Apparatus and methods for generating electromagnetic radiation

    公开(公告)号:US10785858B2

    公开(公告)日:2020-09-22

    申请号:US15014401

    申请日:2016-02-03

    IPC分类号: H05G2/00

    摘要: An apparatus includes at least one conductive layer, an electromagnetic (EM) wave source, and an electron source. The conductive layer has a thickness less than 5 nm. The electromagnetic (EM) wave source is in electromagnetic communication with the at least one conductive layer and transmits a first EM wave at a first wavelength in the at least one conductive layer so as to generate a surface plasmon polariton (SPP) field near a surface of the at least one conductive layer. The electron source propagates an electron beam at least partially in the SPP field so as to generate a second EM wave at a second wavelength less than the first wavelength.