Pattern specification method and pattern specification apparatus
    1.
    发明授权
    Pattern specification method and pattern specification apparatus 有权
    模式规范方法和模式规范设备

    公开(公告)号:US07519942B2

    公开(公告)日:2009-04-14

    申请号:US11312612

    申请日:2005-12-21

    IPC分类号: G06F17/50

    CPC分类号: G03F7/70625 G03F1/68

    摘要: A pattern specification method for specifying a drawn microscopic pattern, comprising the step of creating a first pattern in which process shift information is reflected on a pattern expressed by design data, the step of enlarging the drawn pattern, the step of performing pattern matching between the first pattern which corresponds to the drawn pattern to-be-specified or a pattern which include patterns surrounding this first pattern and the enlarged pattern or an enlarged pattern which includes enlarged patterns surrounding this enlarged pattern, and the step of outputting the enlarged pattern which matches most in the pattern matching.

    摘要翻译: 一种用于指定绘制的微观图案的图案指定方法,包括以下步骤:产生第一图案,其中处理偏移信息反映在由设计数据表示的图案上,放大绘制图案的步骤,执行图案匹配的步骤 对应于要被指定的绘制图案的第一图案或包括围绕该第一图案和放大图案的图案的图案或包括围绕该放大图案的放大图案的放大图案,以及输出匹配的放大图案的步骤 大多数在模式匹配。

    Pattern specification method and pattern specification apparatus

    公开(公告)号:US20060169896A1

    公开(公告)日:2006-08-03

    申请号:US11312612

    申请日:2005-12-21

    IPC分类号: G21K7/00

    CPC分类号: G03F7/70625 G03F1/68

    摘要: A pattern specification method for specifying a drawn microscopic pattern, comprising the step of creating a first pattern in which process shift information is reflected on a pattern expressed by design data, the step of enlarging the drawn pattern, the step of performing pattern matching between the first pattern which corresponds to the drawn pattern to-be-specified or a pattern which include patterns surrounding this first pattern and the enlarged pattern or an enlarged pattern which includes enlarged patterns surrounding this enlarged pattern, and the step of outputting the enlarged pattern which matches most in the pattern matching.