公开(公告)号：US20240219829A1

公开(公告)日：2024-07-04

申请号：US18554651

申请日：2022-05-16

Applicant: Merck Patent GmbH

Inventor： Durairaj BASKARAN ,  Ashley MOORE ,  Victor MONREAL ,  Zhong LI

IPC: G03F7/00 ,  C08F212/08 ,  C09D125/14 ,  G03F7/16

CPC classification number: G03F7/0035 ,  C08F212/08 ,  C09D125/14 ,  G03F7/0002 ,  G03F7/161 ,  G03F7/168

Abstract: The present invention relates to a novel random copolymer whose repeat units comprise repeat units of structure (I), (II) and (III), wherein R1 and R2 are independently a C-1 to C-4 alkyl, x and y are independently the number of R1 and R2 which independently range from an integer from 0 to 3, R3 is a C-1 to C-4 alkyl, and R4 is selected from a C-2 to C-10 primary alkyl, or a moiety comprising an arene selected from the group consisting of a substituted or unsubstituted biphenyl moiety, a substituted or unsubstituted phenyl moiety, and a substituted or unsubstituted benzylic moiety. Another aspect of this invention is a composition comprising this random copolymer, and an organic spin casting solvent. A further aspect of this invention is using a coating of this composition to form a patterned pinning MAT for use directed self-assembly.

公开(公告)号：US20240045333A1

公开(公告)日：2024-02-08

申请号：US18256340

申请日：2022-01-05

Applicant: Merck Patent GmbH

Inventor： Hung-Yang CHEN ,  Kun SI ,  Chunwei CHEN ,  Zhong LI ,  Hengpeng WU

IPC: G03F7/039 ,  G03F7/16 ,  G03F7/004 ,  G03F7/20

CPC classification number: G03F7/039 ,  G03F7/162 ,  G03F7/0048 ,  G03F7/2004

Abstract: The disclosed subject matter relates to resist compositions that include the following components: Component a) a blend of two Novolak polymers having structures (I) and (II); component b) a diazo-naphthoquinone sulfonate (DNQ-PAC) component which is a single material or a mixture of materials having general formula having structure (III) or having general formula (III-1); is a dissolution enhancer component comprising a polyphenolic compound which is a single compound or a mixture of at least two compounds selected from the group consisting of an oligomeric fractionated Novolak, a compounds having general structure (VI) and a compound having general structure (VII), wherein Rde1, Rde2, Rde3, Rde4 and Rde5 are individually selected from a C-1 to C-4 alkyl; component d) a surfactant; and component e) an organic spin casting solvent, and an optional component f) a heterocyclic thiol.

公开(公告)号：US20240247093A1

公开(公告)日：2024-07-25

申请号：US18550587

申请日：2022-04-21

Applicant: Merck Patent GmbH

Inventor： Md S. RAHMAN ,  Durairaj BASKARAN ,  Jin LI ,  Sachin BOBADE ,  EunJeong JEONG ,  Zhong LI

IPC: C08F297/02 ,  B82Y40/00 ,  C08F212/08 ,  C08F212/32 ,  C09D153/00 ,  G03F7/00 ,  G03F7/004

CPC classification number: C08F297/026 ,  C08F212/08 ,  C08F212/32 ,  C09D153/00 ,  G03F7/0002 ,  G03F7/004 ,  B82Y40/00

Abstract: The present invention relates to two different block copolymer families having structures (1) or (6) which both have a polydispersity ranging from 1 to about 1.09. In structure (1), A is a polar block copolymer segment comprised of either alkyl 2-methylenealkanoate derived repeating units, lactone derived repeat units, oxirane derived repeat units, oxetane or cyclic carbonate derived repeat units; L is either a direct valence bond or a linking moiety derived from a 1, 1-diarylethene; B segment is a non-polarblock copolymer segment comprised of styrenic repeat unit, E are end groups selected; and wherein said block copolymer is multi-tethered with oligo flexible tethered groups at various positions as outlined. In structure (6), Ai is a polar block copolymer segment which has Tg of about 50° C. and to about 100° C.; comprised of alkyl 2-methylenealkanoate derived repeating units, lactone derived repeat units, oxirane derived repeat units, oxetane or cyclic carbonate derived repeat units; Bi is a styrenic block copolymer segment, which has a Tg from about 50° C. and to about 100° C., B2 is a block copolymer segment with a Tg ranging from about −5° C. to about −50° C., The present invention also pertains to compositions comprising either the block copolymer having structures (1) or the block copolymer having structure (6) and to methods of using these compositions. E-A-L-B-L-A-E (1) E1-A1-L1-B2-B1—B2-L1-A1-E1(6)