公开(公告)号：US06549271B2

公开(公告)日：2003-04-15

申请号：US10247619

申请日：2002-09-20

申请人： Masahiko Yasuda ,  Masahiro Nei ,  Yuuki Ishii ,  Tetsuo Taniguchi

发明人： Masahiko Yasuda ,  Masahiro Nei ,  Yuuki Ishii ,  Tetsuo Taniguchi

IPC分类号： G03B2752

CPC分类号： G03F7/70691 ,  G03B27/52 ,  G03F7/70358 ,  G03F7/70866

摘要： A projection exposure method for exposing a substrate through a projection optical system with a predetermined pattern formed on a mask. The method includes the steps of calculating an amount of lateral variation of a pattern image in a direction perpendicular to an optical axis of the projection optical system, determining a distortion produced solely by the projection optical system, obtaining a total expected distortion by a summation of the distortion produced solely by the projection optical system and the calculated variation of the positions at which the image of the pattern of the mask is formed, and exposing the substrate while partially correcting the positions at which the image of the pattern of the mask is formed through the projection optical system based on the total expected distortion.

摘要翻译： 一种投影曝光方法，用于通过具有形成在掩模上的预定图案的投影光学系统曝光基板。 该方法包括以下步骤：计算在与投影光学系统的光轴垂直的方向上的图案图像的横向变化量，确定仅由投影光学系统产生的失真，通过总计 仅由投影光学系统产生的失真和形成掩模的图案的图像的位置的计算的变化，并且在部分地校正形成掩模的图案的图像的位置的同时曝光基板 通过投影光学系统的总预期失真。

公开(公告)号：US08754726B2

公开(公告)日：2014-06-17

申请号：US13193649

申请日：2011-07-29

申请人： Hiroyuki Sasaki ,  Hiroshi Masuda ,  Tetsuo Taniguchi

发明人： Hiroyuki Sasaki ,  Hiroshi Masuda ,  Tetsuo Taniguchi

IPC分类号： H01P3/08 ,  H01P5/12

CPC分类号： H01P1/20345 ,  H03H7/09 ,  H03H7/1708 ,  H03H7/1766 ,  H03H7/1775 ,  H03H7/42 ,  H03H2001/0085

摘要： In a multilayer band-pass filter, each of first-stage to third-stage LC parallel resonators includes capacitor electrodes, via electrodes, and a line electrode. Jump-coupling capacitor electrodes face the capacitor electrodes of the first-stage and third-stage LC parallel resonators. The direction in which the inductor electrode extends from the capacitor electrodes of each of the first-stage and third-stage LC parallel resonators is opposite to the direction in which the inductor electrode extends from the capacitor electrodes of the second-stage LC parallel resonator.

摘要翻译： 在多层带通滤波器中，第一级至第三级LC并联谐振器中的每一个包括电容器电极，通孔电极和线电极。 跳跃耦合电容电极面对第一级和第三级LC并联谐振器的电容电极。 电感器电极从第一级和第三级LC并联谐振器的电容器电极延伸的方向与电感器电极从第二级LC并联谐振器的电容器电极延伸的方向相反。

公开(公告)号：US08169288B2

公开(公告)日：2012-05-01

申请号：US13180666

申请日：2011-07-12

申请人： Yosuke Matsushita ,  Tetsuo Taniguchi ,  Masahiro Teramoto

发明人： Yosuke Matsushita ,  Tetsuo Taniguchi ,  Masahiro Teramoto

IPC分类号： H01F5/00

CPC分类号： H01F17/0013 ,  H01F2017/0026 ,  H03H7/0115 ,  H03H7/1708 ,  H03H7/1775 ,  H03H2001/0085 ,  Y10T29/4902

摘要： An electronic component that reduces resistance and prevents occurrence of an edge effect, includes a laminated body formed by stacking insulator layers. Conductor layers are linear conductors, and define coils included in the laminated body. The conductor layers face each other, with the insulator layer interposed therebetween, and allow signals of substantially the same phase to pass therethrough. The conductor layers define regions, each having a shape which decreases in thickness in the z-axis direction with increasing distance from a center thereof in a line width direction.

