公开(公告)号：US5455616A

公开(公告)日：1995-10-03

申请号：US247407

申请日：1994-05-23

申请人： Masakazu Ozawa ,  Kunitaka Ozawa ,  Katsunori Hatanaka ,  Tetsuo Suzuki ,  Tetsuzo Mori ,  Tadashi Shiina ,  Ryuichi Ebinuma

发明人： Masakazu Ozawa ,  Kunitaka Ozawa ,  Katsunori Hatanaka ,  Tetsuo Suzuki ,  Tetsuzo Mori ,  Tadashi Shiina ,  Ryuichi Ebinuma

IPC分类号： B41J29/02 ,  B41J15/04

CPC分类号： B41J29/026 ,  B41J29/02

摘要： A recorder comprises a recording device housing for housing a device for forming a record on record medium at a record position and a relatively movable stacker for stacking record media recorded by the recording device and having an open side for removing the stacked media. A convex area on the bottom of the stacker extends othogonally to the length of the stacker at a position spaced from the lengthwise center of the stacker toward the open side. The convex portion inhibits movement of the stacked media which could occur through shocks received by the recorder.

摘要翻译： 记录器包括用于容纳用于在记录位置的记录介质上形成记录的装置的记录装置壳体和用于堆叠由记录装置记录的记录介质并具有打开侧以移除堆叠的介质的相对可移动的堆叠器。 堆垛机底部的凸起区域与堆垛机的长度方向垂直地延伸到与堆垛机的长度方向中心向开口侧隔开的位置。 凸起部分阻止可能由记录器接收的冲击而发生的堆叠的介质的移动。

公开(公告)号：US4922267A

公开(公告)日：1990-05-01

申请号：US273139

申请日：1988-11-14

申请人： Masakazu Ozawa ,  Kunitaka Ozawa ,  Katsunori Hatanaka ,  Tetsuo Suzuki ,  Tetsuzo Mori ,  Tadashi Shiina ,  Ryuichi Ebinuma

发明人： Masakazu Ozawa ,  Kunitaka Ozawa ,  Katsunori Hatanaka ,  Tetsuo Suzuki ,  Tetsuzo Mori ,  Tadashi Shiina ,  Ryuichi Ebinuma

IPC分类号： B41J29/02

CPC分类号： B41J29/026 ,  B41J29/02

摘要： A recorder comprises a recording device housing for housing a device for forming a record on record medium at a record position and a relatively movable stacker for stacking record media recorded by the recording device and having an open side for removing the stacked media. A convex ara on the bottom of the stacker extends othogonally to the length of the stacker at a position spaced from the lengthwise center of the stacker toward the open side.

摘要翻译： 记录器包括用于容纳用于在记录位置的记录介质上形成记录的装置的记录装置壳体和用于堆叠由记录装置记录的记录介质并具有打开侧以移除堆叠的介质的相对可移动的堆叠器。 在堆垛机底部的凸形凸起与堆垛机的长度方向垂直地延伸到与堆垛机的纵向中心向开口侧隔开的位置处。

公开(公告)号：US4651173A

公开(公告)日：1987-03-17

申请号：US733389

申请日：1985-05-13

申请人： Masakazu Ozawa ,  Kunitaka Ozawa ,  Katsunori Hatanaka ,  Tetsuo Suzuki ,  Tetsuzo Mori ,  Tadashi Shiina ,  Ryuichi Ebinuma

发明人： Masakazu Ozawa ,  Kunitaka Ozawa ,  Katsunori Hatanaka ,  Tetsuo Suzuki ,  Tetsuzo Mori ,  Tadashi Shiina ,  Ryuichi Ebinuma

IPC分类号： B41J29/02 ,  G01D15/30

CPC分类号： B41J29/026 ,  B41J29/02

摘要： A recorder for recording on a continuous form, perforated, recording sheet includes a first roller disposed upstream of the recording position for feeding the continuous form to the recording position, press roller means for pressing the continuous form against said first roller, a second roller disposed downstream of the recording position for maintaining the continuous form in tension across the recording position, and apparatus for decrumpling, disposed between the recording position and the first feed roller.

摘要翻译： 用于以连续形式记录的记录器，穿孔的记录纸包括设置在记录位置的上游的第一辊，用于将连续形式供给到记录位置，压辊装置用于将连续形式压靠在所述第一辊上，第二辊设置 在记录位置的下游，用于保持连续形式在记录位置上的张力，以及设置在记录位置和第一进给辊之间的用于脱粒的装置。

公开(公告)号：US4894668A

公开(公告)日：1990-01-16

申请号：US277522

申请日：1988-11-28

申请人： Masa K. Ozawa ,  Kunitaka Ozawa ,  Katsunori Hatanaka ,  Tetsuo Suzuki ,  Tetsuzo Mori ,  Tadashi Shiina ,  Ryuichi Ebinuma

发明人： Masa K. Ozawa ,  Kunitaka Ozawa ,  Katsunori Hatanaka ,  Tetsuo Suzuki ,  Tetsuzo Mori ,  Tadashi Shiina ,  Ryuichi Ebinuma

IPC分类号： B41J29/02

CPC分类号： B41J29/026 ,  B41J29/02

摘要： A recorder comprises a recording device housing for housing recording device for making a record on a continuous record medium at a record position, and a device for supporting the weight of the record medium over its entire width upstream of a pinch position thereof formed by pinch and press rollers.

