摘要:
The present invention relates to an apparatus for forming a nano pattern capable of fabricating the uniform nano pattern at a low cost including a laser for generating a beam; a beam splitter for splitting the beam from the laser into two beams with the same intensity; variable mirrors for reflecting the two beams split by the beam splitter to a substrate; beam expansion units for expanding diameters of the beams by being positioned on paths of the two beams traveling toward the substrate; and a beam blocking unit, installed on an upper part of the substrate, transmitting only a specific region expanded through the beam expansion unit and blocking regions a remaining region, and a method for forming the nano pattern using the same.
摘要:
A method of forming a fine pattern begins with providing a c-plane hexagonal semiconductor crystal. A mask having a predetermined pattern is formed on the semiconductor crystal. The semiconductor crystal is dry-etched by using the mask to form a first fine pattern on the semiconductor crystal. The semiconductor crystal including the first fine pattern is wet-etched to expand the first fine pattern in a horizontal direction to form a second fine pattern. The second fine pattern obtained in the wet-etching the semiconductor crystal has a bottom surface and a sidewall that have unique crystal planes, respectively. The present fine-pattern forming process can be advantageously applied to a semiconductor light emitting device, particularly, to a phonic crystal structure required to have fine patterns or a structure using a surface plasmon resonance principle.
摘要:
A method of forming a fine pattern begins with providing a c-plane hexagonal semiconductor crystal. A mask having a predetermined pattern is formed on the semiconductor crystal. The semiconductor crystal is dry-etched by using the mask to form a first fine pattern on the semiconductor crystal. The semiconductor crystal including the first fine pattern is wet-etched to expand the first fine pattern in a horizontal direction to form a second fine pattern. The second fine pattern obtained in the wet-etching the semiconductor crystal has a bottom surface and a sidewall that have unique crystal planes, respectively. The present fine-pattern forming process can be advantageously applied to a semiconductor light emitting device, particularly, to a phonic crystal structure required to have fine patterns or a structure using a surface plasmon resonance principle.
摘要:
The present invention relates to an apparatus for forming a nano pattern capable of fabricating the uniform nano pattern at a low cost including a laser for generating a beam; a beam splitter for splitting the beam from the laser into two beams with the same intensity; variable mirrors for reflecting the two beams split by the beam splitter to a substrate; beam expansion units for expanding diameters of the beams by being positioned on paths of the two beams traveling toward the substrate; and a beam blocking unit, installed on an upper part of the substrate, transmitting only a specific region expanded through the beam expansion unit and blocking regions a remaining region, and a method for forming the nano pattern using the same.
摘要:
An LED driving apparatus having a temperature compensation function includes a reference voltage generator for generating a first reference voltage and a non-inversion amplification unit for performing non-inversion amplification to a difference voltage between the first reference voltage and a forward voltage with a preset gain. A driving unit adjusts a supply voltage in response to the voltage from the non-inversion amplification unit to supply the adjusted supply voltage to a light source having light emitting diodes. A forward voltage detector detects the forward voltage at an anode of the light emitting diodes of the light source to supply the forward voltage to the non-inversion amplification unit. Luminance variation can be compensated according to temperature changes by using a forward voltage of an LED light source so that the forward voltage of the LED light source can be controlled in association with a target current value of ambient temperature.
摘要:
An LED driving apparatus having a temperature compensation function includes a reference voltage generator for generating a first reference voltage and a non-inversion amplification unit for performing non-inversion amplification to a difference voltage between the first reference voltage and a forward voltage with a preset gain. A driving unit adjusts a supply voltage in response to the voltage from the non-inversion amplification unit to supply the adjusted supply voltage to a light source having light emitting diodes. A forward voltage detector detects the forward voltage at an anode of the light emitting diodes of the light source to supply the forward voltage to the non-inversion amplification unit. Luminance variation can be compensated according to temperature changes by using a forward voltage of an LED light source so that the forward voltage of the LED light source can be controlled in association with a target current value of ambient temperature.