摘要翻译： 降低电阻并防止发生边缘效应的电子部件包括通过堆叠绝缘体层形成的层叠体。 导体层是线性导体，并且限定层叠体中包含的线圈。 导体层彼此面对，其间插入绝缘体层，并且允许基本上相同相的信号通过。 导体层限定区域，每个区域具有沿着z轴方向的厚度减小的形状，其距离其在线宽度方向上的中心的距离增加。

公开(公告)号：US07907034B2

公开(公告)日：2011-03-15

申请号：US12606334

申请日：2009-10-27

申请人： Tetsuo Taniguchi

发明人： Tetsuo Taniguchi

IPC分类号： H03H7/00

CPC分类号： H01P1/20345 ,  H03H7/09 ,  H03H7/1708 ,  H03H7/1775 ,  H03H2001/0085

摘要： In a laminated band-pass filter, a capacitance is formed between a ground electrode of a ground electrode formation layer and each of capacitor electrodes of capacitor electrode formation layers. An even number of LC parallel resonators is arranged such that via electrodes and line electrodes define a plurality of inductor electrodes and, when viewed in a direction in which the inductor electrodes are arranged, the surfaces of the loops of the inductor electrodes overlap each other at least partially. The loops defined by the inductor electrodes of neighboring LC parallel resonators have opposite directions. The capacitor electrodes have a shape and distribution or arrangement having point symmetry in plan view.

摘要翻译： 在层叠带通滤波器中，在接地电极形成层的接地电极和电容器电极形成层的电容电极的每一个之间形成电容。 偶数个LC并联谐振器被布置成使得通孔电极和线电极限定多个电感器电极，并且当沿着电感器电极布置的方向观察时，电感器电极的环的表面彼此重叠， 最少部分。 由相邻LC并联谐振器的电感器电极限定的环路具有相反的方向。 电容器电极具有在平面图中具有点对称性的形状和分布或布置。

公开(公告)号：US07671706B2

公开(公告)日：2010-03-02

申请号：US11697025

申请日：2007-04-05

申请人： Tetsuo Taniguchi

发明人： Tetsuo Taniguchi

IPC分类号： H01P1/20

CPC分类号： H03H7/09 ,  H03H7/1708 ,  H03H7/1725 ,  H03H7/1775 ,  H03H7/1791 ,  H03H2001/0085

摘要： In a multilayer bandpass filter, capacitances are produced between a ground electrode provided in a ground electrode formation layer and capacitor electrodes provided in a capacitor electrode formation layer. A plurality of inductor electrodes are defined by via-electrodes and line electrodes such that loop planes of inductor electrodes at least partially overlap each other when seen in a direction in which the inductor electrodes are arranged. The direction of the loop of the inductor electrode of the LC parallel resonator located (at a first stage) at an input end is set to be opposite to the direction of the loop of the inductor electrodes of the LC parallel resonator (at a second stage) adjacent to the inductor electrode of the LC parallel resonator located at the input end. Similarly, the direction of the loop of the inductor electrode of the LC parallel resonator located (at a fifth stage) at an output end is set to be opposite to the direction of the loop of the inductor electrodes of the LC parallel resonator (at a fourth stage) adjacent to the inductor electrode of the LC parallel resonator located at the output end.

摘要翻译： 在多层带通滤波器中，在设置在接地电极形成层中的接地电极和设置在电容器电极形成层中的电容器电极之间产生电容。 多个电感器电极由通孔电极和线电极限定，使得当电感器电极布置方向看时，电感器电极的环面至少部分地彼此重叠。 位于输入端（处于第一级）的LC并联谐振器的电感器电极的环路的方向被设置为与LC并联谐振器的电感器电极的环路的方向相反（在第二级 ），位于输入端的LC并联谐振器的电感电极。 类似地，位于（在第五级）输出端的LC并联谐振器的电感器电极的环路的方向被设置为与LC并联谐振器的电感器电极的环路的方向相反（在 第四级）与位于输出端的LC并联谐振器的电感器电极相邻。

公开(公告)号：US06897963B1

公开(公告)日：2005-05-24

申请号：US09593800

申请日：2000-06-15

申请人： Tetsuo Taniguchi ,  Saburo Kamiya

发明人： Tetsuo Taniguchi ,  Saburo Kamiya

IPC分类号： G03F7/20 ,  H01L21/00 ,  H01L21/68 ,  G01B9/02

CPC分类号： G03F7/70775 ,  G03F7/70716 ,  G03F7/70733 ,  G03F7/70741

摘要： A stage device suitable for exposure apparatus used to produce semiconductor devices, is movable in an area wider than the measurement area of interferometer for position measurement, and is capable of measuring the position with high precision. When a movable stage moves from the position where the laser beams from laser interferometers are not applied into the measurement area of the laser interferometer, the position of reference mark is measured by a wafer alignment sensor, and the measurement value measured by the laser interferometer is corrected based on the results of the measurement by the wafer alignment sensor. When another movable stage enters the measurement area of the laser interferometer, the position of the reference mark is similarly measured by a wafer alignment sensor, and the measurement value measured by the laser interferometer is corrected based on the results of the measurement by the wafer alignment sensor.