公开(公告)号：US5355160A

公开(公告)日：1994-10-11

申请号：US863475

申请日：1992-04-02

申请人： Masa K. Ozawa ,  Kunitaka Ozawa ,  Katsunori Hatanaka ,  Tetsuo Suzuki ,  Tetsuzo Mori ,  Tadashi Shiina ,  Ryuichi Ebinuma

发明人： Masa K. Ozawa ,  Kunitaka Ozawa ,  Katsunori Hatanaka ,  Tetsuo Suzuki ,  Tetsuzo Mori ,  Tadashi Shiina ,  Ryuichi Ebinuma

IPC分类号： B41J29/02 ,  B41J2/01 ,  B41J29/13

CPC分类号： B41J29/026 ,  B41J29/02

摘要： A recorder has a recording apparatus housing and a feeding apparatus housing hinged together for assuming open and closed positions. The recording apparatus housing holds recording apparatus and the feeding apparatus housing holds only feeding apparatus. When the housings are in the closed position, the feeding apparatus feeds paper past the recording apparatus. When they are in the open position, the recording and feeding apparatus are both exposed for easy access.

摘要翻译： 记录器具有铰接在一起以用于假定打开和关闭位置的记录装置壳体和进给装置壳体。 记录装置壳体保持记录装置，并且进给装置壳体仅保持进给装置。 当壳体处于关闭位置时，馈送装置将纸送到记录装置上。 当它们处于打开位置时，记录和馈送设备都被暴露以便于访问。

公开(公告)号：US5964540A

公开(公告)日：1999-10-12

申请号：US488417

申请日：1995-06-07

申请人： Tadashi Shiina ,  Tetsuo Suzuki ,  Tetsuzo Mori ,  Kunitaka Ozawa ,  Katsunori Hatanaka ,  Masakazu Ozawa

发明人： Tadashi Shiina ,  Tetsuo Suzuki ,  Tetsuzo Mori ,  Kunitaka Ozawa ,  Katsunori Hatanaka ,  Masakazu Ozawa

IPC分类号： B41J25/304 ,  G06K15/10 ,  H04N1/50 ,  B41J3/54

CPC分类号： G06K15/102 ,  B41J25/304 ,  H04N1/506 ,  G06K2215/0077

摘要： A recording apparatus having a memory for storing recording data, and an address counter for controlling addresses in the memory in the direction of the columns or rows. The address counter controls a read start address for starting a process of reading the memory, thereby compensating for deviations in the longitudinal or widthwise direction of recording paper.

摘要翻译： 具有用于存储记录数据的存储器的记录装置和用于控制存储器中列或行的方向上的地址的地址计数器。 地址计数器控制用于开始读取存储器的处理的读取起始地址，从而补偿记录纸的纵向或宽度方向上的偏差。

公开(公告)号：US4884085A

公开(公告)日：1989-11-28

申请号：US300243

申请日：1989-01-19

申请人： Masakazu Ozawa ,  Kunitaka Ozawa ,  Katsunori Hatanaka ,  Tetsuo Suzuki ,  Tetsuzo Mori ,  Tadashi Shiina ,  Ryuichi Ebinuna

发明人： Masakazu Ozawa ,  Kunitaka Ozawa ,  Katsunori Hatanaka ,  Tetsuo Suzuki ,  Tetsuzo Mori ,  Tadashi Shiina ,  Ryuichi Ebinuna

IPC分类号： B41J29/02

CPC分类号： B41J29/026 ,  B41J29/02

摘要： A recorder has a recording device for recording on a record medium and a feed unit for feeding the medium to the recording position. Feed and press rollers are provided with apparatus for urging the press roller to and from the feed roller and a locking device can lock the press roller at a pressing position.

