Air bag-containing cover
    1.
    发明授权
    Air bag-containing cover 失效
    含气囊的盖子

    公开(公告)号:US5248532A

    公开(公告)日:1993-09-28

    申请号:US623338

    申请日:1990-12-07

    IPC分类号: B32B27/08 B60R21/2165

    摘要: An air bag-containing cover comprising:a soft surface skin layer made of a thermoplastic polymer containing the following ingredients A, B, C and D:ingredient A: a hydrogenated derivative of a block copolymer comprising styrene an conjugated diene,ingredient B: an olefinic resin,ingredient C: polyisobutylene with a viscosity average molecular weight of not greater than 70,000, andingredient D: a hydrocarbon series rubber softening agent with a kinetic viscosity at 40.degree. C. of not greater than 500 cSt and/or polybutene with a number average molecular weight of not greater than 2500, in which blending ratio is:ingredient A=40 to 80% by weight,ingredient B=5 to 30% by weightingredient C=2 to 30% by weightingredient D=0 to 20% by weight, and having a JIS-A hardness according to JIS-K6301 of from 20 to 90, anda rigid core layer comprising an olefinic resin having a modulus in flexure according to JIS-K7203 of from 1000 to 7000 kg/cm.sup.2, in whichthe core layer has a higher hardness than that of the surface skin layer, and the core layer has a portion for easily bursting the cover upon initiation of the air bag operation.

    摘要翻译: 一种含气囊的盖,包括:由含有以下成分A,B,C和D的热塑性聚合物制成的软表皮层:成分A:包含苯乙烯和共轭二烯的嵌段共聚物的氢化衍生物,成分B: 烯烃树脂,成分C:粘均分子量不大于70,000的聚异丁烯,成分D:在40℃下的动力粘度不大于500cSt的烃系橡胶软化剂和/或具有 数均分子量不大于2500,其中混合比为:成分A = 40至80重量%,成分B = 5至30重量%成分C = 2至30重量%成分D = 0至20 重量%,根据JIS-K6301的JIS-A硬度为20〜90,并且包含根据JIS-K7203的挠曲模量为1000〜7000kg / cm 2的烯烃树脂的刚性芯层, 其中芯层具有较高的硬度 并且芯层具有在气囊操作开始时容易使盖破裂的部分。

    Cover for accommodating an air bag
    4.
    发明授权
    Cover for accommodating an air bag 失效
    用于承载空气袋的盖子

    公开(公告)号:US5195773A

    公开(公告)日:1993-03-23

    申请号:US684849

    申请日:1991-04-15

    IPC分类号: B60R21/20 B60R21/2165

    CPC分类号: B60R21/21656

    摘要: A cover for accommodating an air bag, which is provided at its inner surface with an array of spaced holes for starting tear at a start of an operation of the air bag, is characterized in that ends of the holes in the direction of the array have acute shapes converging toward the adjacent holes, respectively.

    摘要翻译: 一种用于容纳气囊的盖,其特征在于,在其内表面具有用于在气囊的操作开始时开始撕裂的间隔开的孔的阵列,其特征在于,在阵列的方向上的孔的端部具有 尖锐的形状分别朝相邻的孔收敛。

    Cover for a vehicle air bag
    5.
    再颁专利
    Cover for a vehicle air bag 失效
    车盖安全气囊

    公开(公告)号:USRE36898E

    公开(公告)日:2000-10-03

    申请号:US896989

    申请日:1997-07-18

    摘要: A cover for a vehicle air bag comprises an external surface layer injection-molded from a thermoplastic material having a JIS-A hardness of 20 to 90 and a core layer injection-molded from a thermoplastic material having a bending elastic modulus (JIS K 7203) of not less than about 1000 kg/cm.sup.2 and a hardness greater than that of the surface layer. The core has weakened zones along which the cover breaks when the air bag is inflated.

    摘要翻译: 用于车用气囊的盖包括由JIS-A硬度为20〜90的热塑性材料注射成型的外表面层和由具有弯曲弹性模量(JIS K 7203)的热塑性材料注射成型的芯层, 不小于约1000kg / cm2,硬度大于表面层的硬度。 当气囊膨胀时,芯部具有弱化的区域,盖子在该区域被破坏。

    Cover for a vehicle air bag
    6.
    发明授权
    Cover for a vehicle air bag 失效
    一个汽车空气袋的盖子

    公开(公告)号:US5110647A

    公开(公告)日:1992-05-05

    申请号:US453685

    申请日:1989-12-20

    IPC分类号: B32B27/08 B60R21/2165

    摘要: A cover for a vehicle air bag comprises an external surface layer injection-molded from a thermoplastic material having a JIS-A hardness of 20 to 90 and a core layer injection-molded from a thermoplastic material having a bending elastic modulus (JIS K 7203) of not less than about 1000 kg/cm.sup.2 and a hardness greater than that of the surface layer. The core has weakened zones along which the cover breaks when the air bag is inflated.

