup.4 and at least one of (II) polymethyl methacrylates having a molecular weight of 50.times.10.sup.4 to 250.times.10.sup.4, preferably 100.times.10.sup.4 to 250.times.10.sup.4, said polymethyl methacrylate (II) being contained at a proportion of 0.1 part by weight to 30 parts by weight in the composition consisting of the polymethyl methacrylates (I) and (II).

    摘要翻译： 提供一种电子照相感光构件，其具有导电基底和感光层，所述感光层包含分子量为28×104或更低，优选为1.0×10 4至28×10 4的（I）聚甲基丙烯酸甲酯和至少一种（II ）聚甲基丙烯酸甲酯，分子量为50×10 4至250×10 4，优选为100×10 4至250×10 4，所述聚甲基丙烯酸甲酯（II）的含量为0.1重量份至30重量份，在由聚甲基丙烯酸甲酯（I）和（ II）。

    Aberration correcting optical system
    7.
    发明申请
    Aberration correcting optical system 审中-公开
    畸变校正光学系统

    公开(公告)号：US20060056038A1

    公开(公告)日：2006-03-16

    申请号：US11268697

    申请日：2005-11-08

    申请人： Toshiyuki Yoshihara

    发明人： Toshiyuki Yoshihara

    IPC分类号： G02B3/00

    CPC分类号： G03F7/70483 ,  G02B5/3083 ,  G02B27/0025 ,  G03F7/70308 ,  G03F7/706

    摘要： A projection system for projecting a pattern of a mask onto a substrate. The projection system includes a projection optical system disposed between the mask and the substrate, and an optical element for correcting aberration produced in the projection optical system. The optical element has different refracting powers in two orthogonal directions or has a refracting power in one direction of two orthogonal directions and no refracting power in the other of the two orthogonal directions. The optical element is disposed between the mask and the substrate, in which an optical axis of the optical element is inclined with respect to an optical axis of the projection optical system.

    摘要翻译： 一种用于将掩模图案投影到基底上的投影系统。 投影系统包括设置在掩模和基板之间的投影光学系统和用于校正在投影光学系统中产生的像差的光学元件。 光学元件在两个正交方向上具有不同的折射能力，或者在两个正交方向的一个方向上具有折射能，而在两个正交方向上的折射能力不相同。 光学元件设置在掩模和基板之间，光学元件的光轴相对于投影光学系统的光轴倾斜。

    Aberration correction optical system
    8.
    发明授权
    Aberration correction optical system 失效
    畸变校正光学系统

    公开(公告)号：US06987621B2

    公开(公告)日：2006-01-17

    申请号：US10936797

    申请日：2004-09-09

    申请人： Toshiyuki Yoshihara

    发明人： Toshiyuki Yoshihara

    IPC分类号： G02B3/00 ,  G02B9/00 ,  G02B13/08

    CPC分类号： G03F7/70483 ,  G02B5/3083 ,  G02B27/0025 ,  G03F7/70308 ,  G03F7/706

    摘要： A projection system for projecting a pattern of a mask onto a substrate. The projection system includes a projection optical system disposed between the mask and the substrate, and an optical element for correcting aberration produced in the projection optical system. The optical element has different refracting powers in two orthogonal directions or has a refracting power in one direction of two orthogonal directions and no refracting power in the other of the two orthogonal directions. The optical element is disposed between the mask and the substrate. An optical axis of the optical element is inclined with respect to an optical axis of the projection optical system.

    摘要翻译： 一种用于将掩模图案投影到基底上的投影系统。 投影系统包括设置在掩模和基板之间的投影光学系统和用于校正在投影光学系统中产生的像差的光学元件。 光学元件在两个正交方向上具有不同的折射能力，或者在两个正交方向的一个方向上具有折射能，而在两个正交方向上的折射能力不相同。 光学元件设置在掩模和基板之间。 光学元件的光轴相对于投影光学系统的光轴倾斜。

    Electrophotographic charging device
    9.
    发明授权
    Electrophotographic charging device 失效
    电子照相充电装置

    公开(公告)号：US5068762A

    公开(公告)日：1991-11-26

    申请号：US438045

    申请日：1989-11-20

    申请人： Toshiyuki Yoshihara

    发明人： Toshiyuki Yoshihara

    IPC分类号： G03G5/00 ,  G03G15/00 ,  G03G15/02

    CPC分类号： G03G15/75 ,  G03G15/0216 ,  G03G5/00 ,  G03G5/005 ,  Y10S430/102

    摘要： An electrophotographic device has an electrophotographic photosensitive member and a blade for charging arranged in contact with the photosensitive member, the photosensitive member being charged by application of a voltage on the blade for charging, wherein the ten point surface average roughness Rz of the photosensitive member is 0.3 .mu.m to 5.0 .mu.m.

    摘要翻译： 电摄影装置具有电子照相感光构件和与感光构件接触的用于充电的叶片，感光构件通过在用于充电的叶片上施加电压而被充电，其中感光构件的十点表面平均粗糙度Rz为 0.3亩至5.0亩。

    Electrophotographic process
    10.
    发明授权
    Electrophotographic process 失效
    电子照相法

    公开(公告)号：US4533232A

    公开(公告)日：1985-08-06

    申请号：US474178

    申请日：1983-03-10

    申请人： Naoto Fujimura ,  Akihiro Sonobe ,  Toshiyuki Yoshihara ,  Norie Takebayashi ,  Takashi Tanaka ,  Masaki Kuribayashi

    发明人： Naoto Fujimura ,  Akihiro Sonobe ,  Toshiyuki Yoshihara ,  Norie Takebayashi ,  Takashi Tanaka ,  Masaki Kuribayashi

    IPC分类号： G03G15/05 ,  G03G5/00 ,  G03G13/22 ,  G03G13/26 ,  G03G15/04 ,  G03G15/00

    CPC分类号： G03G13/22

    摘要： An electrophotographic process comprising the steps of:(a) charging an electrophotographic photosensitive member comprising a conductive substrate and a photosensitive layer which includes a charge generation layer and a charge transport layer containing a charge-transporting material;(b) forming an image on the charged electrophotographic photosensitive member by exposing the charged photosensitive member to light substantially free of rays having the wavelength band which can be absorbed by the charge-transporting material contained in the charge transport layer; and(c) developing the image with a developer.

    摘要翻译： 一种电子照相方法，包括以下步骤：（a）对包括导电基底和感光层的电子照相感光构件进行充电，该感光层包括电荷产生层和含有电荷传输材料的电荷传输层; （b）通过将带电感光件暴露于基本上不含能够被电荷输送层中包含的电荷输送材料吸收的波长带的光线而在充电的电子照相感光构件上形成图像; 和（c）用开发者开发图像。