摘要:
Controlled radical initiators, reaction mixtures containing the controlled radical initiators and various ethylenically unsaturated monomers, and polymeric materials formed from the reaction mixtures are provided. The controlled radical initiators are bis-dithiocarbamate or bis-dithiocarbonate compounds with a single carbon atom between the two dithiocarbamate or dithiocarbonate groups. Polymeric materials such as homopolymers, random copolymers, and block copolymers can be prepared using the controlled radical initiators.
摘要:
Provided are an adhesive composition suitable for a hot-melt adhesive which has a low tack and which after adhering to an adherend and through heat treatment comes to have sufficient adhesive force; and an adhesive product using the adhesive composition. The hot-melt adhesive composition includes an acrylic block copolymer (I) having at least one polymer block (A) including methacrylic acid ester units and at least one polymer block (B) including acrylic acid ester units, wherein the acrylic acid ester units constituting the polymer block (B) contain an acrylic acid ester (1) represented by CH2═CH—COOR1 (1) (wherein R1 is an organic group having 1 to 3 carbon atoms) and an acrylic acid ester (2) represented by CH2═CH—COOR2 (2) (wherein R2 is an organic group having 4 to 12 carbon atoms), and a mass ratio (1)/(2) of the acrylic acid ester (1) to the acrylic acid ester (2) is 90/10 to 25/75.
摘要:
Block copolymers for use in block copolymer lithography, self-assembled films of the block copolymers and methods for polymerizing the block copolymers are provided. The block copolymers are characterized by high Flory-Huggins interaction parameters (χ). The block copolymers can be polymerized from protected hydroxystyrene monomers or from tert-butyl styrene and 2-vinylpyridine monomers.
摘要:
A composition for pattern formation includes a block copolymer and a solvent. The block copolymer includes a group including a reactive group on at least one end of a main chain of the block copolymer. A pattern-forming method includes providing a directed self-assembling film directly or indirectly on a substrate using the composition. The directed self-assembling film includes a phase separation structure which includes a plurality of phases. A part of the plurality of phases of the directed self-assembling film is removed.
摘要:
An object of the present invention is to provide a methacrylic resin composition which exhibits excellent flexibility, elasticity, impact resistance, and plasticity and moldability while transparency inherent to methacrylic resins is maintained. A methacrylic resin composition to be produced is composed of 10 to 99 parts by mass of a methacrylic resin (A) containing not less than 80 mass % of a methyl methacrylate unit and 90 to 1 part by mass of a block copolymer (B) containing 10 to 60 mass % of a methyl methacrylate polymer block (b1) and 90 to 40 mass % of an acrylate polymer block (b2) and having a refractive index of 1.485 to 1.495 (the total of (A) and (B) is 100 parts by mass).
摘要:
Disclosed herein is a composition comprising a block copolymer; where the block copolymer comprises a first polymer and a second polymer; where the first polymer and the second polymer of the block copolymer are different from each other and the block copolymer forms a phase separated structure; an additive polymer; where the additive polymer comprises a bottlebrush polymer; and where the bottlebrush polymer comprises a polymer that is chemically and structurally the same as one of the polymers in the block copolymer or where the bottlebrush polymer comprises a polymer that has a preferential interaction with one of the blocks of the block copolymers; and a solvent.
摘要:
The present invention provides a method for producing a block copolymer, which includes subjecting styrene or a derivative thereof (excluding α-methylstyrene) to living anionic polymerization in the presence of a polymerization initiator by means of a microreactor having a channel being capable of mixing a plurality of liquids with each other, reacting a propagation end of the resultant polymer block (A) derived from styrene or a derivative thereof with α-methylstyrene to obtain an intermediate polymer having a polymer unit (B) derived from α-methylstyrene bonded to one end of the polymer block (A), and then subjecting a)meth)acrylate compound (c) to living anionic polymerization in the presence of a polymerization initiator so that the polymer unit (B) derived from α-methyl styrene in the intermediate polymer serves as a propagation end to form a polymer block (C) derived from the)meth)acrylate compound (c)
摘要:
A composition for pattern formation includes a block copolymer. The block polymer includes a first labile group at an end of a main chain of the block copolymer. The first acid liable group is capable of being dissociated by an acid or heat. The composition preferably further contains an acid generator that generates an acid upon application of an energy. The block copolymer is preferably capable of forming a phase separation structure through directed self-assembly. The first labile group is preferably represented by formula (a). R represents a monovalent organic group having 1 to 20 carbon atoms; R′ represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms; and * denotes a binding site to an atom at the end of the main chain of the block copolymer.
摘要:
A method for producing a polymer is provided. The polymer improves variations in the content ratio and molecular weights of a copolymer's constitutional units, solvent solubility, and the sensitivity of a resist composition using such a polymer. The method includes polymerizing two or more monomers while adding with a polymerization initiator to obtain the polymer, feeding a first solution containing first composition monomers in an initial polymerization stage, and starting dropwise addition of a second solution containing second composition monomers after or simultaneously with the feeding of the first solution. The second composition is equal to a target composition ratio of the polymer to be obtained. The first composition is calculated in advance based on a target composition ratio and the reactivity of the monomers. The above dropping rate is set to high.
摘要:
Block copolymers and methods of making patterns of organic thin films using the block copolymers. The block copolymers comprise a fluorinated block. Thin films of the block copolymers have microdomains that can be aligned. As a result the patterns of organic thin films having smaller dimensions than the pattern of incident deep-UV or e-beam radiation can be formed. For example, the block copolymers can be used in lithography, filtration, and templating applications.