摘要翻译： 记录器具有用于在记录介质上记录的记录装置和用于将介质馈送到记录位置的进给单元。 进给辊和压辊设置有用于将加压辊推压到进给辊的装置，并且锁定装置可以将压辊锁定在按压位置。

公开(公告)号：US4716421A

公开(公告)日：1987-12-29

申请号：US918715

申请日：1986-10-14

申请人： Kunitaka Ozawa ,  Takashi Nakamura ,  Akira Katayama ,  Katsunori Hatanaka ,  Tetsuzo Mori ,  Makoto Takaoka

发明人： Kunitaka Ozawa ,  Takashi Nakamura ,  Akira Katayama ,  Katsunori Hatanaka ,  Tetsuzo Mori ,  Makoto Takaoka

IPC分类号： H04N1/04 ,  B41J2/21 ,  H04N1/23 ,  H04N1/46 ,  G01D15/18

CPC分类号： B41J2/2103

摘要： A recording apparatus, such as an ink jet printer, with plural recording heads is described. Each recording head has a mark which is read by a detector to generate a corresponding signal. The signals from plural recording heads are utilized for registering these heads.

摘要翻译： 描述具有多个记录头的诸如喷墨打印机的记录装置。 每个记录头具有由检测器读取以产生相应信号的标记。 来自多个记录头的信号用于记录这些磁头。

公开(公告)号：US5365561A

公开(公告)日：1994-11-15

申请号：US182535

申请日：1994-01-18

申请人： Ryuichi Ebinuma ,  Nobutoshi Mizusawa ,  Masayuki Suzuki ,  Shinichirou Uno ,  Tetsuzo Mori ,  Hiroshi Kurosawa

发明人： Ryuichi Ebinuma ,  Nobutoshi Mizusawa ,  Masayuki Suzuki ,  Shinichirou Uno ,  Tetsuzo Mori ,  Hiroshi Kurosawa

IPC分类号： G03F7/20 ,  G21K1/04 ,  G21K5/00

CPC分类号： G03F7/70058 ,  G03F7/702 ,  G21K1/04 ,  G21K1/043

摘要： Exposure control method and apparatus particularly suitably usable in an X-ray exposure apparatus, for exposing a mask and a wafer to radiation (X-rays) from a synchrotron to transfer a pattern formed on a mask onto the wafer, is disclosed. A shutter device for controlling passage and interception of the synchrotron radiation is provided between the synchrotron and the wafer. The shutter device includes a blade member having a leading edge and a trailing edge which are rectilinearly movable in a direction in which there exists non-uniformness in illuminance of the radiation. The leading edge is used to determine the timing of start of passage of the radiation to the wafer, while the trailing edge is used to determine the timing of interception of the radiation. The moving speeds of the leading edge and the trailing edge are controlled independently of each other to provide different exposure times for different portions of an exposure region on the wafer, in accordance with the non-uniformness in illuminance. By this, the amount of absorption of radiation by a resist material on the wafer can be make uniform throughout the exposure region.

摘要翻译： 公开了一种特别适用于X射线曝光装置的曝光控制方法和装置，用于将掩模和晶片暴露于来自同步加速器的辐射（X射线），以将形成在掩模上的图案转印到晶片上。 在同步加速器和晶片之间提供用于控制同步加速器辐射的通过和截取的快门装置。 快门装置包括具有前缘和后缘的叶片构件，其沿着存在辐射照度不均匀的方向可直线运动。 前沿用于确定辐射通向晶片的时间，而后缘用于确定辐射截取的时间。 前缘和后缘的移动速度彼此独立地控制，以根据照度的不均匀性为晶片上的曝光区域的不同部分提供不同的曝光时间。 由此，可以使整个曝光区域中的抗蚀剂材料在晶片上的辐射吸收量均匀。

公开(公告)号：US5063582A

公开(公告)日：1991-11-05

申请号：US658434

申请日：1991-02-20

申请人： Tetsuzo Mori ,  Eiji Sakamoto ,  Shinichi Hara ,  Koji Uda ,  Isamu Shimoda ,  Shunichi Uzawa ,  Kunitaka Ozawa

发明人： Tetsuzo Mori ,  Eiji Sakamoto ,  Shinichi Hara ,  Koji Uda ,  Isamu Shimoda ,  Shunichi Uzawa ,  Kunitaka Ozawa

IPC分类号： G03F7/20

CPC分类号： G03F7/709 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70866 ,  G03F7/70875

摘要： The present invention relates to a temperature control system for a lithographic exposure apparatus wherein a mask and wafer are closely disposed, and predetermined exposure energy is applied to respective shot areas of the wafer through the mask. The exposure energy is a soft-X-ray source, for example. The pattern of the mask is transferred onto the respective shot areas in a step-and-repeat manner. In the apparatus, a temperature control medium liquid is supplied into the wafer chuck which supports the wafer at the exposure position. The flow rate of the temperature control liquid is different during an exposure operation than during a non-exposure-operation. The flow control is determined in consideration of the wafer chuck vibration attributable to the supply of the liquid medium and also, of the heat generation in the wafer by the exposure energy, so that the vibration of the wafer chuck during the exposure operation is suppressed. Simultaneously the temperature rise of the wafer can also be suppressed. The pattern transfer from the mask to the wafer thus be precisely performed.