公开(公告)号：US6159646A

公开(公告)日：2000-12-12

申请号：US148160

申请日：1998-09-04

申请人： Mi-sook Jeon ,  Chun-deuk Lee ,  Bo-yong Lee

发明人： Mi-sook Jeon ,  Chun-deuk Lee ,  Bo-yong Lee

IPC分类号： C11D7/26 ,  C11D7/50 ,  G03F7/16 ,  G03F7/30 ,  G03F7/42 ,  H01L21/027 ,  G03F9/00

CPC分类号： G03F7/168 ,  G03F7/3021 ,  G03F7/422

摘要： A thinner composition for removing photoresist, a rework method for wafers, and a method of manufacturing semiconductor devices are provided. The thinner composition is applied for removing excess photoresist coated on the edge side or back side of wafer. The thinner may be a mixture of ethyl lactate (EL), ethyl-3-ethoxy propionate (EEP), and .tau.-butyro lactone (GBL), or a mixture of ethyl lactate (EL), and ethyl-3-ethoxy propionate (EEP), or a mixture of ethyl lactate (EL), and ethyl-3-ethoxy propionate (EEP). The rework process is carried out, using the above thinner compositions, on the wafers having excess coated photoresist due to an etching failure. The method of manufacturing semiconductor devices includes a rinsing step for removing the excess coated photoresist on the edge side or back side of wafer by using the above thinner compositions.

摘要翻译： 提供了用于去除光致抗蚀剂的较薄组合物，晶片的返工方法以及半导体器件的制造方法。 施加较薄的组合物以除去涂覆在晶片的边缘侧或背面的多余的光刻胶。 稀释剂可以是乳酸乙酯（EL），乙基-3-乙氧基丙酸酯（EEP）和叔丁内酯（GBL）的混合物，或乳酸乙酯（EL）和乙酸3-乙氧基丙酸酯 EEP）或乳酸乙酯（EL）和乙基-3-乙氧基丙酸酯（EEP）的混合物。 使用上述更薄的组合物，由于蚀刻失败，在具有过量涂覆的光致抗蚀剂的晶片上进行返工过程。 制造半导体器件的方法包括通过使用上述更薄组合物去除晶片的边缘侧或背面上的多余的涂覆光致抗蚀剂的漂洗步骤。

公开(公告)号：US06655042B2

公开(公告)日：2003-12-02

申请号：US10060021

申请日：2002-01-29

申请人： Hun-jung Yi ,  Ki-seok Lee ,  Bo-yong Lee ,  Sang-oh Park ,  Pil-kwon Jun ,  Sang-mun Chon ,  Kyung-dae Kim

发明人： Hun-jung Yi ,  Ki-seok Lee ,  Bo-yong Lee ,  Sang-oh Park ,  Pil-kwon Jun ,  Sang-mun Chon ,  Kyung-dae Kim

IPC分类号： F26B300

CPC分类号： H01L21/67034

摘要： A drying system for drying a semiconductor substrate is provided. The drying system includes: a chamber for housing a vapor distributor and a fluid bath, said fluid bath being disposed in a lower portion of the chamber and said distributor being disposed in an upper portion of the chamber for distributing vapor for drying the substrate; and a fluid flow system for supplying fluid flow into said fluid bath for cleaning and drying the substrate and for draining said fluid from the fluid bath, wherein the chamber includes a plurality of exhaust vents disposed at the upper portion for venting the vapor.

摘要翻译： 提供了用于干燥半导体衬底的干燥系统。 所述干燥系统包括：用于容纳蒸汽分配器和流体浴的室，所述流体浴设置在所述室的下部，所述分配器设置在所述室的上部，用于分配用于干燥所述基板的蒸气; 以及流体流动系统，用于将流体流供应到所述流体浴中，以清洁和干燥所述基底并从所述流体浴排出所述流体，其中所述腔室包括设置在所述上​​部的多个排气口，用于排出蒸气。