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    Electrophotographic process
    1.
    发明授权
    Electrophotographic process 失效
    电子照相法

    公开(公告)号：US4533232A

    公开(公告)日：1985-08-06

    申请号：US474178

    申请日：1983-03-10

    申请人： Naoto Fujimura ,  Akihiro Sonobe ,  Toshiyuki Yoshihara ,  Norie Takebayashi ,  Takashi Tanaka ,  Masaki Kuribayashi

    发明人： Naoto Fujimura ,  Akihiro Sonobe ,  Toshiyuki Yoshihara ,  Norie Takebayashi ,  Takashi Tanaka ,  Masaki Kuribayashi

    IPC分类号： G03G15/05 ,  G03G5/00 ,  G03G13/22 ,  G03G13/26 ,  G03G15/04 ,  G03G15/00

    CPC分类号： G03G13/22

    摘要： An electrophotographic process comprising the steps of:(a) charging an electrophotographic photosensitive member comprising a conductive substrate and a photosensitive layer which includes a charge generation layer and a charge transport layer containing a charge-transporting material;(b) forming an image on the charged electrophotographic photosensitive member by exposing the charged photosensitive member to light substantially free of rays having the wavelength band which can be absorbed by the charge-transporting material contained in the charge transport layer; and(c) developing the image with a developer.

    摘要翻译： 一种电子照相方法，包括以下步骤：（a）对包括导电基底和感光层的电子照相感光构件进行充电，该感光层包括电荷产生层和含有电荷传输材料的电荷传输层; （b）通过将带电感光件暴露于基本上不含能够被电荷输送层中包含的电荷输送材料吸收的波长带的光线而在充电的电子照相感光构件上形成图像; 和（c）用开发者开发图像。

    Aberration correcting optical system
    4.
    发明申请
    Aberration correcting optical system 审中-公开
    畸变校正光学系统

    公开(公告)号：US20060056038A1

    公开(公告)日：2006-03-16

    申请号：US11268697

    申请日：2005-11-08

    申请人： Toshiyuki Yoshihara

    发明人： Toshiyuki Yoshihara

    IPC分类号： G02B3/00

    CPC分类号： G03F7/70483 ,  G02B5/3083 ,  G02B27/0025 ,  G03F7/70308 ,  G03F7/706

    摘要： A projection system for projecting a pattern of a mask onto a substrate. The projection system includes a projection optical system disposed between the mask and the substrate, and an optical element for correcting aberration produced in the projection optical system. The optical element has different refracting powers in two orthogonal directions or has a refracting power in one direction of two orthogonal directions and no refracting power in the other of the two orthogonal directions. The optical element is disposed between the mask and the substrate, in which an optical axis of the optical element is inclined with respect to an optical axis of the projection optical system.

    摘要翻译： 一种用于将掩模图案投影到基底上的投影系统。 投影系统包括设置在掩模和基板之间的投影光学系统和用于校正在投影光学系统中产生的像差的光学元件。 光学元件在两个正交方向上具有不同的折射能力，或者在两个正交方向的一个方向上具有折射能，而在两个正交方向上的折射能力不相同。 光学元件设置在掩模和基板之间，光学元件的光轴相对于投影光学系统的光轴倾斜。

    Aberration correction optical system
    5.
    发明授权
    Aberration correction optical system 失效
    畸变校正光学系统

    公开(公告)号：US06987621B2

    公开(公告)日：2006-01-17

    申请号：US10936797

    申请日：2004-09-09

    申请人： Toshiyuki Yoshihara

    发明人： Toshiyuki Yoshihara

    IPC分类号： G02B3/00 ,  G02B9/00 ,  G02B13/08

    CPC分类号： G03F7/70483 ,  G02B5/3083 ,  G02B27/0025 ,  G03F7/70308 ,  G03F7/706

    摘要： A projection system for projecting a pattern of a mask onto a substrate. The projection system includes a projection optical system disposed between the mask and the substrate, and an optical element for correcting aberration produced in the projection optical system. The optical element has different refracting powers in two orthogonal directions or has a refracting power in one direction of two orthogonal directions and no refracting power in the other of the two orthogonal directions. The optical element is disposed between the mask and the substrate. An optical axis of the optical element is inclined with respect to an optical axis of the projection optical system.