摘要翻译： 适用于制造半导体装置的曝光装置的舞台装置，可以在比用于位置测量的干涉仪的测量区域宽的区域中移动，能够高精度地测量位置。 当可移动台从激光干涉仪的激光束不被施加到激光干涉仪的测量区域的位置移动时，通过晶片对准传感器测量参考标记的位置，并且由激光干涉仪测量的测量值为 基于晶片对准传感器的测量结果进行校正。 当另一可移动台进入激光干涉仪的测量区域时，基准标记的位置由晶圆对准传感器类似地测量，并且由激光干涉仪测得的测量值基于晶片对准的测量结果来校正 传感器。

公开(公告)号：US06417745B1

公开(公告)日：2002-07-09

申请号：US09557360

申请日：2000-04-25

申请人： Tetsuo Taniguchi

发明人： Tetsuo Taniguchi

IPC分类号： H03H701

CPC分类号： H03H7/1775 ,  H03H7/0115 ,  H03H7/1733 ,  H03H2001/0085

摘要： An LC filter has a ratio of the inductance of an inductor to the capacitance of a capacitor, defining an input-side parallel LC resonant circuit, which is different from a ratio of the inductance of an inductor to the capacitance of a capacitor, defining an output-side parallel LC resonant circuit. The inductor of the input-side parallel LC resonant circuit includes inductor patterns. The inductor of the output-side parallel LC resonant circuit includes different inductor patterns. The capacitor of the input-side circuit includes capacitor patterns. The capacitor of the output-side circuit includes different capacitor patterns.

摘要翻译： LC滤波器具有电感器的电感与电容器的电容的比率，限定了输入侧并联LC谐振电路，其不同于电感器的电感与电容器的电容的比率，其定义为 输出侧并联LC谐振电路。 输入侧并联LC谐振电路的电感器包括电感器图案。 输出侧并联LC谐振电路的电感器包括不同的电感器图形。 输入侧电路的电容器包括电容器图案。 输出侧电路的电容器包括不同的电容器图案。

公开(公告)号：US06312859B1

公开(公告)日：2001-11-06

申请号：US09263803

申请日：1999-03-08

申请人： Tetsuo Taniguchi

发明人： Tetsuo Taniguchi

IPC分类号： G03F900

CPC分类号： G03F9/7003 ,  G03F7/70258 ,  G03F7/70825 ,  G03F7/70883

摘要： An imagery characteristic is corrected by changing the position and/or orientation of a reticle or lens elements of a projection lens system. Correction of the imagery characteristic, however, causes displacement of the projected pattern image of the reticle. The relation between the driving amount of the lens elements and reticle and the lateral displacement of the center of the pattern image of the reticle is stored as a table in advance. When the lens elements and/or the reticle are driven, lateral displacement of the pattern image can be obtained by accessing the table. Alternatively, the lateral displacement can be determined using a base-line amount corresponding to a distance between a detection center of a substrate position detector and a center of the projected image. Once the pattern image displacement is determined, the substrate can be accurately positioned. In another arrangement, a mask alignment method prevents positional shift of a projected image of a mask pattern even if the projection magnification of the projection optical system is changed.

摘要翻译： 通过改变投影透镜系统的掩模版或透镜元件的位置和/或取向来校正图像特性。 然而，图像特征的校正导致标线的投影图案图像的位移。 透镜元件和掩模版的驱动量与标线图案的图案图像的中心的横向位移之间的关系作为表预先存储。 当透镜元件和/或光罩被驱动时，可以通过访问桌子来获得图案图像的横向位移。 或者，可以使用对应于基板位置检测器的检测中心与投影图像的中心之间的距离的基线量来确定横向位移。 一旦确定了图案图像位移，就可以准确地定位基板。 在另一种布置中，即使投影光学系统的投影倍率改变，掩模对准方法也可以防止掩模图案的投影图像的位置偏移。

