摘要:
An impact resistant insulation tile is provided that is capable of withstanding the impact of Micrometeriods and Other Debris (MMOD). The tiles are secured to an exterior surface of a Reusable Launch Vehicle (RLV). A durable coating is applied to the exterior surface of a thermally insulative layer to fragment and slow down MMOD that collide with the tile. In addition, a shock layer may be embedded within the thermal insulator to further reduce the size and speed of MMOD particles. A ballistic strain isolator pad may also be located between the thermal insulator and the RLV structure to capture fragmented particles.
摘要:
A lightweight, flexible, layered insulation composed of glass or ceramic fabric covered with a ceramic coating and overlying an insulating felt made from needled polybenzazole (PBZ) material which is preferably polybenzoxazole (PBO), and which optionally contains a poly(1,3-phenylene isophtalamide) felt material, commercially known as Nomex™, either combined with the PBZ felt or layered beneath the PBZ felt as a separate layer. The insulation is readily applied to a reusable launch vehicle via a silicone adhesive.
摘要:
A lightweight, flexible, layered insulation composed of glass or ceramic fabric covered with a ceramic coating and overlying an insulating felt made from needled polybenzazole (PBZ) material which is preferably polybenzoxazole (PBO), and which optionally contains a poly(1,3-phenylene isophtalamide) felt material, commercially known as Nomex™, either combined with the PBZ felt or layered beneath the PBZ felt as a separate layer. The insulation is readily applied to a reusable launch vehicle via a silicone adhesive.
摘要:
A system and process for enhancing the surface of a material for cleaning, material removal or preparation for adhesive bonding or etching. An environment is provided which includes a skin region in which charged particles may be generated. An exposure region is spaced from the skin region. A material may be positioned in the exposure region which contains neutral, chemically active particles generated by the charged particles. When the material to be altered is positioned in the exposure region, a desired surface of the material chemically reacts with the neutral, chemically active particles so as to alter the surface as desired for cleaning, material removal or as preparation for adhesive bonding or etching.