    摘要翻译： 一种用于将掩模图案投影到基底上的投影系统。 投影系统包括设置在掩模和基板之间的投影光学系统和用于校正在投影光学系统中产生的像差的光学元件。 光学元件在两个正交方向上具有不同的折射能力，或者在两个正交方向的一个方向上具有折射能，而在两个正交方向上的折射能力不相同。 光学元件设置在掩模和基板之间。 光学元件的光轴相对于投影光学系统的光轴倾斜。

    Electrophotographic charging device
    6.
    发明授权
    Electrophotographic charging device 失效
    电子照相充电装置

    公开(公告)号：US5068762A

    公开(公告)日：1991-11-26

    申请号：US438045

    申请日：1989-11-20

    申请人： Toshiyuki Yoshihara

    发明人： Toshiyuki Yoshihara

    IPC分类号： G03G5/00 ,  G03G15/00 ,  G03G15/02

    CPC分类号： G03G15/75 ,  G03G15/0216 ,  G03G5/00 ,  G03G5/005 ,  Y10S430/102

    摘要： An electrophotographic device has an electrophotographic photosensitive member and a blade for charging arranged in contact with the photosensitive member, the photosensitive member being charged by application of a voltage on the blade for charging, wherein the ten point surface average roughness Rz of the photosensitive member is 0.3 .mu.m to 5.0 .mu.m.

    摘要翻译： 电摄影装置具有电子照相感光构件和与感光构件接触的用于充电的叶片，感光构件通过在用于充电的叶片上施加电压而被充电，其中感光构件的十点表面平均粗糙度Rz为 0.3亩至5.0亩。

    PROJECTION EXPOSURE APPARATUS, METHOD FOR CALIBRATING MEASUREMENT CRITERION OF DISPLACEMENT MEASUREMENT UNIT, AND METHOD FOR MANUFACTURING DEVICE
    8.
    发明申请
    PROJECTION EXPOSURE APPARATUS, METHOD FOR CALIBRATING MEASUREMENT CRITERION OF DISPLACEMENT MEASUREMENT UNIT, AND METHOD FOR MANUFACTURING DEVICE 审中-公开
    投影曝光装置，用于校准位移测量单元的测量标准的方法，以及制造装置的方法

    公开(公告)号：US20100124724A1

    公开(公告)日：2010-05-20

    申请号：US12621371

    申请日：2009-11-18

    申请人： Tomohiro Hoshino ,  Toshiyuki Yoshihara

    发明人： Tomohiro Hoshino ,  Toshiyuki Yoshihara

    IPC分类号： G03F7/20 ,  G03B27/54 ,  G01B11/14 ,  G03B27/52 ,  G03B27/68

    CPC分类号： G03B27/52 ,  G03F7/70258 ,  G03F7/70516 ,  G03F7/706 ,  G03F7/70883

    摘要： A projection exposure apparatus includes an optical element, and projects a pattern formed on a first object onto a second object to be exposed through a projection optical system for correcting imaging characteristics by controlling the optical element. The projection exposure apparatus includes: a displacement measurement unit configured to measure a displacement of the optical element; a storage unit configured to store a measurement criterion of the displacement measurement unit; an imaging characteristics measurement unit configured to measure imaging characteristics of the projection optical system; and a calibration unit configured to calibrate the measurement criterion based on a result of measurement by the imaging characteristics measurement unit.

    摘要翻译： 投影曝光装置包括光学元件，并且通过控制光学元件将通过用于校正成像特性的投影光学系统将形成在第一物体上的图案投射到第二待曝光物体上。 投影曝光装置包括：位移测量单元，被配置为测量光学元件的位移; 存储单元，被配置为存储所述位移测量单元的测量标准; 成像特性测量单元，被配置为测量所述投影光学系统的成像特性; 以及校准单元，被配置为基于所述成像特征测量单元的测量结果来校准所述测量标准。