公开(公告)号：US5841520A

公开(公告)日：1998-11-24

申请号：US691377

申请日：1996-08-02

申请人： Tetsuo Taniguchi

发明人： Tetsuo Taniguchi

IPC分类号： G03F7/20 ,  G03F9/00 ,  G03B27/42 ,  G01N21/86

CPC分类号： G03F7/706 ,  G03F7/70241 ,  G03F7/70358 ,  G03F7/70725 ,  G03F9/70

摘要： A scanning type exposure apparatus comprises a mask stage RST for scanning a mask R across an illumination area on the mask R, a projection optical system PL for projecting an image of a pattern on the mask R onto a photosensitive substrate W, and a substrate stage WST for scanning the photosensitive substrate W across an exposure area. The apparatus comprises an image pickup unit 53 having its light-receiving section 1 provided on the substrate stage WST, for photoelectrically detecting an image of a mark pattern on the mask R, and a combining unit 4 for combining signals outputted from the image pickup unit 53 during a period in which the light-receiving section is scanned across the exposure area in synchronization with scanning for the mark pattern across the illumination area. Image formation characteristics or a position of the image of the mark pattern is determined on the basis of an output of the combining unit 4, which may be corrected before actual exposure. Correction is also performed by using synchronization errors. It is also possible to use an edge scan type sensor in place of the image pickup unit 53.

摘要翻译： 扫描型曝光装置包括用于在掩模R上的照明区域上扫描掩模R的掩模载台RST，用于将掩模R上的图案的图像投影到感光基板W上的投影光学系统PL，以及基板台 用于在曝光区域扫描感光基片W的WST。 该装置包括：图像拾取单元53，其具有设置在基板台WST上的光接收部分1，用于光电检测掩模R上的标记图案的图像;以及组合单元4，用于组合从图像拾取单元 在扫描横跨照明区域的标记图案的同时，在光接收部分跨过曝光区域扫描的期间53。 基于可以在实际曝光之前校正的组合单元4的输出来确定图像形成特征或标记图案的图像的位置。 使用同步错误也可进行校正。 也可以使用边缘扫描型传感器代替图像拾取单元53。

公开(公告)号：US5721608A

公开(公告)日：1998-02-24

申请号：US582019

申请日：1996-01-02

申请人： Tetsuo Taniguchi

发明人： Tetsuo Taniguchi

IPC分类号： G03F7/207 ,  B60R16/02 ,  B60R16/027 ,  B60R21/01 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30 ,  G03B27/42

CPC分类号： G03F7/70358 ,  B60R16/027 ,  B60R21/017 ,  G03F7/70241 ,  G03F7/70258 ,  G03F7/70891

摘要： A projection exposure apparatus has an illumination optical system for illuminating a mask, on which a predetermined pattern is formed, with light from a light source, a projection optical system for forming an image of the pattern of the mask on a photosensitive substrate, a mask stage for holding the mask and moving the mask within a plane perpendicular to the optical axis of the projection optical system, a substrate stage for moving the photosensitive substrate within a plane conjugate to the plane with respect to the projection optical system, and imaging characteristic correction device for correcting an imaging characteristic of the projection optical system. The apparatus synchronously moves the mask and the photosensitive substrate along the optical axis of the projection optical system so as to expose the entire pattern surface of the mask. The apparatus includes an incident light intensity input device for inputting the intensity of the illumination light, which is incident on the projection optical system through the mask, in accordance with the position of the mask, and an imaging characteristic calculation device for calculating a variation in imaging characteristic of the projection optical system on the basis of information from the incident light intensity input device. The imaging characteristic correction device is controlled on the basis of a result obtained by the imaging characteristic calculation device.

摘要翻译： 投影曝光装置具有照明光学系统，用于照射来自光源的光，其上形成有预定图案的掩模，用于在感光基板上形成掩模图案的图像的投影光学系统，掩模 用于保持掩模并在与投影光学系统的光轴垂直的平面内移动掩模的阶段，用于在与投影光学系统共面于该平面的平面内移动感光基板的基板台，以及成像特性校正 用于校正投影光学系统的成像特性的装置。 该装置沿着投影光学系统的光轴同步移动掩模和感光基片，以露出掩模的整个图案表面。 该装置包括：入射光强度输入装置，用于根据掩模的位置输入入射在投影光学系统上的照明光的强度;以及成像特征计算装置，用于计算变化 基于来自入射光强度输入装置的信息，投影光学系统的成像特性。 基于由成像特征计算装置获得的结果来控制成像特性校正装置。