    摘要翻译: 用于车用气囊的盖包括由JIS-A硬度为20〜90的热塑性材料注射成型的外表面层和由具有弯曲弹性模量(JIS K 7203)的热塑性材料注射成型的芯层, 不小于约1000kg / cm2,硬度大于表面层的硬度。 当气囊膨胀时,芯部具有弱化的区域,盖子在该区域被破坏。

    Mold for forming airbag cover, method for forming airbag cover, and airbag cover
    7.
    发明申请
    Mold for forming airbag cover, method for forming airbag cover, and airbag cover 审中-公开
    用于形成安全气囊盖的模具,用于形成安全气囊盖的方法和安全气囊盖

    公开(公告)号:US20060197251A1

    公开(公告)日:2006-09-07

    申请号:US11347276

    申请日:2006-02-06

    申请人: Masami Sawada

    发明人: Masami Sawada

    IPC分类号: B28B7/14

    摘要: An airbag cover mold includes a core member and a cavity member, and a resin material is supplied to a cavity between the core member and the cavity member. The core member has a plate-shaped blade block that functions as a protruding piece for forming a tear line. The blade block has openings for allowing the resin material to flow from one side of the blade block to the other side. An edged portion is provided at the top edge of each opening so as to point downward. Injection of the resin material is started after the blade block is moved to the cavity. After the injection, the blade block is moved outward to form the tear line. The mold provides an airbag cover in which smoothness in a region around a tear line is ensured.

    摘要翻译: 气囊盖模具包括芯构件和空腔构件,并且将树脂材料供应到芯构件和空腔构件之间的空腔。 芯构件具有用作形成撕裂线的突出片的板状刀片。 叶片块具有允许树脂材料从叶片块的一侧流到另一侧的开口。 在每个开口的顶部边缘处设置边缘部分,以便向下指向。 在叶片块移动到空腔之后开始注入树脂材料。 在注射之后,刀片块向外移动以形成撕裂线。 模具提供安全气囊盖,其中确保了撕裂线周围区域的平滑度。

    Vertical MOSFET and method of manufacturing thereof
    9.
    发明授权
    Vertical MOSFET and method of manufacturing thereof 失效
    垂直MOSFET及其制造方法

    公开(公告)号:US06133099A

    公开(公告)日:2000-10-17

    申请号:US18441

    申请日:1997-02-04

    申请人: Masami Sawada

    发明人: Masami Sawada

    CPC分类号: H01L21/316 H01L29/78

    摘要: A vertical MOSFET of the present invention comprises a semiconductor wafer having a groove selectively etching in the semiconductor wafer to have substantially vertical side walls. The groove is oxidized using local oxidation of silicon (LOCOS) at 1100.degree. C. or greater to form a LOCOS film on the semiconductor wafer in the groove so that a whole side surface of said semiconductor wafer exposed by the groove is substantially vertical and essentially flat. The LOCOS film in the groove is removed and a thermal insulating film on the semiconductor wafer in the groove. Then a gate electrode made of a conductive film is formed on the thermal insulating film. An interlayer insulating film is formed on the gate electrode and a source electrode is formed in ohmic contact with a source region and a base region. A drain electrode is connected to the opposite side of the semiconductor wafer. As a result, the vertical MOSFET of the present invention has improved on-state resistance, reduced parasitic capacitance and higher breakdown voltage.

    摘要翻译: 本发明的垂直MOSFET包括半导体晶片,其具有在半导体晶片中选择性蚀刻的槽,以具有基本垂直的侧壁。 使用硅(LOCOS)的局部氧化在1100℃或更高的温度下使凹槽氧化,以在凹槽中的半导体晶片上形成LOCOS膜,使得由凹槽暴露的所述半导体晶片的整个侧表面基本上是垂直的并且基本上 平面。 去除凹槽中的LOCOS膜,并在沟槽中的半导体晶片上除去绝热膜。 然后在绝热膜上形成由导电膜制成的栅电极。 在栅电极上形成层间绝缘膜,源极与源极区域和基极区域欧姆接触形成。 漏电极连接到半导体晶片的相对侧。 结果,本发明的垂直MOSFET具有改善的导通电阻,降低的寄生电容和较高的击穿电压。

    Method of manufacturing a vertical MOSFET having a gate electrode of
polycrystalline silicon
    10.
    发明授权
    Method of manufacturing a vertical MOSFET having a gate electrode of polycrystalline silicon 失效
    制造具有多晶硅栅电极的垂直MOSFET的方法

    公开(公告)号:US5529940A

    公开(公告)日:1996-06-25

    申请号:US318082

    申请日:1994-10-05

    摘要: A method of manufacturing a MOSFET having a p-type gate electrode made of polycrystalline silicon formed through a gate insulating film on a surface of a conductive semiconductor substrate. The gate electrode contains an n-type impurity in addition to a boron impurity. Low threshold voltage can be obtained with less fluctuation. Preferably, the n-type impurity is phosphorus and/or arsenic, and the concentration thereof ranges from 5.times.10.sup.18 to 1.times.10.sup.20 cm.sup.-3. A channel, which is formed in the surface of the gate insulating film side of the substrate, preferably has a positive polarity.

    摘要翻译: 一种在导电半导体衬底的表面上通过栅极绝缘膜形成具有由多晶硅制成的p型栅电极的MOSFET的方法。 除了硼杂质之外,栅电极还含有n型杂质。 可以以较小的波动获得低阈值电压。 优选地,n型杂质是磷和/或砷,其浓度范围为5×1018至1×1020cm-3。 在基板的栅极绝缘膜侧的表面形成的沟道优选具有正极性。